Spectral diagnosis of atmospheric pressure AC argon plasma jet at constant power

Liu Kun; Xiang Hong-Fu; Zhou Xiong-Feng; Xia Hao-Tian; Li Hua

doi:10.7498/aps.72.20230307

Abstract

In the application of atmospheric pressure plasma jet, because the frequency of AC power supply is limited in the kHz range, the research on the influence of power supply electrical parameters on discharge is basically aimed at the variation of plasma jet characteristics with a single driving electrical parameter ( such as voltage and frequency). However, the discharge power usually changes with a single electrical parameter changing, which can undoubtedly affect the discharge performances including the plasma physical parameters and generated reactive species, resulting in the failure to reflect the influence of the single driving parameter on the discharge. In this study, an atmospheric pressure argon plasma jet is driven by a home-made AC power supply with adjustable pulse modulated duty cycle. And combining the diagnosis of the optical emission spectrum and the optical absorption spectrum, the influences of the voltage, frequency and pulse modulated duty cycle parameters on the gas temperature T_g, electron excitation temperature T_exc, electron density n_e, and OH radical particle number density of the plasma jet are studied under a constant discharge power of 2 W. The results show that at the constant power, the electron density n_e does not change with the variation of electrical parameters as the linkage change of electrical parameters will offset the influence of a single parameter on the electron density, while the gas temperature T_g, electron excitation temperature T_exc, and OH radical particle density are most affected by the pulse modulated duty cycle, followed by driving voltage, and the frequency effect is the smallest. Under the constant power, as the frequency decreases, the voltage will increase, and also the gas temperature T_g, electron excitation temperature T_exc, and OH radical particle number density will increase. On the contrary, although the voltage also increases as the pulse modulated duty cycle decreases, the gas temperature T_g, electron excitation temperature T_exc, and OH radical particle number density are all reduced. In addition, the results indicate that reducing the duty cycle of AC power can make the atmospheric pressure plasma jet produce more OH radicals at lower gas temperature. This study provides a new insight into the influence of electrical parameters on the characteristics of atmospheric pressure plasma jets under constant power, and also presents a guidance for choosing power parameters of plasma jets with low gas temperature and high density of reactive species, which is conducive to the development of atmospheric pressure plasma jets in biomedicine and other fields.

Keywords:

Authors and contacts

1.
State Key Laboratory of Power Transmission Equipment & System Security and New Technology, Chongqing University, Chongqing 400044, China
2.
School of Electrical Engineering, Chongqing University, Chongqing 400044, China
3.
College of Life and Environmental Sciences, Guilin University of Electronic Technology, Guilin 541004, China

Corresponding author: Liu Kun, liukun@cqu.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 51877021), the Foundation of State Key Laboratory of Electrical Insulation for Power Equipment, China (Grant No. EIPE21204), and the Foundation of Guangxi Key Laboratory of Automatic Testing Technology and Instruments, China (Grant No. YQ21204).

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References

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[2]	Wang T, Wang J H, Wang S Q, lv L, Li M, Shi L P 2021 Appl. Surf. Sci. 570 151258 Google Scholar
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[17]	Qian M Y, Fan Q Q, Ren C S, Wang D Z, Nie Q Y, Zhang J L, Wen X Q 2012 Thin Solid Films 521 265 Google Scholar
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Cited By

图 1 大气压氩气等离子体射流的 (a)实验装置、(b)驱动电源输出电压波形、(c)发射光谱图和(d)吸收光谱图的示意图

Figure 1. Schematic diagram of the (a) experimental device, (b) output voltage waveform of driving power, (c) emission spectrum, and (d) absorption spectrum of atmospheric pressure argon plasma jet.

DownLoad: Full-Size Img PowerPoint

图 2 大气压氩气等离子体射流气体温度 (a)拟合示意图和(b)随驱动参数变化趋势

Figure 2. (a) Fitting diagram of the gas temperature of atmospheric pressure argon plasma jet and (b) the vibration trend with driving parameters.

DownLoad: Full-Size Img PowerPoint

图 3 大气压氩气等离子体射流电子激发温度的(a)玻尔兹曼图解法示意图和(b)随驱动参数变化趋势

Figure 3. (a) Boltzmann diagram of the electron excitation temperature of atmospheric pressure argon plasma jet and (b) the vibration trend with driving parameters.

DownLoad: Full-Size Img PowerPoint

图 4 大气压氩气等离子体射流电子密度的(a)拟合示意图和(b)随驱动参数变化趋势

Figure 4. (a) Fitting diagram of electron density of atmospheric pressure argon plasma jet and (b) variation trend with driving parameters.

DownLoad: Full-Size Img PowerPoint

图 5 大气压氩气等离子体射流·OH粒子数密度随(a)驱动参数变化和(b)气体温度变化的趋势

Figure 5. The trend of ·OH particle number density of atmospheric pressure argon plasma jet variation with (a) driving parameters and (b) gas temperature.

DownLoad: Full-Size Img PowerPoint

表 1 固定功率2 W时不同频率和脉冲调制占空比下的电压 (单位: kV)

Table 1. The voltage (unit: kV) at different frequencies and duty cycles under a constant power of 2 W.

频率/kHz	脉冲调制占空比
频率/kHz	100%	70%	50%	30%
7	11.0	13.0	14.5	16.4
8	10.4	12.4	14.0	15.7
9	9.9	11.9	13.5	15.1
10	9.3	11.4	13.0	14.6
11	8.8	11.0	12.5	13.9
12	8.4	10.4	12.0	13.1
13	7.9	9.7	11.0	11.9
14	7.5	8.9	10.0	11.3

DownLoad: CSV

表 2 玻尔兹曼图解法计算电子激发温度用到的Ar原子谱线相关参数

Table 2. The relevant parameters of Ar atomic spectral lines used in calculating electron excitation temperature by Boltzmann diagram method.

λ_ji/nm	E_j/cm^–1	g_j	A_ji/(10⁶ s^–1)
706.7	107289.7	5	3.80
727.3	107496.4	3	1.83
738.4	107289.7	5	8.47
750.4	108722.2	1	44.50
751.5	107054.3	1	40.20
763.5	106237.5	5	24.50
772.4	107496.4	3	11.70
794.8	107131.7	3	18.60
800.6	106237.5	5	4.90
801.5	105617.3	5	9.28
826.5	107496.4	3	15.30

DownLoad: CSV

表 3 大气压氩气等离子体射流生成·OH的相关反应式

Table 3. The relevant generation pathways of ·OH in atmospheric pressure argon plasma jet.

反应方程式	反应系数	编号	文献
Ar + e → Ar^* + e	$f\left( { {T_{\rm{e}}} } \right)$	R1	[34]
Ar^* + H₂O → Ar + ·H +··OH	$ 2.10 \times {10^{ - 10}} $	R2	[35]
e + H₂O → H₂O⁺ + 2 e	$f\left( { {T_{\rm{e}}} } \right)$	R3	[36]
e + H₂O⁺ → ·H +··OH	$ 1.38 \times {10^{ - 8}} $	R4	[35]
e + H₂O → e + ·H +··OH	$f\left( { {T_{\rm{e}}} } \right)$	R5	[37]
e + H₂O → 2 e + H⁺ +··OH	$f\left( { {T_{\rm{e}}} } \right)$	R6	[36]

DownLoad: CSV

map

[1]	Fallon M, Kennedy S, Kumar S, Daniels S, Humphreys H 2021 Plasma Med. 11 15
[2]	Wang T, Wang J H, Wang S Q, lv L, Li M, Shi L P 2021 Appl. Surf. Sci. 570 151258 Google Scholar
[3]	张海宝, 陈强 2021 70 095203 Google Scholar Zhang H B, Chen Q 2021 Acta Phys. Sin. 70 095203 Google Scholar
[4]	Kong X H, Xue S, Li H Y, Yang W M, Martynovich E F, Ning W J, Wang R X 2022 Plasma Sources Sci. Technol. 31 095010 Google Scholar
[5]	Wang R X, Xia Z C, Kong X H, Xue S, Wang H Y 2022 Surf. Coat. Technol. 437 128365 Google Scholar
[6]	Shimizu T, Ikehara Y 2017 J. Phys. D: Appl. Phys. 50 503001 Google Scholar
[7]	Huang Y M, Chang W C, Hsu C L 2021 Food Res. Int. 141 110108 Google Scholar
[8]	Lu X P, Keudar M, Laroussi M, Choi E, Szili E J, Ostrikov K 2019 Mater. Sci. Eng., R 138 36 Google Scholar
[9]	Schweigert I, Zakrevsky D, Milakhina E, Gugin P, Biryukov M, Patrakova E, Koval O 2022 Plasma Phys. Control. Fusion 64 044015 Google Scholar
[10]	Pang B L, Liu Z J, Wang S T, Gao Y T, Zhang H Y, Zhang F, Tantai X M, Xu D H, Liu D X, Kong M G 2021 J. Appl. Phys. 130 153301 Google Scholar
[11]	Liu K, Ren W, Ran C F, Zhou R S, Tang W B, Zhou R W, Yang Z H, Ostrikov K 2021 J. Phys. D: Appl. Phys. 54 065201 Google Scholar
[12]	Liu Z J, Wang S T, Pang B L, Gao Y T, Li Q S, Xu D H, Liu D X, Zhou R W 2022 Plasma Sources Sci. Technol. 31 05LT03 Google Scholar
[13]	Guo L, Xu R B, Guo L, Liu Z C, Zhao Y M, Liu D X, Zhang L, Chen H L, Kong M G 2018 Appl. Environ Microbiol. 84 e00726
[14]	Xiong Q, Lu X, Ostrikov K, Jiang Z Y 2009 Phys. Plasmas 16 043505 Google Scholar
[15]	Kim D B, Rhee J K, Gweon B, Moon S Y, Choe W 2007 Appl. Phys. Lett. 91 151502 Google Scholar
[16]	Gott R P, Xu K G 2019 IEEE Trans. Plasma Sci. 47 4988 Google Scholar
[17]	Qian M Y, Fan Q Q, Ren C S, Wang D Z, Nie Q Y, Zhang J L, Wen X Q 2012 Thin Solid Films 521 265 Google Scholar
[18]	Moon S Y, Kim D B, Gweon B, Choe W 2008 Appl. Phys. Lett. 93 2215006
[19]	Long Y X, Li H X, Meng X S, Li J, Xiang Z C 2018 Mod. Phys. Lett. B 32 1850315
[20]	Yuan H, Wang W C, Yang D Z, Zhao Z L, Zhang L, Wang S 2017 Plasma Sci. Technol. 19 125401 Google Scholar
[21]	付强, 王聪, 王语菲, 常正实 2022 71 115204 Google Scholar Fu Q, Wang C, Wang Y F, Chang Z S 2022 Acta Phys. Sin. 71 115204 Google Scholar
[22]	Liu K, Lei J, Zheng Z, Zhu Z, Liu S 2018 Appl. Surf. Sci. 458 183 Google Scholar
[23]	Yang D Z, Zhou X F, Liang J P, Xu Q N, Wang H L, Yang K, Wang B, Wang W C 2021 J. Phys. D: Appl. Phys. 54 244002 Google Scholar
[24]	Liu K, Zuo J, Ran C F, Yang M H, Geng W Q, Liu S T, Ostrikov K 2022 Phys. Chem. Chem. Phys. 24 8940 Google Scholar
[25]	Liu K, Geng W Q, Zhou X F, Duan Q S, Zheng Z F, Ostrikov K 2023 Plasma Sources Sci. Technol. 32 025005 Google Scholar
[26]	刘坤, 左杰, 周雄峰, 冉从福, 杨明昊, 耿文强 2023 72 055201 Google Scholar Liu K, Zuo J, Zhou X F, Ran C F, Yang M H, Geng W Q 2023 Acta Phys. Sin. 72 055201 Google Scholar
[27]	Yuan H, Feng J, Yang D Z, Zhou X F, Liang J P, Zhang L, Zhao Z L, Wang W C 2020 J. Appl. Phys. 128 093303 Google Scholar
[28]	王伟, 王永刚, 吴忠航, 饶俊峰, 姜松, 李孜 2023 光谱学与光谱分析 43 455 Google Scholar Wang W, Wang Y G, WU Z H, Rao J F, Jiang S, Li Z 2023 Spectrosc. Spectral Anal. 43 455 Google Scholar
[29]	Liu K, Xia H T, Yang M H, Geng W Q, Zuo J, Ostrikov K 2022 Vacuum 198 110901 Google Scholar
[30]	Tu X, Cheron B G, Yan J H, Cen K F 2007 Plasma Sources Sci. Technol. 16 803 Google Scholar
[31]	Peng B F, Jiang N, Shang K F, Lu N, Li J, Wu Y 2022 J. Phys. D:Appl. Phys. 55 265202 Google Scholar
[32]	Bruggeman P, Schram D, Gonzalez M 2009 Plasma Sources Sci. Technol. 18 025017 Google Scholar
[33]	Belostotskiy S G, Ouk T, Donnelly V M 2010 J. Appl. Phys. 107 05330
[34]	Zhou X F, Wang W C, Yang D Z, Liang J P, Zhao Z L, Yuan H 2019 Plasma Process Polym. 16 e1800124 Google Scholar
[35]	Gaens W V, Bogaerts A 2013 J Phys. D:Appl. Phys. 46 275201 Google Scholar
[36]	Itikawa Y, Mason N 2005 J. Phys. Chem. Ref. Data 34 1 Google Scholar
[37]	Zhou X F, Zhao Z L, Liang J P, Yuan H, Wang W C, Yang D Z 2019 Plasma Process Polym. 16 e1900001

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