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Research progress on oxide-based thin film transisitors

Lan Lin-Feng Zhang Peng Peng Jun-Biao

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Research progress on oxide-based thin film transisitors

Lan Lin-Feng, Zhang Peng, Peng Jun-Biao
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  • Oxide semiconductor is regarded as one of most suitable active materials of thin-film transistors (TFTs) for driving organic light-emitting diodes because of its advantages of high mobility, low-temperature processing, good electrical uniformity, visible-light transparency, and low cost. Currently oxide TFTs have been successfully applied to the backplanes of the flat-panel displays. This review gives a comprehensive understanding of the development process of oxide TFTs. In the present article, we review the major trend in the field of oxide TFTs. First, the questions of how to achieve high-mobility and high-stability oxide semiconductors are introduced, and the carrier transport mechanism is also addressed. Next, the device structures and the fabrication processes of the oxide TFTs are introduced. The electrical instability of the oxide TFTs is also discussed, which is critical for their applications in backplanes of the flat-panel displays. Especially, the mechanism of the threshold voltage instability of the oxide TFTs under negative bias illuminant stress is discussed in detail. Finally, the applications of oxide TFTs in flat-panel displays, such as active matrix organic light-emitting diodes and flexible displays, are addressed.
      Corresponding author: Lan Lin-Feng, lanlinfeng@scut.edu.cn
    • Funds: Project supported by the National High Technology Research and Developmeng Program of China (Grant No. 2014AA033002), the National Basic Research Program of China (Grant No. 2015CB655000), and the National Natural Science Foundation of China (Grant Nos. 61204087, 51173049).
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    Zhang L R, Ma X X, Wang C F, Li G M, Xia X H, Luo D X, Wu W J, Xu M, Wang L, Peng J B 2016 Acta Phys. Sin. 65 028501 (in Chinese) [张立荣, 马雪雪, 王春阜, 李冠明, 夏兴衡, 罗东向, 吴为敬, 徐苗, 王磊, 彭俊彪 2016 65 028501]

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    Liu Y, Wu W J, Li B, En Y F, Wang L, Liu Y R 2014 Acta Phys. Sin. 63 098503 (in Chinese) [刘远, 吴为敬, 李斌, 恩云飞, 王磊, 刘玉荣 2014 63 098503]

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    Jiao Y, Zhang X, Zhai J, Yu X, Ding L, Zhang W 2013 Electron. Mater. Lett. 9 279

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    Kwon J Y, Son K S, Jung J S, Kim T S, Ryu M K, Park K B, Lee S Y 2008 IEEE Electron Device Lett. 29 1309

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    Lim S J, Kwon S J, Kim H, Park J S 2007 Appl. Phys. Lett. 91 183517

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    Lee D H, Chang Y J, Stickle W, Chang C H 2007 Electrochem. Solid-State Lett. 10 K51

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  • Abstract views:  13810
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Publishing process
  • Received Date:  06 February 2016
  • Accepted Date:  13 March 2016
  • Published Online:  05 June 2016

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