Study on atomic layer deposition preparation of core-shell structured nanometer materials

Li Yong; Li Hui-Qi; Xia Yang; Liu Bang-Wu

doi:10.7498/aps.62.198102

Abstract

Monocrystal Pt nanoparticles, amorphous Al2O3 thin film, polycrystalline ZnO and TiO2 thin films were fabricated on black carbon nanoparticles by means of atomic layer deposition (ALD). Using high resolution transmission electron microscopy (HRTEM), X-ray photoelectron spectrometer (XPS), energy dispersive spectroscopy (EDS), We have characterized and analyzed the surface morphology, crystal structure and composition of the ranopasticles and thin filins. Results indicate that the ALD method is an ideal method to prepare core-shell stuctured nanometer materials. In addition, the reasons why the formation of ALD films with different crystal morphologies, such as monocrystal, amorphous, polycrystalline, were discussed.

Keywords:

atomic layer deposition /
core-shell structured nanometer materials /
black carbon nanoparticles

Authors and contacts

1.
Shandong University of Science and Technology, Shandong 266590, China;
2.
Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
Funds: Project supported by the National Natural Science Foundation of China (Grant No. 61106060), the Knowledge Innovation Program of the Chinese Academy of Sciences (Grant No. Y2YF028001), and the National High-tech R&D Program of China (Grant No. 2012AA052401).

References

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[6]	Yang J H, Han Y S, Choy J H 2006 Thin Solid Films 495 266
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[9]	Feng H, Elam J W, Libera J A, Setthapun W, Stair P C 2010 Chem. Mater. 22 3133
[10]	Zhang L, Jiang H C, Liu C 2007 J. Phys. D: Appl. Phys. 40 3707
[11]	Baumann T F, Biener J, Wang Y M, Kucheyev S O, Nelson E J 2006 Chem. Mater. 18 6106
[12]	Jiang X R, Huang H, Prinz F B, Bent S F 2008 Chem. Mater. 20 3897
[13]	Fang Q, Hodson C, Xu C 2012 Physics Procedia 32 551
[14]	Elam J W, Dasgupta N P, Prinz F B 2011 MRS Bull 36 899
[15]	Krajewski T A, Luka G, Wachnicki L, Zakrzewski A J 2011 Semicond. Sci. Technol. 26 085013

Cited By

[1]	Averitt R D, Sarkar D, Halas N J 1997 J. Phys. Rev. Lett. 78 4217
[2]	Oldenberg S J, Averitt R D, Westcott S L, Halas N 1998 Chem. Phys. Lett. 288 243
[3]	Pham T, Jackson J B, Halas N J 2002 Langmuir 18 4915
[4]	Im H, Wittenberg N J, Lindquist N C 2012 J. Mater. Res. 27 663
[5]	Kosuda K M 2010 Ph. D. Dissertation (Evanston: Northwestern University) (in America)
[6]	Yang J H, Han Y S, Choy J H 2006 Thin Solid Films 495 266
[7]	Grigoras K, Zavodchikova M Y, Nasibulin A G, Kauppinen E I, Ermolov V, Franssila S 2011 J. Nanosci. Nanotechnol 11 1
[8]	Nam T, Kim J M, Kim M K, Kim H 2011 Journal of the Korean Physical Society 59 452
[9]	Feng H, Elam J W, Libera J A, Setthapun W, Stair P C 2010 Chem. Mater. 22 3133
[10]	Zhang L, Jiang H C, Liu C 2007 J. Phys. D: Appl. Phys. 40 3707
[11]	Baumann T F, Biener J, Wang Y M, Kucheyev S O, Nelson E J 2006 Chem. Mater. 18 6106
[12]	Jiang X R, Huang H, Prinz F B, Bent S F 2008 Chem. Mater. 20 3897
[13]	Fang Q, Hodson C, Xu C 2012 Physics Procedia 32 551
[14]	Elam J W, Dasgupta N P, Prinz F B 2011 MRS Bull 36 899
[15]	Krajewski T A, Luka G, Wachnicki L, Zakrzewski A J 2011 Semicond. Sci. Technol. 26 085013

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Catalog

Vol. 62, Issue 19 - 2013-10-05

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