Characteristics of argon discharge plasma jet: comprehensive effects of discharge voltage, gas flow rate, and external magnetic field

Zhou Xiong-Feng; Chen Bin; Liu Kun

doi:10.7498/aps.73.20241166

Abstract

Atmospheric pressure plasma jet has received widespread attention due to its enormous potential applications in various fields, and its discharge conditions play a key role in changing their physical and chemical properties and ultimately determining its application effectiveness. Factors such as discharge voltage, gas flow rate, and the introduction of an external magnetic field intricately influence the performance of plasma jet. The combined effects of any two of these factors can yield enhanced outcomes, while also bringing complexity to the discharge phenomenon. However, there is currently a lack of research on the combined effects of external magnetic field, discharge voltage, and gas flow rate on the characteristics of plasma jets, making it difficult to comprehensively evaluate the discharge characteristics of plasma jet under multiple discharge conditions. Therefore, this paper focuses on an AC excited atmospheric pressure argon plasma jet and investigates the combined effects of external magnetic field, discharge voltage, and gas flow rate on various characteristic parameters of the plasma jet, including macroscopic morphology, discharge power, gas temperature T_g, electron excitation temperature T_exc, electron density n_e, emission intensity of excited state Ar* particles, and number density of ground state ·OH particles by using methods of camera shooting, and electrical parameter measurement, spectroscopic analysis of emission and absorption spectra. The obtained results are shown below. The effect of discharge voltage on the characteristic parameters of the plasma jet is not affected by gas flow rate or the existence of an external magnetic field. The increase of discharge voltage can improve jet performance by enhancing the discharge power, extending the plasma plume length, elevating the gas temperature T_g and electron excitation temperature T_exc, increasing the electron density n_e and emission intensity of excited state Ar* particles, as well as the number density of ground state ·OH particles. The addition of an external magnetic field can improve the jet performance without significantly changing the discharge power, and the extent of this improvement is influenced by the mode of magnetic field action. Notably, the enhancement of jet performance is most significant when the magnetic field selectively targets the plasma plume, excluding direct interaction with electrode discharge region. The effect of gas flow rate on jet performance becomes intricate: it is intertwined with the effect of voltage and the effect of external magnetic field. When an external magnetic field is present, excessive voltage and gas flow rate may reduce the number density of ground state ·OH particles generated by plasma jet. This underscores the need for a detailed understanding when optimizing jet performance under various discharge conditions. Simply combining the optimal conditions for each individual factor does not guarantee the achievement of peak jet performance when all three discharge conditions work synergistically. This study presents valuable insights into the discharge characteristics of plasma jet under different discharge conditions, providing guidance for optimizing the performance of plasma jet and promoting the advancement of atmospheric pressure plasma jet technology in different application fields.

Keywords:

Authors and contacts

State Key Laboratory of Power Transmission Equipment Technology, School of Electrical Engineering, Chongqing University, Chongqing 400044, China

Corresponding author: Liu Kun, liukun@cqu.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 52307160) and the Fundamental Research Funds for the Central Universities (Grant No. 2023CDJXY-029).

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[39]	Dang V S M M, Foucher E, Rousseau A 2015 J. Phys. D: Appl. Phys. 48 424003 Google Scholar
[40]	Zhou X F, Xiang H F, Yang M H, Geng W Q, Liu K 2023 J. Phys. D: Appl. Phys. 56 455202 Google Scholar
[41]	Chen J Y, Zhao N, Wu J C, Wu K Y, Zhang F R, Ran J X, Jia P Y, Pang X X, Li X C 2022 Chin. Phys. B 31 065205 Google Scholar
[42]	Gudmundsson J T, Thorstinsson E G 2007 Plasma Sources Sci. Technol. 16 399 Google Scholar
[43]	Sakiyama Y, Graves D B, Chang H W, Shimuzu T, Morfill G E 2012 J. Phys. D: Appl. Phys. 45 425201 Google Scholar
[44]	Tian W, Tachibana K, Kushner M J 2014 J. Phys. D: Appl. Phys. 47 055202 Google Scholar
[45]	Jiang N, Sun Y, Peng B F, Li J, Shang K F, Lu N, Wu Y 2022 Plasma Process. Polym. 19 e2100108 Google Scholar
[46]	胡杨, 罗婧怡, 蔡雨烟, 卢新培 2023 72 130501 Google Scholar Hu Y, Luo J Y, Cai Y Y, Lu X P 2023 Acta Phys. Sin. 72 130501 Google Scholar
[47]	Singh K S, Sharma A K 2021 J. Appl. Phys. 130 043302 Google Scholar
[48]	Jeroen J, van de Sande M, Sola A, Gamero A, Rodero A, van der Mullen J 2003 Plasma Sources Sci. Technol. 12 464 Google Scholar

Cited By

图 1 (a) APPJ实验装置; (b) 磁场系统

Figure 1. (a) Experimental setup of APPJ; (b) magnetic field system.

DownLoad: Full-Size Img PowerPoint

图 2 (a)发射光谱图; (b)计算电子密度示意图; (c)计算电子激发温度示意图; (d)计算气体温度示意图

Figure 2. (a) Diagram for optical emission spectrum; (b) diagram for electron density calculation; (c) diagram for electron excitation temperature calculation; (d) diagram for gas temperature calculation.

DownLoad: Full-Size Img PowerPoint

图 3 (a) APPJ放电形貌; (b) 等离子体羽长度随放电条件的变化

Figure 3. (a) APPJ discharge morphology; (b) variation of plume length with discharge conditions.

DownLoad: Full-Size Img PowerPoint

图 4 放电功率随放电条件的变化

Figure 4. Variation of power with discharge conditions.

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图 5 (a)气体温度和(b)电子激发温度随放电条件的变化

Figure 5. Variation of (a) gas temperature and (b) electron excitation temperature with discharge conditions.

DownLoad: Full-Size Img PowerPoint

图 6 电子密度随放电条件的变化

Figure 6. Variation of electron number density with discharge conditions.

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图 7 (a)激发态Ar^*光谱强度和(b)基态·OH粒子数密度随放电条件的变化

Figure 7. Variation of (a) excited Ar^* spectral intensity and (b) ·OH number density with discharge conditions.

DownLoad: Full-Size Img PowerPoint

DownLoad: Full-Size Img PowerPoint

map

[1]	Ma L, Chen Y, Gong Q, Cheng Z, Ran C F, Liu K, Shi C M 2023 Free Rad. Biol. Medic. 204 184 Google Scholar
[2]	Wang X L, Liu J, Li Q X, Li L, Li S R, Ding Y H, Zhao T, Sun Y, Zhang Y T 2023 High Volt. 8 841 Google Scholar
[3]	Xi D K, Zhang X H, Yang S Z, Yap S S, Ishikawa K, Hori M, Yap S L 2022 Chin. Phys. B 31 128201 Google Scholar
[4]	Kong X H, Xue S, Li H Y, Yang W M, Martynovich E F, Ning W J, Wang R X 2022 Plasma Sources Sci. Technol. 31 095010 Google Scholar
[5]	Cui X L, Xu Z B, Zhou Y Y, Zhu X, Wang S, Fang Z 2022 Surf. Coat. Technol. 451 129066 Google Scholar
[6]	孔得霖, 杨冰彦, 何锋, 韩若愚, 缪劲松, 宋廷鲁, 欧阳吉庭 2021 70 095205 Google Scholar Kong D L, Yang B Y, He F, Han R Y, Miao J S, Song T L, Ouyang J T 2021 Acta Phys. Sin. 70 095205 Google Scholar
[7]	Wang R Y, Shen J Y, Ma Y P X, Qin X R, Qin X, Yang F, Ostrikov K, Zhang Q, He J, Zhong X X 2024 Plasma Process. Polym. 21 2300174 Google Scholar
[8]	Liu K, Ren W, Ran C F, Zhou R S, Tang W B, Zhou R W, Yang Z H, Ostrikov K 2021 J. Phys. D: Appl. Phys. 54 065201 Google Scholar
[9]	Liu Z J, Wang S T, Pang B L, Gao Y T, Li Q S, Xu D H, Liu D X, Zhou R W 2022 Plasma Sources Sci. Technol. 31 05LT03 Google Scholar
[10]	Guo L, Xu R B, Guo L, Liu Z C, Zhao Y M, Liu D X, Zhang L, Chen H L, Kong M G 2018 Appl. Environ. Microbiol. 84 e00726-18 Google Scholar
[11]	Ran C F, Zhou X F, Wang Z Y, Liu K 2024 Plasma Sources Sci. Technol. 33 015009 Google Scholar
[12]	Liu K, Geng W Q, Zhou X F, Duan Q S, Zheng Z F, Ostrikov K 2023 Plasma Sources Sci. Technol. 32 025005 Google Scholar
[13]	Liu K, Zuo J, Ran C F, Yang M H, Geng W Q, Liu S T, Ostrikov K 2022 Phys. Chem. Chem. Phys. 24 8940 Google Scholar
[14]	Xu H M, Gao J G, Jia P Y, Ran J X, Chen J Y, Li J M 2024 Chin. Phys. B 33 015205 Google Scholar
[15]	陈忠琪, 钟安, 戴栋, 宁文军 2022 71 165201 Google Scholar Chen Z Q, Zhong A, Dai D, Ning W J 2022 Acta Phys. Sin. 71 165201 Google Scholar
[16]	Huang B D, Zhang C, Zhu W C, Lu X P, Shao T 2021 High Volt. 6 665 Google Scholar
[17]	Wang B H, Chen L, Liu G M, Song P, Cheng F C, Sun D L. Zeng W, Xu L 2023 Phys. Scr. 98 045612 Google Scholar
[18]	Chen M, Dong X P, Wu K Y, Ran J X, Jia P Y, Wu J C, Li X C 2024 Appl. Phys. Lett. 124 214102 Google Scholar
[19]	Wu K Y, Liu J N, Wu J C, Chen M, Ran J X, Pang X X, Jia P Y, Li X C, Ren C H 2023 High Volt. 8 1161 Google Scholar
[20]	张雪雪, 贾鹏英, 冉俊霞, 李金懋, 孙换霞, 李雪辰 2024 73 085201 Google Scholar Zheng X X, Jia P Y, Ran J X, Li J M, Sun H X, Li X C 2024 Acta Phys. Sin. 73 085201 Google Scholar
[21]	田富超, 陈雷, 裴欢, 白洁琪, 曾文 2023 光谱学与光谱分析 43 3682 Google Scholar Tian F C, Chen L, Pei H, Bai J Q, Zeng W 2023 Spectros. Spect. Anal. 43 3682 Google Scholar
[22]	Jurov A, Skoro N, Spasic K, Modic M, Hojnik N, Vojosevic D, Durovic M, Petrovic Z L, Cvelbar U 2022 Eur. Phys. J. D 76 29 Google Scholar
[23]	Bousba H E, Sahli S, Namous W S E, Benterrouche L 2022 IEEE Trans. Plasma Sci. 50 1218 Google Scholar
[24]	Zhou X F, Yang M H, Xiang H F, Geng W Q, Liu K 2023 Phys. Chem. Chem. Phys. 25 27427 Google Scholar
[25]	刘坤, 杨明昊, 周雄峰, 白杨, 冉从福 2023 高等学校化学学报 44 20230327 Google Scholar Liu K, Yang M H, Zhou X F, Bai Y, Ran C F 2023 Chem. J. Chin. Universities 44 20230327 Google Scholar
[26]	Jiang W M, Tang J, Wang Y S, Zhao W, Duan Y X 2014 Appl. Phys. Lett. 104 013505 Google Scholar
[27]	Liu C T, Kumakura T, Ishikawa K, Hashizume H, Takeda K, Ito M, Hori M, Wu J S 2016 Plasma Sources Sci. Technol. 25 065005 Google Scholar
[28]	Xu H, Guo S S, Zhang H, Liu D X, Xie K 2021 Phys. Plasmas 28 123521 Google Scholar
[29]	Sah A K, Al-Amin M, Talukder M R 2023 Environ. Sci. Pollut. Res. 30 74877 Google Scholar
[30]	Guo H F, Xu Y F, Wang Y Y, Ren C S 2020 Phys. Plasmas 27 023519 Google Scholar
[31]	Wang M Y, Han R Y, Zhang C Y, Ouyang J T 2020 IEEE International Conference on High Voltage Engineering and Application Beijing, China, September 6–10, 2020 pp1–4
[32]	Liu K, Xia H T, Yang M H, Geng W Q, Zuo J, Ostrikov K 2022 Vacuum 198 110901 Google Scholar
[33]	刘坤, 左杰, 周雄峰, 冉从福, 杨明昊, 耿文强 2023 72 055201 Google Scholar Liu K, Zuo J, Zhou X F, Ran C F, Yang M H, Geng W Q 2023 Acta Phys. Sin. 72 055201 Google Scholar
[34]	Yuan H, Wang W C, Yang D Z, Zhao Z L, Zhang L, Wang S 2017 Plasma Sci. Technol. 19 125401 Google Scholar
[35]	刘坤, 项红甫, 周雄峰, 夏昊天, 李华 2023 72 115201 Google Scholar Liu K, Xiang H F, Zhou X F, Xia H T, Li H 2023 Acta Phys. Sin. 72 115201 Google Scholar
[36]	Chen X, Wang X Q, Zhang B X, Yuan M, Yang S Z 2023 Chin. Phys. B 32 115201 Google Scholar
[37]	Yang D Z, Zhou X F, Liang J P, Xu Q N, Wang H L, Yang K, Wang B, Wang W C 2021 J. Phys. D: Appl. Phys. 54 244002 Google Scholar
[38]	Ran C F, Zhou X F, Liu K 2024 Phys. Chem. Chem. Phys. 26 18408 Google Scholar
[39]	Dang V S M M, Foucher E, Rousseau A 2015 J. Phys. D: Appl. Phys. 48 424003 Google Scholar
[40]	Zhou X F, Xiang H F, Yang M H, Geng W Q, Liu K 2023 J. Phys. D: Appl. Phys. 56 455202 Google Scholar
[41]	Chen J Y, Zhao N, Wu J C, Wu K Y, Zhang F R, Ran J X, Jia P Y, Pang X X, Li X C 2022 Chin. Phys. B 31 065205 Google Scholar
[42]	Gudmundsson J T, Thorstinsson E G 2007 Plasma Sources Sci. Technol. 16 399 Google Scholar
[43]	Sakiyama Y, Graves D B, Chang H W, Shimuzu T, Morfill G E 2012 J. Phys. D: Appl. Phys. 45 425201 Google Scholar
[44]	Tian W, Tachibana K, Kushner M J 2014 J. Phys. D: Appl. Phys. 47 055202 Google Scholar
[45]	Jiang N, Sun Y, Peng B F, Li J, Shang K F, Lu N, Wu Y 2022 Plasma Process. Polym. 19 e2100108 Google Scholar
[46]	胡杨, 罗婧怡, 蔡雨烟, 卢新培 2023 72 130501 Google Scholar Hu Y, Luo J Y, Cai Y Y, Lu X P 2023 Acta Phys. Sin. 72 130501 Google Scholar
[47]	Singh K S, Sharma A K 2021 J. Appl. Phys. 130 043302 Google Scholar
[48]	Jeroen J, van de Sande M, Sola A, Gamero A, Rodero A, van der Mullen J 2003 Plasma Sources Sci. Technol. 12 464 Google Scholar

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