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CrN/ta-C composite coating on a high-speed steel substrate is performed by magnetic filtered cathodic arc technique and magnetron sputtering technique. Adheision of ta-C film on the high-speed steel substrate is studied by changing the preparation process of a buffer layer of CrN. The results are as follows. With the increase of nitrogen flow, the buffer layer chromium nitride experiences the phase transition of Cr-Cr2N-CrN; the adhesion of the coating is improved with the increase of nitrogen flow, but when the nitrogen flow exceeds 30 sccm, the adhesion of coating will decline; the preferred orientation and grain structure of chromium nitride are changed by adjusting the substrate bias; the adhesion of the coating is improved with the increases of the bias voltage, but when the bias voltage exceeds 200 V, the the coating adhesion characteristics will be slightly reduced. The abrasion resistance of the test also shows that CrN coating can significantly improve the adhesion of the ta-C film on a substrate of high speed steel, and can also significantly improve the wear characteristics.
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Keywords:
- adhesion /
- tetrahedral amorphous carbon thin film /
- X-ray diffraction /
- Raman spectroscopy
[1] Zhu J Q, Wang J H, Meng S H, Han J C, Zhang L S 2004 Acta Phys. Sin. 53 1151 (in Chinese) [ 朱嘉琦, 王景贺, 孟松鹤, 韩杰才, 张连升 2004 53 1151]
[2] Han L, Yang L, Yang L M C, Wang X Y,Zhao Y Q 2011 Acta Phys.Sin. 60 046802 (in Chinese) [韩亮, 陈仙, 杨立, 王炎武, 王晓艳, 赵玉清 2011 60 046802]
[3] Han L, Chen X, Yang L, Wang Y W, Wang X Y, Zhao Y Q 2011 Acta Phys. Sin. 60 066804 (in Chinese) [韩亮, 陈仙, 杨立, 王炎武, 王晓艳, 赵玉清 2011 60 066804]
[4] Paul S W, Prawer S, Hoffman A, Manory R R, Paterson P J K, Stuart S A 1992 J. Appl. Phys. 72 4643
[5] Schafer L, Fryda M, Stolly K, Xiang L, Klages C P 1999 Surf. Coat. Technol. 116-119 447
[6] Fayer A, Glozman O, Hoffman A 1995 Appl. Phys. Lett. 67 2299
[7] Yu G H, Zeng L R, Zhu F W, Chai C L, Lai W Y 2001 J. Appl. Phys. 90 4039
[8] Bertrand G, Savall C, Meunier C 1997 Surf. Coat. Technol 96 323
[9] Chen K M, Zhang X N, Zheng C C, Huang Y, Guang Q F, Gong L, Sun C 2010 Chinese Journal of Vacuum Science and Technology 30 662 (in Chinese) [陈康敏, 张晓柠, 郑陈超, 黄燕, 关庆丰, 宫磊, 孙超 2010 真空科学与技术学报 30 662]
[10] Kang T W, Kim T W 1999 Appl. Surf. Sci. 150 190
[11] Seok J W, Jadeed N M, Lin R Y 2001 Surf. Coat. Technol. 138 14
[12] Matsue T, Hanabusa T, Ikeuchi Y 2002 Vacuum 66 435
[13] Barshilia H C, Selvakumar N, Deepthi B, Rajam K S 2006 Surf. Coat. Technol. 201 2193
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[1] Zhu J Q, Wang J H, Meng S H, Han J C, Zhang L S 2004 Acta Phys. Sin. 53 1151 (in Chinese) [ 朱嘉琦, 王景贺, 孟松鹤, 韩杰才, 张连升 2004 53 1151]
[2] Han L, Yang L, Yang L M C, Wang X Y,Zhao Y Q 2011 Acta Phys.Sin. 60 046802 (in Chinese) [韩亮, 陈仙, 杨立, 王炎武, 王晓艳, 赵玉清 2011 60 046802]
[3] Han L, Chen X, Yang L, Wang Y W, Wang X Y, Zhao Y Q 2011 Acta Phys. Sin. 60 066804 (in Chinese) [韩亮, 陈仙, 杨立, 王炎武, 王晓艳, 赵玉清 2011 60 066804]
[4] Paul S W, Prawer S, Hoffman A, Manory R R, Paterson P J K, Stuart S A 1992 J. Appl. Phys. 72 4643
[5] Schafer L, Fryda M, Stolly K, Xiang L, Klages C P 1999 Surf. Coat. Technol. 116-119 447
[6] Fayer A, Glozman O, Hoffman A 1995 Appl. Phys. Lett. 67 2299
[7] Yu G H, Zeng L R, Zhu F W, Chai C L, Lai W Y 2001 J. Appl. Phys. 90 4039
[8] Bertrand G, Savall C, Meunier C 1997 Surf. Coat. Technol 96 323
[9] Chen K M, Zhang X N, Zheng C C, Huang Y, Guang Q F, Gong L, Sun C 2010 Chinese Journal of Vacuum Science and Technology 30 662 (in Chinese) [陈康敏, 张晓柠, 郑陈超, 黄燕, 关庆丰, 宫磊, 孙超 2010 真空科学与技术学报 30 662]
[10] Kang T W, Kim T W 1999 Appl. Surf. Sci. 150 190
[11] Seok J W, Jadeed N M, Lin R Y 2001 Surf. Coat. Technol. 138 14
[12] Matsue T, Hanabusa T, Ikeuchi Y 2002 Vacuum 66 435
[13] Barshilia H C, Selvakumar N, Deepthi B, Rajam K S 2006 Surf. Coat. Technol. 201 2193
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