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A fluid model is built in this paper to describe and study the atmospheric pressure dielectric barrier glow discharge pulse in helium. The collision excitation and ionization reactions between electron and helium atom, heavy particles reactions, and Penning reaction between N2 and metastable He are taken into account in the fluid model. It is found that there are cathode falling, negative glow, Faraday dark, positive column and anode glow areas in atmospheric pressure glow discharge pulse, and the ranges of different areas are changing during the current falling edge. The ranges of cathode falling area are defined according to electron production balance position (definition 1, set as dc1) and the electrical field distribution around cathode (definition 2, set as dc2), respectively. Both dc1 and dc2 decreaseas the current grows to its peak in one discharge pulse, which reflects the transition from Townsend discharge to glow discharge. Compared with negative glow peak position, the boundary of cathode falling area by definition 1 is closer to cathode. However, the dc1 cannot reflect the cathode potential falling value and lose its definition after current peak moment. The dc2 can reflect the cathode potential falling value but it causes the overlapping between cathode falling and negative glow areas. At the current peak moment, the glow peak is located at the boundary of cathode falling area according to definition 2 while the glow peak is always located in the cathode falling area during the current falling edge. The cathode falling area characteristics can be influenced by different factors, e. g. applied voltage, secondary electron emission coefficient γ and N2 content. By changing applied voltage, it is found that the electrical potential dropping in cathode falling area increases as the average current density decreases, which indicates that the atmospheric pressure dielectric barrier glow discharge pulse is a subnormal glow discharge, and it is close to the normal glow discharge region. When γ dc1 and dc2 increase sharply with γ decreasing. When γ >0.02, dc1 and dc2 increase slowly with γ increasing. When N2 content is greater than 4 ppm, dc1 and dc2 first decrease and then increase slowly. The electrical potential falling of cathode is changeless with N2 content changing. However, the voltage across the gas gap decreases with N2 content changing because the Penning effect lowers the breakdown voltage of the gas gap. The spatial average current density has a highest value when N2 content is about 35 ppm, which also means that the spatial average charged particle density has the highest value in the same situation. Moreover, when the secondary electron emission coefficient is a constant, both dc1 and dc2 have negative linear relationship with the average current density.
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Keywords:
- atmospheric pressure dielectric barrier discharge /
- cathode falling area /
- glow discharge /
- fluid model
[1] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[2] Li D, Liu D X, He T T, Li Q S, Wang X H, Kong M G 2015 Phys. Plasmas 22 123501
[3] Wang X X 2009 High Voltage Engineering 35 1 (in Chinese)[王新新2009高电压技术35 1]
[4] Chiper A S, Rusu B G, Nastuta A V, Popa G 2009 IEEE Trans. Plasma Sci. 37 2098
[5] Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 221504
[6] Massines F, Ségur P, Gherardi N, Khamphan C, Ricard A 2003 Surf. Coat. Technol. 174-175 08
[7] Yao C W, Chang Z S, Ma H C, Xu G M, Mu H B, Zhang G J 2016 IEEE Trans. Plasma Sci. 44 2576
[8] Xu X J, Zhu D C 1996 Gas Discharge Physics (Shanghai:Fudan University Press) p121(in Chinese)[徐学基, 诸定昌1996气体放电物理(上海:复旦大学出版社)第121页]
[9] Fu Y Y, Luo H Y, Zou X B, Wang X X 2015 Phys. Plasmas 22 023502
[10] Maric D, Hartmann P, Malovic G, Donkó Z, Petrovic Z 2003 J. Phys. D:Appl. Phys. 36 2639
[11] Shi J J, Kong M G 2003 J. Appl. Phys. 94 5504
[12] Yao C W, Chang Z S, Zhang G J, Li P, Zhao A X 2015 High Voltage Engineering 41 2084 (in Chinese)[姚聪伟, 常正实, 张冠军, 李平, 赵艾萱2015高电压技术41 2084]
[13] Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
[14] Ellis H W, Pai R Y, Niel E W, Mason E A, Viehland L A 1976 At. Data Nucl. Data Tables 17 177
[15] Yuan X, Raja L L 2003 IEEE Trans. Plasma Sci. 31 31 495
[16] Tochikubo F, Chiba T, Watanabe T 1999 Jpn. J. Appl. Phys. 38 5244
[17] Liu D X, Bruggeman P, Iza F, Rong M Z, Kong M G 2010 Plasma Sources Sci. Technol. 19 025018
[18] Song X X, Tan Z Y, Chen B 2012 IEEE Trans. Plasma Sci. 40 3471
[19] Lee D, Jin M P, Sang H H, Kim Y 2005 IEEE Trans. Plasma Sci. 33 949
[20] Merrill P W 1917 Astrophysical Journal 46 771
[21] Martens T, Bogaerts A 2008 Appl. Phys. Lett. 92 041504
[22] Morrow R, Sato N 1999 J. Phys. D:Appl. Phys. 32 L20
[23] Zhang Z H, Shao X J, Zhang G J, Li Y X, Peng Z Y 2012 Acta Phys. Sin. 61 045205 (in Chinese)[张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕2012 61 045205]
[24] Zhang Z H, Zhang G J, Shao X J, Chang Z S, Peng Z Y, Xu H 2012 Acta Phys. Sin. 61 245205 (in Chinese)[张增辉, 张冠军, 邵先军, 常正实, 彭兆裕, 许昊2012 61 245205]
[25] Ricard A, Décomps P, Massines F 1999 Surf. Coat. Technol. 112 1
[26] Lazarou C, Koukounis D, Chiper A S, Costin C, Topala I, Georghiou G E 2015 Plasma Sources Sci. Technol. 24 035012
[27] Chang Z S, Jiang N, Zhang G J, Cao Z X 2014 J. Appl. Phys. 115 103301
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[1] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[2] Li D, Liu D X, He T T, Li Q S, Wang X H, Kong M G 2015 Phys. Plasmas 22 123501
[3] Wang X X 2009 High Voltage Engineering 35 1 (in Chinese)[王新新2009高电压技术35 1]
[4] Chiper A S, Rusu B G, Nastuta A V, Popa G 2009 IEEE Trans. Plasma Sci. 37 2098
[5] Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 221504
[6] Massines F, Ségur P, Gherardi N, Khamphan C, Ricard A 2003 Surf. Coat. Technol. 174-175 08
[7] Yao C W, Chang Z S, Ma H C, Xu G M, Mu H B, Zhang G J 2016 IEEE Trans. Plasma Sci. 44 2576
[8] Xu X J, Zhu D C 1996 Gas Discharge Physics (Shanghai:Fudan University Press) p121(in Chinese)[徐学基, 诸定昌1996气体放电物理(上海:复旦大学出版社)第121页]
[9] Fu Y Y, Luo H Y, Zou X B, Wang X X 2015 Phys. Plasmas 22 023502
[10] Maric D, Hartmann P, Malovic G, Donkó Z, Petrovic Z 2003 J. Phys. D:Appl. Phys. 36 2639
[11] Shi J J, Kong M G 2003 J. Appl. Phys. 94 5504
[12] Yao C W, Chang Z S, Zhang G J, Li P, Zhao A X 2015 High Voltage Engineering 41 2084 (in Chinese)[姚聪伟, 常正实, 张冠军, 李平, 赵艾萱2015高电压技术41 2084]
[13] Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
[14] Ellis H W, Pai R Y, Niel E W, Mason E A, Viehland L A 1976 At. Data Nucl. Data Tables 17 177
[15] Yuan X, Raja L L 2003 IEEE Trans. Plasma Sci. 31 31 495
[16] Tochikubo F, Chiba T, Watanabe T 1999 Jpn. J. Appl. Phys. 38 5244
[17] Liu D X, Bruggeman P, Iza F, Rong M Z, Kong M G 2010 Plasma Sources Sci. Technol. 19 025018
[18] Song X X, Tan Z Y, Chen B 2012 IEEE Trans. Plasma Sci. 40 3471
[19] Lee D, Jin M P, Sang H H, Kim Y 2005 IEEE Trans. Plasma Sci. 33 949
[20] Merrill P W 1917 Astrophysical Journal 46 771
[21] Martens T, Bogaerts A 2008 Appl. Phys. Lett. 92 041504
[22] Morrow R, Sato N 1999 J. Phys. D:Appl. Phys. 32 L20
[23] Zhang Z H, Shao X J, Zhang G J, Li Y X, Peng Z Y 2012 Acta Phys. Sin. 61 045205 (in Chinese)[张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕2012 61 045205]
[24] Zhang Z H, Zhang G J, Shao X J, Chang Z S, Peng Z Y, Xu H 2012 Acta Phys. Sin. 61 245205 (in Chinese)[张增辉, 张冠军, 邵先军, 常正实, 彭兆裕, 许昊2012 61 245205]
[25] Ricard A, Décomps P, Massines F 1999 Surf. Coat. Technol. 112 1
[26] Lazarou C, Koukounis D, Chiper A S, Costin C, Topala I, Georghiou G E 2015 Plasma Sources Sci. Technol. 24 035012
[27] Chang Z S, Jiang N, Zhang G J, Cao Z X 2014 J. Appl. Phys. 115 103301
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