Plasma-based multistage virtual cathode radiation

Su Dong; Deng Li-Ke; Wang Bin

doi:10.7498/aps.63.235204

Abstract

A novel electromagnetic (EM) radiation regime, the plasma-based multistage virtual cathode radiation model is proposed. Recent study indicates that, as an electron beam passes through a high-dense ion background, due to the cooperation of the ion background and the modulation of the virtual cathode formed at the focusing point, a multistage virtual cathode can be formed. Further studies show that the electrons reflected at different stages of the virtual cathode will come into oscillation, and the EM radiation will be excited, which is different from the betatron emission in an ion channel. As an example, a beam-ion channel system bound in a cylindrical cavity is studied by using particle in cell simulation. It is confirmed that a multistage virtual cathode is formed and EM radiation is induced. Finally, the characteristics of the radiation are discussed in the present paper.

Keywords:

Authors and contacts

1.
China Electronics Technology Group Corporation 26th Reserch Institute, Chongqing 400060, China;
2.
College of Electronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China
Funds: Project supported by the Science and Technology Research Project of Chongqing Municipal Educational Commission of China (Grant No. KJ120505).

References

[1]	Sullivan D J, Walsh J E, Coutsias A E, Granatstein V L, Alexeff I 1987 High Power Microwave Source (Boston: Artech House) p441
[2]	Thode L E, Granatstein V L, Alexeff I 1987 High Power Microwave Source (Boston: Artech House) p507
[3]	Fan Y W, Li Z Q, Shu T, Liu J 2014 Chin. Phys. B 23 075208
[4]	Liu J, Shu T, Li Z Q 2011 Acta Phys. Sin. 60 105202 (in Chinese) [刘静, 舒挺, 李志强 2011 60 105202]
[5]	Yang C, Liu D G, Zhou J, Liao C, Peng K, Liu SG 2011 Acta Phys. Sin. 60 084102 (in Chinese) [杨超, 刘大刚, 周俊, 廖臣, 彭凯, 刘盛纲 2011 60 084102]
[6]	Wang B, Tang C J, Liu P K 2006 Acta Phys. Sin. 55 5953 (in Chinese) [王斌, 唐昌建, 刘濮鲲 2006 55 5953]
[7]	Su D, Tang C J 2009 Phys. Plasmas 16 053101
[8]	Mirzanejhad S, Sohbatzadeh F, Sedaghat Z, Mahdian Z 2010 Phys. Plasma 17 053106
[9]	Wang Z Y, Tang C J 2010 Phys. Plasmas 17 083114
[10]	Mirzanejhad S, Sohbatzadeh F, Heidari Z 2012 J. Plasma Phys. 78 25
[11]	Su D, Tang C J 2011 Phys. Plasmas 18 023104
[12]	Zhang K Q, Li D J 2002 Electromagnetic Theory for Microwave and Optcelectronics (2th Ed.) (Beijing: Publishing House of Electronics Industry) p182 (in Chinese) [张克潜, 李德杰 2002 微波与光电子学中的电磁理论(第二版) (北京: 电子工业出版社) p182]

Cited By

[1]	Sullivan D J, Walsh J E, Coutsias A E, Granatstein V L, Alexeff I 1987 High Power Microwave Source (Boston: Artech House) p441
[2]	Thode L E, Granatstein V L, Alexeff I 1987 High Power Microwave Source (Boston: Artech House) p507
[3]	Fan Y W, Li Z Q, Shu T, Liu J 2014 Chin. Phys. B 23 075208
[4]	Liu J, Shu T, Li Z Q 2011 Acta Phys. Sin. 60 105202 (in Chinese) [刘静, 舒挺, 李志强 2011 60 105202]
[5]	Yang C, Liu D G, Zhou J, Liao C, Peng K, Liu SG 2011 Acta Phys. Sin. 60 084102 (in Chinese) [杨超, 刘大刚, 周俊, 廖臣, 彭凯, 刘盛纲 2011 60 084102]
[6]	Wang B, Tang C J, Liu P K 2006 Acta Phys. Sin. 55 5953 (in Chinese) [王斌, 唐昌建, 刘濮鲲 2006 55 5953]
[7]	Su D, Tang C J 2009 Phys. Plasmas 16 053101
[8]	Mirzanejhad S, Sohbatzadeh F, Sedaghat Z, Mahdian Z 2010 Phys. Plasma 17 053106
[9]	Wang Z Y, Tang C J 2010 Phys. Plasmas 17 083114
[10]	Mirzanejhad S, Sohbatzadeh F, Heidari Z 2012 J. Plasma Phys. 78 25
[11]	Su D, Tang C J 2011 Phys. Plasmas 18 023104
[12]	Zhang K Q, Li D J 2002 Electromagnetic Theory for Microwave and Optcelectronics (2th Ed.) (Beijing: Publishing House of Electronics Industry) p182 (in Chinese) [张克潜, 李德杰 2002 微波与光电子学中的电磁理论(第二版) (北京: 电子工业出版社) p182]

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Catalog

Vol. 63, Issue 23 - 2014-12-05

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