Reaction dynamic process of low pressure discharge plasma in microwave resonant cavity

Chen Ze-Yu; Peng Yu-Bin; Wang Rui; He Yong-Ning; Cui Wan-Zhao

doi:10.7498/aps.71.20221385

Abstract

Low-pressure discharge is an important problem that restricts the development of microwave components of spacecraft toward high-power and miniaturization. To clarify the mechanism of low-pressure discharge of microwave component in spacecraft, we build an emission spectroscopy diagnostic platform for studying the low-pressure radio frequency (RF) discharge plasma, and investigate the plasma reaction dynamics of low-pressure RF discharge of microwave cavity resonator and the damage effect of discharge on microwave component. The emission spectra of the plasma inside the resonator under different gas pressure conditions are obtained, and it is found that the density of hydroxyl OH (A-X), excited nitrogen molecules N₂ (C-B) and oxygen atoms O (3p⁵P→3s⁵S⁰) in the plasma each show a first-increasing and then decreasing trend with the increase of gas pressure. The kinetic mechanism of the plasma reaction behind this phenomenon is analyzed, and it is found that the gas pressure can influence the concentration magnitude of each species in the plasma by changing the species production and consumption paths as well as the average electron temperature of the plasma. The variation law of plasma emission spectrum with the input power is studied, and the trends of linear increase of particle concentration with the increase of input power at different air pressures are found. This study provides a reference for investigating the mechanism of low-pressure RF discharge and the reliable design of spacecraft microwave components.

Keywords:

spacecraft microwave components /
radio frequency low pressure discharge /
plasma /
emission spectra

Authors and contacts

1.
National Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi’an), Xi’an 710000, China
2.
School of Microelectronics, Xi’an Jiaotong University, Xi’an 710049, China

Corresponding author: Cui Wan-Zhao, cuiwanzhao@126.com

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 61901361).

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References

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Cited By

图 1 低气压放电等离子体光谱诊断平台结构示意图

Figure 1. Schematic illustration of the experimental setup for the low-pressure discharge plasma diagnosis.

DownLoad: Full-Size Img PowerPoint

图 2 谐振腔内部结构示意图

Figure 2. Geometry structure of the cavity resonator.

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图 3 谐振腔开孔前和开孔后的S参数仿真结果

Figure 3. Simulated S parameter of the cavity resonator with and without the probe hole.

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图 4 谐振腔开孔前和开孔后的电场分布仿真结果

Figure 4. Simulated electric field distribution of the cavity resonator with and without the probe hole.

DownLoad: Full-Size Img PowerPoint

图 5 不同气压条件下谐振腔的放电功率阈值

Figure 5. Discharge power threshold of the resonant cavity under different air pressure conditions.

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图 6 气压为500 Pa时谐振腔内放电等离子体的发射光谱

Figure 6. Emission spectrum of the plasma in the cavity when the gas pressure is 500 Pa.

DownLoad: Full-Size Img PowerPoint

图 7 不同气压条件下的等离子体发射光谱

Figure 7. Emission spectrum of the plasma under different gas pressure.

DownLoad: Full-Size Img PowerPoint

图 8 O(3p⁵P→3s⁵S⁰), N₂(C-B)及OH(A-X)的发射谱线强度随气压增大的变化趋势

Figure 8. Trend of the emission intensity of O(3p⁵P→3s⁵S⁰), N₂(C-B) and OH(A-X) with the increase of the gas pressure.

DownLoad: Full-Size Img PowerPoint

图 9 相对湿度为20%的空气等离子体中不同平均电子温度T_e下的电子能量分布函数

Figure 9. Electron energy distribution function at different T_e in air plasma with relative humidity of 20%.

DownLoad: Full-Size Img PowerPoint

图 10 不同输入功率条件下等离子体的发射光谱

Figure 10. Emission spectrum of the plasma under different input power.

DownLoad: Full-Size Img PowerPoint

图 11 不同气压条件下粒子发射谱线强度随输入功率增加的变化趋势　(a) O(3p⁵P→3s⁵S⁰); (b) OH(A-X)

Figure 11. Trend of the emission intensity with the increase of the gas pressure under different pressure: (a) O(3p⁵P→3s⁵S⁰); (b) OH(A-X).

DownLoad: Full-Size Img PowerPoint

图 12 光谱测试前后谐振腔S₂₁参数检测结果

Figure 12. Tested S₂₁ parameters of the cavity resonator before and after discharge.

DownLoad: Full-Size Img PowerPoint

图 13 放电对腔体内部造成的烧蚀痕迹

Figure 13. Erosion marks caused by discharge inside the cavity resonator.

DownLoad: Full-Size Img PowerPoint

map

[1]	Davis H A, Olson R T, Moir D C 2003 Phys. Plasmas 10 3351 Google Scholar
[2]	蔡利兵, 王建国 2011 60 025217 Google Scholar Cai L B, Wang J G 2011 Acta Phys. Sin. 60 025217 Google Scholar
[3]	刘雷, 李永东, 王瑞, 崔万照, 刘纯亮 2013 62 025201 Google Scholar Liu L, Li Y D, Wang R, Cui W Z, Liu C L 2013 Acta Phys. Sin. 62 025201 Google Scholar
[4]	崔万照, 李韵, 张洪太 2019 航天器微波部件微放电分析及其应用 (北京: 北京理工大学出版社) 第1—20页 Cui W Z, Li Y, Zhang H T 2019 Simulation Method of Multipactor and its Application in Satellite Microwave Components (Beijing: Beijing Institute of Technology Press) pp1–20 (in Chinese)
[5]	翁明, 谢少毅, 殷明, 曹猛 2020 69 087901 Google Scholar Weng M, Xie S Y, Yin M, Cao M 2020 Acta Phys. Sin. 69 087901 Google Scholar
[6]	王瑞, 张娜, 李韵, 胡天存, 王新波, 崔万照 2015 空间电子技术 1 001 Google Scholar Wang R, Zhang N, Li Y, Hu T C, Wang X B, Cui W Z 2015 Space Electron. Technol. 1 001 Google Scholar
[7]	Mrozek K, Dyreych T, Molis P, Daniel V, Obrusnik A 2021 Plasma Sources Sci. Technol. 30 125007 Google Scholar
[8]	张云刚, 刘黄韬, 高强, 朱志峰, 李博, 王永达 2020 69 185201 Google Scholar Zhang Y G, Liu H T, Gao Q, Zhu Z F, Li B, Wang Y D 2020 Acta Phys. Sin. 69 185201 Google Scholar
[9]	王彦飞, 朱悉铭, 张明志, 孟圣峰, 贾军伟, 柴昊, 王旸, 宁中喜 2021 70 095211 Google Scholar Wang Y F, Zhu X M, Zhang M Z, Meng S F, Jia J W, Chai H, Wang Y, Ning Z X 2021 Acta Phys. Sin. 70 095211 Google Scholar
[10]	Thiyagarajan M, Sarani A, Nicula C 2013 J. Appl. Phys. 113 233302 Google Scholar
[11]	张秩凡, 高俊, 雷鹏, 周素素, 王新兵, 左都罗 2018 67 145202 Google Scholar Zhang Z F, Gao J, Lei P, Zhou S S, Wang X B, Zuo D L 2018 Acta Phys. Sin. 67 145202 Google Scholar
[12]	李百慧, 高勋, 宋超, 林景全 2016 65 235201 Google Scholar Li B H, G X, Song C, Lin J Q 2016 Acta Phys. Sin. 65 235201 Google Scholar
[13]	Deng X L, Nikiforov A Y, Vanraes P, Leys C 2013 J. Appl. Phys. 113 023305 Google Scholar
[14]	Greve C M, Hara K 2022 J. Phys. D Appl. Phys. 55 255201 Google Scholar
[15]	Sakiyama Y, Graves D B, Chang H W, Shimizu T, Moefill G E 2012 J. Phys. D: Appl. Phys. 45 425201 Google Scholar
[16]	Peng Y K, Chen X Y, Deng Z Q, Lan L, Zhan H Y, Pei X K, Chen J H, Yuan Y K, Wen X S 2022 Plasma Sci. Technol. 24 055404 Google Scholar
[17]	Capitelli M, Ferreira C M, Gordiets B F, Osipov A I 2000 Plasma Kinetics in Atmospheric Gases (Berlin: Splinger)
[18]	Sieck L W, Herron J T, Green D S 2000 Plasma Chem. Plasma Process. 20 235 Google Scholar
[19]	Herron J T, Green D S 2001 Plasma Chem. Plasma Process. 21 459 Google Scholar
[20]	蓝朝晖, 胡希伟, 刘明海 2011 60 025205 Google Scholar Lan Z H, Hu X W, Liu M H 2011 Acta Phys. Sin. 60 025205 Google Scholar
[21]	朱国强, Jean-Pierre Boeuf, 李进贤 2012 61 235202 Google Scholar Zhu G Q, Boeuf J P, Li J X 2012 Acta Phys. Sin. 61 235202 Google Scholar
[22]	Sun B W, Liu D X, Liu Y F, Luo S T, Zhang M Y, Zhang J S, Yang A J, Wang X H, Rong M Z 2021 J. Appl. Phys. 130 093303 Google Scholar
[23]	Sun B W, Liu D X, Iza F, Wang S, Yang A J, Liu Z J, Rong M Z, Wang X H 2019 Plasma Sources Sci. Technol. 28 035006 Google Scholar
[24]	Zhang H, Guo Y, Liu D X, Sun B W, Liu Y F, Yang A J, Wang X H, Wu Y 2018 Phys. Plasmas 25 073508 Google Scholar
[25]	Liu Y F, Liu D X, Zhang J S, Sun B W, Yang A J, Kong M G 2020 Phys. Plasmas 27 043512 Google Scholar
[26]	Rowntree P, Parenteau L, Sanche L 1991 J. Chem. Phys. 94 8570 Google Scholar
[27]	Hetaba W, Mogilatenko A, Neumann W 2010 Micron 41 479 Google Scholar
[28]	Zhang B Y, Wang Q, Zhang G X, Liao S S 2014 J. Appl. Phys. 115 043302 Google Scholar
[29]	Chen Z Y, Liu D X, Chen C, Xu D H, Liu Z J, Xia W J, Rong M Z, Kong M G 2018 J. Phys. D Appl. Phys. 51 325201 Google Scholar
[30]	Chen Z Y, Liu D X, Xu H, Xia W J, Liu Z J, Xu D H, Rong M Z, Kong M G 2019 Plasma Sources Sci. Technol. 28 025001 Google Scholar
[31]	Naz M Y, Shukrullah S, Rehman S U, Khan Y, Al-Arainy A A, Meer R 2021 Sci. Rep. 11 2896 Google Scholar
[32]	孙博文 2022 博士学位论文 (西安: 西安交通大学) Sun B W 2022 Ph. D. Dissertation (Xi’an: Xi’an Jiaotong University) (in Chinese)
[33]	Zhu X M, Pu Y K 2010 J. Phys. D Appl. Phys. 43 403001 Google Scholar
[34]	Liu Y F, Liu D X, Zhang J S, Sun B W, Luo S T, Zhang H, Guo L, Rong M Z, Kong M G 2021 AIP Advances 11 055019 Google Scholar
[35]	Paris P, Raud J, Plank T, Erme K, Jgi I 2021 J. Phys. D: Appl. Phys. 54 465201 Google Scholar
[36]	Gole J L, Woodward R, Hayden J S, Dixon D A 1985 J. Phys. Chem. 89 4905 Google Scholar
[37]	Johnston H L, Cuta F, Garrett A B 2002 J. Am. Chem. Soc. 55 2311 Google Scholar

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