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The 14 nm thick Ge thin films are firstly deposited on Si substrate at 350 ℃ by using the magnetron sputtering technique, then the Ge/Si dots are successfully fabricated by annealing those Ge films. According to the morphology and phonon vibration information obtained by AFM and Raman spectroscopy, the formation and evolution mechanism are studied in detail. Experimental results indicate that the amorphous Ge films have been converted to Ge dots with a density of 8.5109 cm-2 after 675 ℃ annealing for 30 min. By using Ostwald ripening theory, surface diffusion model, and calculation of the activation energy, the surface transfer and the dot formation behavior of Ge atoms can be well interpreted. Based on the fabrication technique of Ge/Si nanodots at a high deposition rate combined with the thermal annealing, we have provided a theoretical support for the experiment on self-assembled growth of Ge quantum dots.
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Keywords:
- Ge nano-dots /
- magnetron sputtering /
- atomic migration /
- activation energy
[1] Yakimov A I, DvurechenskiœA V, Nikiforov A I, Chaœkovskiœ S V, Tiœs S A 2003 Semiconductors 37 1345
[2] [3] Liu Z, Li Y M, Xue C L, Cheng B W, Wang Q M 2013 Chin. Phys. B 22 116804
[4] [5] [6] Tong S, Liu J L, Wan J, Wang K L 2002 Applied Physics Letters 80 1189
[7] [8] Ba L, Zeng J L, Zhang S Y, Wu ZQ 1996 Chin. Phys. 5 530
[9] Qu X X, Chen K J, Chen M R, Hu C, Li Z F, Feng D 1994 Chin. Phys. 3 730
[10] [11] Ning Z Y, Wu X M, Chen J F, Cheng S Y, Hen Z X, Zhang S Q 1994 Chin. Phys. 3 682
[12] [13] [14] Liu Z, Zhou T W, Li L L, Zuo Y H, He C, Li C B, Xue C L, Cheng B W, Wang Q M 2013 Applied Physics Letters 103 082101
[15] [16] Konle J, Presting H, Kibbel H 2003 Physics E 16 596
[17] [18] Shchukin V A, Ledentsov N N, Kop'ev P S, Bimberg D 1995 Phys. Rev. Lett. 75 2968
[19] Medeiros-Ribeiro G, Kamins T I, Ohlberg D A A, Stanley Williams R 1998 Science 279 353
[20] [21] [22] Kamins T I, Medeiros-Ribeiro G, Ohlberg D A A, Stanley Williams R 1999 Journal of Applied Physics 85 1159
[23] Kamins T I, Carr E C, Williams Rosner R S 1997 Journal of Applied Physics 81 211
[24] [25] Ross F M, Tersoff J, Tromp R M 1998 Phys. Rev. Lett. 80 984
[26] [27] Ross F M, Tromp R M, Reuter M C 1999 Science 286 5446
[28] [29] Tan P H, Brunner K, Bougeard D, Abstreiter G 2003 Phys. Rev. B 68 125302
[30] [31] Yang J, Wang C, Jin Y X, Tao D P, Yang Y 2012 Acta Phys. Sin. 61 016804 (in Chinese) [杨杰, 王茺, 靳映霞, 李亮, 陶东平, 杨宇 2012 61 016804]
[32] [33] [34] Zhang X G, Wang C, Lu Z Q, Yang J, Yang Y 2011 Acta Phys. Sin. 60 096101 (in Chinese) [张学贵, 王茺, 鲁植全, 杨杰, 李亮, 杨宇 2011 60 096101]
[35] [36] Liu Y M, Yu Z Y and Ren X M 2009 Chin. Phys. B 18 881
[37] Wang D M, Sun X, Wu Z Q 2002 Chin. Phys. Lett. 19 720
[38] [39] Raab A, Springholz G 2000 Appl. Phys. Lett. 77 2991
[40] [41] Marchenko V I 1981 Sov. Phys. JETP. 54 605
[42] [43] [44] Wu Z Q, Wang B Thin Film Growth (Beijing:Science Press) pp142-166 (in Chinese) [吴自勤, 王兵2001 薄膜生长 (北京: 科学技术出版社)第142–166页]
[45] Huang K 1988 Solid State Physics (Beijing:Higher Education Press) pp529-555 (in Chinese) [黄昆1988固体物理学(北京: 高等教育出版社)第529–555页]
[46] [47] [48] Pivac B, Kovaevi I, Dubek P, Radi N, Bernstorff S, Slaoui A 2006 Thin. Solid. Film. 511 153
[49] [50] Kovaevi I, Pivaca B, Dubek P, Zorc H, Radi N, Bernstorff S, Campione M, Sassellal A 2007 Applied Surface Science 253 3034
[51] [52] Ditchfield R, Seebauer E G 1999 Phys. Rev. Lett. 82 1185
[53] [54] Das Amal K, Ghose S K, Dev B N, Kuri G, Yang T R 2000 Applied Surface Science 165 260
[55] Krikorian E, Sneed R J 1966 J. Appl. Phys. 37 3665
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[1] Yakimov A I, DvurechenskiœA V, Nikiforov A I, Chaœkovskiœ S V, Tiœs S A 2003 Semiconductors 37 1345
[2] [3] Liu Z, Li Y M, Xue C L, Cheng B W, Wang Q M 2013 Chin. Phys. B 22 116804
[4] [5] [6] Tong S, Liu J L, Wan J, Wang K L 2002 Applied Physics Letters 80 1189
[7] [8] Ba L, Zeng J L, Zhang S Y, Wu ZQ 1996 Chin. Phys. 5 530
[9] Qu X X, Chen K J, Chen M R, Hu C, Li Z F, Feng D 1994 Chin. Phys. 3 730
[10] [11] Ning Z Y, Wu X M, Chen J F, Cheng S Y, Hen Z X, Zhang S Q 1994 Chin. Phys. 3 682
[12] [13] [14] Liu Z, Zhou T W, Li L L, Zuo Y H, He C, Li C B, Xue C L, Cheng B W, Wang Q M 2013 Applied Physics Letters 103 082101
[15] [16] Konle J, Presting H, Kibbel H 2003 Physics E 16 596
[17] [18] Shchukin V A, Ledentsov N N, Kop'ev P S, Bimberg D 1995 Phys. Rev. Lett. 75 2968
[19] Medeiros-Ribeiro G, Kamins T I, Ohlberg D A A, Stanley Williams R 1998 Science 279 353
[20] [21] [22] Kamins T I, Medeiros-Ribeiro G, Ohlberg D A A, Stanley Williams R 1999 Journal of Applied Physics 85 1159
[23] Kamins T I, Carr E C, Williams Rosner R S 1997 Journal of Applied Physics 81 211
[24] [25] Ross F M, Tersoff J, Tromp R M 1998 Phys. Rev. Lett. 80 984
[26] [27] Ross F M, Tromp R M, Reuter M C 1999 Science 286 5446
[28] [29] Tan P H, Brunner K, Bougeard D, Abstreiter G 2003 Phys. Rev. B 68 125302
[30] [31] Yang J, Wang C, Jin Y X, Tao D P, Yang Y 2012 Acta Phys. Sin. 61 016804 (in Chinese) [杨杰, 王茺, 靳映霞, 李亮, 陶东平, 杨宇 2012 61 016804]
[32] [33] [34] Zhang X G, Wang C, Lu Z Q, Yang J, Yang Y 2011 Acta Phys. Sin. 60 096101 (in Chinese) [张学贵, 王茺, 鲁植全, 杨杰, 李亮, 杨宇 2011 60 096101]
[35] [36] Liu Y M, Yu Z Y and Ren X M 2009 Chin. Phys. B 18 881
[37] Wang D M, Sun X, Wu Z Q 2002 Chin. Phys. Lett. 19 720
[38] [39] Raab A, Springholz G 2000 Appl. Phys. Lett. 77 2991
[40] [41] Marchenko V I 1981 Sov. Phys. JETP. 54 605
[42] [43] [44] Wu Z Q, Wang B Thin Film Growth (Beijing:Science Press) pp142-166 (in Chinese) [吴自勤, 王兵2001 薄膜生长 (北京: 科学技术出版社)第142–166页]
[45] Huang K 1988 Solid State Physics (Beijing:Higher Education Press) pp529-555 (in Chinese) [黄昆1988固体物理学(北京: 高等教育出版社)第529–555页]
[46] [47] [48] Pivac B, Kovaevi I, Dubek P, Radi N, Bernstorff S, Slaoui A 2006 Thin. Solid. Film. 511 153
[49] [50] Kovaevi I, Pivaca B, Dubek P, Zorc H, Radi N, Bernstorff S, Campione M, Sassellal A 2007 Applied Surface Science 253 3034
[51] [52] Ditchfield R, Seebauer E G 1999 Phys. Rev. Lett. 82 1185
[53] [54] Das Amal K, Ghose S K, Dev B N, Kuri G, Yang T R 2000 Applied Surface Science 165 260
[55] Krikorian E, Sneed R J 1966 J. Appl. Phys. 37 3665
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