[1] |
Zhang Chuan-Jun, Wu Yun-Hua, Cao Hong, Gao Yan-Qing, Zhao Shou-Ren, Wang Shan-Li, Chu Jun-Hao. Effects of different substrates and CdCl2 treatment on the properties of CdS thin films deposited by magnetron sputtering. Acta Physica Sinica,
2013, 62(15): 158107.
doi: 10.7498/aps.62.158107
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[2] |
Jiang Qiang, Mao Xiu-Juan, Zhou Xi-Ying, Chang Wen-Long, Shao Jia-Jia, Chen Ming. Influence of applied magnetic field on properties of silicon nitride thin film with light trapping structure prepared by R.F. magnetron sputtering. Acta Physica Sinica,
2013, 62(11): 118103.
doi: 10.7498/aps.62.118103
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[3] |
Yi Tai-Min, Xing Pi-Feng, Zheng Feng-Cheng, Mei Lu-Sheng, Yang Meng-Sheng, Zhao Li-Ping, Li Chao-Yang, Xie Jun, Du Kai, Ma Kun-Quan. Study on interface of Al/depleted uranium and Au/depleted uranium layers deposited by magnetron sputtering. Acta Physica Sinica,
2013, 62(10): 108101.
doi: 10.7498/aps.62.108101
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[4] |
Yang Duo, Zhong Ning, Shang Hai-Long, Sun Shi-Yang, Li Ge-Yang. Microstructures and mechanical properties of (Ti, N)/Al nanocomposite films by magnetron sputtering. Acta Physica Sinica,
2013, 62(3): 036801.
doi: 10.7498/aps.62.036801
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[5] |
Su Yuan-Jun, Xu Jun, Zhu Ming, Fan Peng-Hui, Dong Chuang. Hydrogenated poly-crystalline silicon thin films deposited by inductively coupled plasma assisted pulsed dc twin magnetron sputtering. Acta Physica Sinica,
2012, 61(2): 028104.
doi: 10.7498/aps.61.028104
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[6] |
Wang Yong-Jun, Li Hong-Xuan, Ji Li, Liu Xiao-Hong, Wu Yan-Xia, Zhou Hui-Di, Chen Jian-Min. Preparation and properties of graphite-like carbon films fabricated by unbalanced magnetron sputtering. Acta Physica Sinica,
2012, 61(5): 056103.
doi: 10.7498/aps.61.056103
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[7] |
Shen Xiang-Qian, Xie Quan, Xiao Qing-Quan, Chen Qian, Feng Yun. Computer simulation of the glow discharge characteristics in magnetron sputtering. Acta Physica Sinica,
2012, 61(16): 165101.
doi: 10.7498/aps.61.165101
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[8] |
Li Lin-Na, Chen Xin-Liang, Wang Fei, Sun Jian, Zhang De-Kun, Geng Xin-Hua, Zhao Ying. Effects of hydrogen flux on aluminum doped zinc thin films by pulsed magnetron sputtering. Acta Physica Sinica,
2011, 60(6): 067304.
doi: 10.7498/aps.60.067304
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[9] |
Cao Yue-Hua, Di Guo-Qing. Analysis of Y2O3 doped TiO2 films topography prepared by radio frequency magnetron sputtering. Acta Physica Sinica,
2011, 60(3): 037702.
doi: 10.7498/aps.60.037702
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[10] |
Mu Zong-Xin, Mu Xiao-Dong, Jia Li, Wang Chun, Dong Chuang. Electrostatic oscillation and coupling resonance in double trap of unbalanced magnetron sputtering. Acta Physica Sinica,
2010, 59(10): 7164-7169.
doi: 10.7498/aps.59.7164
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[11] |
Ding Wan-Yu, Wang Hua-Lin, Miao Zhuang, Zhang Jun-Ji, Chai Wei-Ping. Influence of deposition parameter on chemical structure and moisture resistant properties for SiNx films deposited by DC pulse magnetron sputtering. Acta Physica Sinica,
2009, 58(1): 432-437.
doi: 10.7498/aps.58.432
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[12] |
Ding Wan-Yu, Xu Jun, Lu Wen-Qi, Deng Xin-Lu, Dong Chuang. An XPS study on the structure of SiNx film deposited by microwave ECR magnetron sputtering. Acta Physica Sinica,
2009, 58(6): 4109-4116.
doi: 10.7498/aps.58.4109
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[13] |
Liu Feng, Meng Yue-Dong, Ren Zhao-Xing, Shu Xing-Sheng. Characterization of ZrN films deposited by ICP enhanced RF magnetron sputtering. Acta Physica Sinica,
2008, 57(3): 1796-1801.
doi: 10.7498/aps.57.1796
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[14] |
Ding Wan-Yu, Xu Jun, Lu Wen-Qi, Deng Xin-Lu, Dong Chuang. Influences of substrate temperature on crystalline characteristics and mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering. Acta Physica Sinica,
2008, 57(8): 5170-5175.
doi: 10.7498/aps.57.5170
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[15] |
. The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering. Acta Physica Sinica,
2007, 56(12): 7255-7261.
doi: 10.7498/aps.56.7255
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[16] |
. Nano-β-FeSi2/a-Si multi-layered structure prepared by magnetron sputtering. Acta Physica Sinica,
2007, 56(12): 7188-7194.
doi: 10.7498/aps.56.7188
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[17] |
Xin Ping, Sun Cheng-Wei, Qin Fu-Wen, Wen Sheng-Ping, Zhang Qing-Yu. Room-temperature photoluminescence of ZnO/MgO multiple quantum wells deposited by reactive magnetron sputtering. Acta Physica Sinica,
2007, 56(2): 1082-1087.
doi: 10.7498/aps.56.1082
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[18] |
Liu Zhi-Wen, Gu Jian-Feng, Sun Cheng-Wei, Zhang Qing-Yu. Study on nucleation and dynamic scaling of morphological evolution of ZnO film deposition by reactive magnetron sputtering. Acta Physica Sinica,
2006, 55(4): 1965-1973.
doi: 10.7498/aps.55.1965
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[19] |
Zhou Xiao-Li, Du Pi-Yi. CaCu33Ti44O1212 films prepared by magnetron s puttering. Acta Physica Sinica,
2005, 54(4): 1809-1813.
doi: 10.7498/aps.54.1809
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[20] |
Mu Zong-Xin, Li Guo-Qing, Qin Fu-Wen, Huang Kai-Yu, Che De-Liang. The model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams. Acta Physica Sinica,
2005, 54(3): 1378-1384.
doi: 10.7498/aps.54.1378
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