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The coupling resonance is induced by the plasma electrostatic oscillation in the magnetic trap consisting of the cross-field at the surface of the unbalanced magnetron sputtering target and the potential well composed of the magnetron sputtering target and the opposite bias substrate in parallel. Langmuir probe was used to study the plasma properties and power spectra density (PSD) of the floating potential signals. Under typical discharge conditions, the eigenfrequencies in both traps were respectively in the range of 30—50 kHz or 10—20 kHz, and the electron temperatures in both traps calculated with the acoustic standing wave mode conformed with the experimental results.
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Keywords:
- plasma /
- magnetron /
- standing wave /
- resonance
[1] Thornton J A 1978 J. Vac. Sci. Technol. A 15 171
[2] Rossnagel S M, Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276
[3] Sheridan T E, Goree J 1989 J. Vac. Sci. Technol. A 7 1014
[4] Martines E, Spolaore M, Tramontin L, Cavazzana R, Serianni G, Zuin M, Antoni V 2001 Phys. Plasmas 8 3042
[5] Bohm D, Gross E P 1949 Phys. Rev. 75 1851
[6] Hoh F C 1962 Rev. Modern Phys. 34 267
[7] Simon A 1963 Phys. Fluids 6 382
[8] Mu Z X, Li G Q, Che D L 2004 Acta Phys. Sin. 53 1994 (in Chinese) [牟宗信、 李国卿、 车德良 2004 53 1994]
[9] Mu Z X, Li G Q, Qin F W, Huang K Y, Che D L 2005 Acta Phys. Sin. 54 1378 (in Chinese) [牟宗信、 李国卿、 秦福文、 黄开玉、 车德良 2005 54 1378 ]
[10] Brochard F, Gravier E, Bonhomme G 2005 Phys. Plasma 12 1
[11] Bradley J W, Thompson S, Gonzalvo Y A 2001 Plasma Sources Sci. Technol. 10 490
[12] Ma T C, Hu X W, Chen Y H 1988 The Principle of Plasma Physics (Hefei: Chinese Science and Technology University Press) p340 (in Chinese) [马腾才、 胡希伟、 陈银华 1988 等离子体物理 (合肥:中国科技大学出版社) 第340页]
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[1] Thornton J A 1978 J. Vac. Sci. Technol. A 15 171
[2] Rossnagel S M, Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276
[3] Sheridan T E, Goree J 1989 J. Vac. Sci. Technol. A 7 1014
[4] Martines E, Spolaore M, Tramontin L, Cavazzana R, Serianni G, Zuin M, Antoni V 2001 Phys. Plasmas 8 3042
[5] Bohm D, Gross E P 1949 Phys. Rev. 75 1851
[6] Hoh F C 1962 Rev. Modern Phys. 34 267
[7] Simon A 1963 Phys. Fluids 6 382
[8] Mu Z X, Li G Q, Che D L 2004 Acta Phys. Sin. 53 1994 (in Chinese) [牟宗信、 李国卿、 车德良 2004 53 1994]
[9] Mu Z X, Li G Q, Qin F W, Huang K Y, Che D L 2005 Acta Phys. Sin. 54 1378 (in Chinese) [牟宗信、 李国卿、 秦福文、 黄开玉、 车德良 2005 54 1378 ]
[10] Brochard F, Gravier E, Bonhomme G 2005 Phys. Plasma 12 1
[11] Bradley J W, Thompson S, Gonzalvo Y A 2001 Plasma Sources Sci. Technol. 10 490
[12] Ma T C, Hu X W, Chen Y H 1988 The Principle of Plasma Physics (Hefei: Chinese Science and Technology University Press) p340 (in Chinese) [马腾才、 胡希伟、 陈银华 1988 等离子体物理 (合肥:中国科技大学出版社) 第340页]
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