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The silicon nanometer structure grating and the photoresist nanometer structure grating were prepared. A fitting model was built on the new self-developed generalized ellipsometer. Then, the gratings was tested and fitted. Results proved that the machine could work well in nondestructive test of nano grating. Under the condition of the incident angle of 60 and the azimuth angle of 75, the measurement accuracy can be up to 99.97% for the three-dimensional morphology parameters such as key dimension and sidewall angle and so on, and the maximum error is less than 1%. This method is significant for the nondestructive test.
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Keywords:
- nanoimprint lithography /
- grating /
- nondestructive testing /
- fitting
[1] Chou S Y, Krauss P R, Renstrom P J 1996 Science 272 85
[2] Colburn M, Suez I, Choi B J, Meissl M, Bailey T, Sreenivasan S V, Ekerdt J G, Grant Willson C 2001 J. Vac. Sci. Technol. B 19 2685
[3] Ding Y, Hyun Wook Ro, Alvine K J, Okerberg B C, Zhou J, Douglas J F, Karim A, Soles C L 2008 Adv. Funct. Mater. 18 1854
[4] Ding Y, Hyun Wook Ro, Douglas J F, Jones R L, Hine D R, Karim A, Soles C L 2007 Adv. Mater. 19 1377
[5] Tan C L, Yi Y X, Wang G P 2002 Acta Phys. Sin. 51 1063(in Chinese) [淡春雷, 易永祥, 汪国平 2002 51 1063]
[6] Takuya Ohzono, Hirohmi Watanabe, Richard Vendamme, Carina kamaga, Toyoki Kunitake, Teruya Ishihara, Masatsugu Shimomura 2007 Adv. Mater. 19 3229
[7] Ren L Y, Liu L R, Liu D A, Luan Z 2003 Acta Phys. Sin. 52 2788(in Chinese)[任立勇, 刘立人, 刘德安, 栾竹 2003 52 2788]
[8] Jones R L, Tengjiao Hu, Soles C L, Lin E K, Reano R M, Pang S W, Casa D M 2006 Nano Letters 6 1728
[9] Zhao H J, Peng Y J, Tan Y 2009 Chin. Phys. B 18 2326
[10] Fuard D, Corinne, Farys V, Gourgon C, Schiavone P 2005 J. Vac. Sci. Technol. B 23 3069
[11] Wang J P, Jin Y X, Ma J Y 2010 Chin. Phys. B 19 054202
[12] Jones R L, Hu T J, Lin E K, Wen L W 2003 Appl. Phys. Lett. 83 4059
[13] Lei Y H, Liu X, Guo J C 2011 Chin. Phys. B 20 042901
[14] Mu Q Q, Liu Y J, Hu L F 2006 Acta Phys. Sin. 55 1055 (in Chinese) [穆全全, 刘永军, 胡立发 2006 55 1055]
[15] Zhang Z, Xu Z M, Sun T Y 2013 Acta Phys. Sin. 62 168102 (in Chinese) [张铮, 徐智谋, 孙堂友 2013 62 168102]
[16] Lee J H, Ro H W, Huang R, Lemaillet P, Germer T A, Soles C L, Stafford C M 2012 Nano Letters 12 5995
[17] Patrick H J, Germer T A, Ding Y, Ro H W, Richter L J, Soles C L 2008 Appl. Phys. Lett. 93 233105
[18] Herzinger C M, Johs B, MCGahan W A, Woollam J A 1998 J. Appl. Phys. 83 3323
[19] Stafford C M, Harrison C, Beers K L, Karim A, Amis E J, Vanlandingham M R, Kim H, Willivolksen, Miller R D, Simonyi E E 2004 Nat. Mater. 3 345
[20] El kodadi M, Soulan S, Mbesacier, Schiavone P 2009 Micro. Engin. 86 1040
[21] Al-Assaad R M, Li T, Hu W C 2008 J. Micro/Nanolith. MEMS MOEMS 7 013008
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[1] Chou S Y, Krauss P R, Renstrom P J 1996 Science 272 85
[2] Colburn M, Suez I, Choi B J, Meissl M, Bailey T, Sreenivasan S V, Ekerdt J G, Grant Willson C 2001 J. Vac. Sci. Technol. B 19 2685
[3] Ding Y, Hyun Wook Ro, Alvine K J, Okerberg B C, Zhou J, Douglas J F, Karim A, Soles C L 2008 Adv. Funct. Mater. 18 1854
[4] Ding Y, Hyun Wook Ro, Douglas J F, Jones R L, Hine D R, Karim A, Soles C L 2007 Adv. Mater. 19 1377
[5] Tan C L, Yi Y X, Wang G P 2002 Acta Phys. Sin. 51 1063(in Chinese) [淡春雷, 易永祥, 汪国平 2002 51 1063]
[6] Takuya Ohzono, Hirohmi Watanabe, Richard Vendamme, Carina kamaga, Toyoki Kunitake, Teruya Ishihara, Masatsugu Shimomura 2007 Adv. Mater. 19 3229
[7] Ren L Y, Liu L R, Liu D A, Luan Z 2003 Acta Phys. Sin. 52 2788(in Chinese)[任立勇, 刘立人, 刘德安, 栾竹 2003 52 2788]
[8] Jones R L, Tengjiao Hu, Soles C L, Lin E K, Reano R M, Pang S W, Casa D M 2006 Nano Letters 6 1728
[9] Zhao H J, Peng Y J, Tan Y 2009 Chin. Phys. B 18 2326
[10] Fuard D, Corinne, Farys V, Gourgon C, Schiavone P 2005 J. Vac. Sci. Technol. B 23 3069
[11] Wang J P, Jin Y X, Ma J Y 2010 Chin. Phys. B 19 054202
[12] Jones R L, Hu T J, Lin E K, Wen L W 2003 Appl. Phys. Lett. 83 4059
[13] Lei Y H, Liu X, Guo J C 2011 Chin. Phys. B 20 042901
[14] Mu Q Q, Liu Y J, Hu L F 2006 Acta Phys. Sin. 55 1055 (in Chinese) [穆全全, 刘永军, 胡立发 2006 55 1055]
[15] Zhang Z, Xu Z M, Sun T Y 2013 Acta Phys. Sin. 62 168102 (in Chinese) [张铮, 徐智谋, 孙堂友 2013 62 168102]
[16] Lee J H, Ro H W, Huang R, Lemaillet P, Germer T A, Soles C L, Stafford C M 2012 Nano Letters 12 5995
[17] Patrick H J, Germer T A, Ding Y, Ro H W, Richter L J, Soles C L 2008 Appl. Phys. Lett. 93 233105
[18] Herzinger C M, Johs B, MCGahan W A, Woollam J A 1998 J. Appl. Phys. 83 3323
[19] Stafford C M, Harrison C, Beers K L, Karim A, Amis E J, Vanlandingham M R, Kim H, Willivolksen, Miller R D, Simonyi E E 2004 Nat. Mater. 3 345
[20] El kodadi M, Soulan S, Mbesacier, Schiavone P 2009 Micro. Engin. 86 1040
[21] Al-Assaad R M, Li T, Hu W C 2008 J. Micro/Nanolith. MEMS MOEMS 7 013008
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