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High aspect ratio gratings can be made by perpendicularly cutting in the growth direction of multilayers. X-ray exposure technique using a sectioned multilayer grating based on Talbot effect is a new type of nano patterning method. Although 300 nanometer gratings through the experiment are completed, some phenomena in the experiments cannot be satisfactorily explained and the factors influencing the nano pattern quality have not been fully understood yet. Here we use a rigorous coupled-wave theory to discuss several important factors, including grating thickness, the fraction of material thickness and multilayer period, which is the first time as far as we know for Talbot self-imaging in X-ray range. Simulation results show that the grating thickness affects both X-ray transmission efficiency and fringe contrast, while the fraction of material thickness determines the quality of fringes. And the position deviation of the best image plane in near field is related to both the thickness of the grating and the multilayer period. Moreover, the multilayer gratings with smaller periods can achieve higher resolution, indicating that the Talbot effect can be used to fabricate a more detailed structure.
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Keywords:
- X-ray beams /
- Talbot effect /
- gratings /
- rigorous coupled-wave theory
[1] Cui Z 2008 Micro-Nanofabrication Technologies and Applications(Beijing:Higher Education Press) p107 (in Chinese) [崔铮 2008 微纳加工技术及其应用(北京:高等教育出版社)第 107 页]
[2] Jiang W, Wang N, Yan W, Hu S 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale Suzhou, China, August 26-30, 2013 p337
[3] Talbot H F 1836 Philos. Mag. 51 401
[4] Rayleigh L 1881 Philos. Mag. 67 196
[5] Kim J M, Cho I H, Lee S Y, Kang H C, Conley R, Liu C, Macrander A T, Noh D Y 2010 Opt. Express 18 24975
[6] Matsuyama S, Yokoyama H, Fukui R, Kohmura Y, Tamasaku K, Yabashi M, Yashiro W, Momose A, Ishikawa T, Yamauchi K 2012 Opt. Express 20 24977
[7] Wang H C, Berujon S, Pape I, Rutishauser S, David C, Sawhney K 2013 Opt. Lett. 38 827
[8] Stutman D, Finkenthal M 2012 Appl. Phys. Lett. 101 091108
[9] Lei Y H, Liu X, Guo J C, Zhao Z G, Liu H B 2011 Chin. Phys. B 20 042901
[10] Chapman M S, Ekstrom C R, Hammond T D, Schmiedmayer J, Tannian B E, Wehinger S,. Pritchard D E 1995 Phys. Rev. A 5 1
[11] Solak H H, Ekinci Y 2005 J. Vac. Sci. Technol. 23 2705
[12] Isoyan A, Jiang F, Cheng YC, Cerrina F, Wachulak P, Urbanski L, Rocca J, Menoni C, Marconi M 2009 J. Vac. Sci. Technol. 27 2931
[13] Lee S Y, Cho I H, Kim J M, Yan H, Conley R, Liu C, Macrander AT, Maser J, Stephenson GB, Kang HC, Noh DY 2011 J Appl. Phys. 109 44307
[14] Attwood D 1999 Soft X-rays and Extreme Ultraviolet Radiation Principles and Applications (New York:Cambridge University Press) p357
[15] Gaylord T K, Moharam M G 1982 Phys. Rev. B 28 1
[16] Magnusson R, Gaylord T K 1977 J. Opt. Soc. Am. 9 1165
[17] Chu R, Kong J A 1977 IEEE Trans. Microwave Theory Tech. 1 14
[18] Moharam M G, Gaylord T K 1981 J. Opt. Soc. Am. 7 811
[19] Gaylord T K, Moharam M G 1985 Proc. IEEE 5 894
[20] Zhang G P, Ye J X, Li Z G 1996 Chin. Phys. B 5 817
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[1] Cui Z 2008 Micro-Nanofabrication Technologies and Applications(Beijing:Higher Education Press) p107 (in Chinese) [崔铮 2008 微纳加工技术及其应用(北京:高等教育出版社)第 107 页]
[2] Jiang W, Wang N, Yan W, Hu S 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale Suzhou, China, August 26-30, 2013 p337
[3] Talbot H F 1836 Philos. Mag. 51 401
[4] Rayleigh L 1881 Philos. Mag. 67 196
[5] Kim J M, Cho I H, Lee S Y, Kang H C, Conley R, Liu C, Macrander A T, Noh D Y 2010 Opt. Express 18 24975
[6] Matsuyama S, Yokoyama H, Fukui R, Kohmura Y, Tamasaku K, Yabashi M, Yashiro W, Momose A, Ishikawa T, Yamauchi K 2012 Opt. Express 20 24977
[7] Wang H C, Berujon S, Pape I, Rutishauser S, David C, Sawhney K 2013 Opt. Lett. 38 827
[8] Stutman D, Finkenthal M 2012 Appl. Phys. Lett. 101 091108
[9] Lei Y H, Liu X, Guo J C, Zhao Z G, Liu H B 2011 Chin. Phys. B 20 042901
[10] Chapman M S, Ekstrom C R, Hammond T D, Schmiedmayer J, Tannian B E, Wehinger S,. Pritchard D E 1995 Phys. Rev. A 5 1
[11] Solak H H, Ekinci Y 2005 J. Vac. Sci. Technol. 23 2705
[12] Isoyan A, Jiang F, Cheng YC, Cerrina F, Wachulak P, Urbanski L, Rocca J, Menoni C, Marconi M 2009 J. Vac. Sci. Technol. 27 2931
[13] Lee S Y, Cho I H, Kim J M, Yan H, Conley R, Liu C, Macrander AT, Maser J, Stephenson GB, Kang HC, Noh DY 2011 J Appl. Phys. 109 44307
[14] Attwood D 1999 Soft X-rays and Extreme Ultraviolet Radiation Principles and Applications (New York:Cambridge University Press) p357
[15] Gaylord T K, Moharam M G 1982 Phys. Rev. B 28 1
[16] Magnusson R, Gaylord T K 1977 J. Opt. Soc. Am. 9 1165
[17] Chu R, Kong J A 1977 IEEE Trans. Microwave Theory Tech. 1 14
[18] Moharam M G, Gaylord T K 1981 J. Opt. Soc. Am. 7 811
[19] Gaylord T K, Moharam M G 1985 Proc. IEEE 5 894
[20] Zhang G P, Ye J X, Li Z G 1996 Chin. Phys. B 5 817
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