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The effect of via size on the stress migration of Cu interconnects

Wu Zhen-Yu Yang Yin-Tang Chai Chang-Chun Li Yue-Jin Wang Jia-You Liu Bin

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The effect of via size on the stress migration of Cu interconnects

Wu Zhen-Yu, Yang Yin-Tang, Chai Chang-Chun, Li Yue-Jin, Wang Jia-You, Liu Bin
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  • Abstract views:  9835
  • PDF Downloads:  1468
  • Cited By: 0
Publishing process
  • Received Date:  30 June 2007
  • Accepted Date:  18 September 2007
  • Published Online:  05 March 2008

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