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Jiang Yan-Bo, Liu Wen-Bo, Sun Zhi-Peng, La Yong-Xiao, Yun Di. Phase-field simulation of void evolution in UO2 under applied stress. Acta Physica Sinica,
2022, 71(2): 026103.
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Di Lin-Jia, Dai Xian-Ying, Song Jian-Jun, Miao Dong-Ming, Zhao Tian-Long, Wu Shu-Jing, Hao Yue. Calculations of energy band structure and mobility in critical bandgap strained Ge1-xSnx based on Sn component and biaxial tensile stress modulation. Acta Physica Sinica,
2018, 67(2): 027101.
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Zhou Bin, Huang Yun, En Yun-Fei, Fu Zhi-Wei, Chen Si, Yao Ruo-He. Interfacial reaction and failure mechanism of Cu/Ni/SnAg1.8/Cu flip chip Cu pillar bump under thermoelectric stresses. Acta Physica Sinica,
2018, 67(2): 028101.
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Shi Lei, Feng Shi-Wei, Shi Bang-Bing, Yan Xin, Zhang Ya-Min. Degradation induced by voltage and current for AlGaN/GaN high-electron mobility transistor under on-state stress. Acta Physica Sinica,
2015, 64(12): 127303.
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Pei Xiao-Yang, Peng Hui, He Hong-Liang, Li Ping. Study on the effect of peak stress on dynamic damage evolution of high pure copper. Acta Physica Sinica,
2015, 64(5): 054601.
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Dong Gang, Liu Dang, Shi Tao, Yang Yin-Tang. Effects of thermal stress induced by mulitiple through silicon vias on mobility and keep out zone. Acta Physica Sinica,
2015, 64(17): 176601.
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Guo Chun-Sheng, Wan Ning, Ma Wei-Dong, Zhang Yan-Feng, Xiong Cong, Feng Shi-Wei. Rapid identification of the consistency of failure mechanism for constant temperature stress accelerated testing. Acta Physica Sinica,
2013, 62(6): 068502.
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He Liang, Du Lei, Huang Xiao-Jun, Chen Hua, Chen Wen-Hao, Sun Peng, Han Liang. Non-Gaussian analysis of noise for metal interconnection electromigration. Acta Physica Sinica,
2012, 61(20): 206601.
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Lin Xiao-Ling, Xiao Qing-Zhong, En Yun-Fei, Yao Ruo-He. Failure mechanism of FC-PBGA devices under external stress. Acta Physica Sinica,
2012, 61(12): 128502.
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Wu Zhen-Yu, Yang Yin-Tang, Chai Chang-Chun, Liu Li, Peng Jie, Wei Jing-Tian. A microstructure-based study on electromigration in Cu interconnects. Acta Physica Sinica,
2012, 61(1): 018501.
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Wu Zhen-Yu, Dong Si-Wan, Liu Yi, Chai Chang-Chun, Yang Yin-Tang. Resistometric study on electromigration failure in copper interconnects. Acta Physica Sinica,
2012, 61(24): 248501.
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Zhang Jin-Song, Wu Yi-Ping, Wang Yong-Guo, Tao Yuan. Thermomigration in micro interconnects in integrated circuits. Acta Physica Sinica,
2010, 59(6): 4395-4402.
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Zhou Wen, Liu Hong-Xia. Quantitative analysis on median-time-to-fail of copper interconnect with lose object defects. Acta Physica Sinica,
2009, 58(11): 7716-7721.
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Wu Zhen-Yu, Chai Chang-Chun, Li Yue-Jin, Liu Jing, Wang Jia-You, Yang Yin-Tang. The temperature characteristics of stress-induced voiding in Cu interconnects. Acta Physica Sinica,
2009, 58(4): 2625-2630.
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He Liang, Du Lei, Zhuang Yi-Qi, Li Wei-Hua, Chen Jian-Ping. Multiscale entropy complexity analysis of metallic interconnection electromigration noise. Acta Physica Sinica,
2008, 57(10): 6545-6550.
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2007, 56(12): 7176-7182.
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Chen Chun-Xia, Du Lei, He Liang, Hu Jin, Huang Xiao-Jun, Wei Tao. Fractal character of noise in electromigration in metel interconnection. Acta Physica Sinica,
2007, 56(11): 6674-6679.
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Zhang Wen-Jie, Yi Wan-Bing, Wu Jin. Electromigration in Al interconnects and the challenges in ultra-deep submicron technology. Acta Physica Sinica,
2006, 55(10): 5424-5434.
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Zong Zhao-Xiang, Du Lei, Zhuang Yi-Qi, He Liang, Wu Yong. Modeling of resistance changes based on the free volume in VLSI interconnection electromigration. Acta Physica Sinica,
2005, 54(12): 5872-5878.
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Liu Hong-Xia, Zheng Xue-Feng, Hao Yue. Generation mechanism of stress induced leakage current in flash memory cell. Acta Physica Sinica,
2005, 54(12): 5867-5871.
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