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Electromigration in Al interconnects and the challenges in ultra-deep submicron technology

Zhang Wen-Jie Yi Wan-Bing Wu Jin

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Electromigration in Al interconnects and the challenges in ultra-deep submicron technology

Zhang Wen-Jie, Yi Wan-Bing, Wu Jin
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  • Abstract views:  10103
  • PDF Downloads:  3392
  • Cited By: 0
Publishing process
  • Received Date:  06 February 2006
  • Accepted Date:  22 March 2006
  • Published Online:  05 May 2006

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