-
Large-area capacitively coupled discharges are widely used in plasma enhanced chemical vapor deposition (PECVD) processes for solar cell and display manufacturing. With the increase of the chamber size and driving frequency for the purpose of higher production efficiency, the non-uniformity of deposited film induced by standing wave effects becomes severe and deserves more attention and in-depth studies. Based on a fluid model coupled with transmission line model, the potential amplitude distribution on the powered electrode as well as the plasma characteristics in a capacitive plasma sustained in a silane/hydrogen discharge driven at 27.12 MHz, with 2 m square electrodes, are investigated. This work identifies three critical control parameters: pressure, silane content, and input power, with particular emphasis on radial wave attenuation caused by electron-neutral elastic collisions. The simulation results are validated by industrial experimental results, confirming the relationship between the distributions of potential amplitude on the powered electrode and the film thickness.
Two distinct mechanisms emerge from the analysis. Under low silane content with high power conditions, the surface wave radial attenuation is not significant and the surface wave wavelength variations dominate the potential amplitude distribution on the powered electrode. Conversely, in the case of high silane content and low power, significant radial attenuation of the surface wave leads to noticeable weakening of the standing wave effect due to higher electron-neutral collision frequency. Neglecting the radial attenuation of the surface wave would result in significant deviations in the potential amplitude distribution on the powered electrode, as shown in the following figure.
Strategies such as adjusting power input positions or using multiple power input are studied to improve uniformity, but the improvements are still limited. Although it requires strict parameter control and machining precision, the shaped electrode demonstrates remarkable uniformity improvement of the potential distribution. In future work, it is necessary to further analyze the impact of the standing wave effects on the radial distributions of electron, ions, and neutral radicals under complex conditions, such as different chamber structures, gas flows, and temperature distributions, as well as the impact on the quality of deposited films. This will enable a more comprehensive and accurate study of standing wave effects, providing support and guidance for solving real industrial problems.-
Keywords:
- Capacitive coupling discharge /
- PECVD /
- standing wave effect
-
[1] Yu C, Gao K, Peng C-W, He C, Wang S, Shi W, Allen V, Zhang J, Wang D, Tian G, Zhang Y F, Jia W Z, Song Y H, Hu Y, Colwell J, Xing C, Ma Q, Wu H, Guo L, Dong G, Jiang H, Wu H, Wang X, Xu D, Li K, Peng J, Liu W, Chen D, Lennon A, Cao X, De Wolf S, Zhou J, Yang X and Zhang X 2023 Nat. Energy 8 1375
[2] Crose M, Kwon J S I, Tran A and Christofides P D 2017 Renewable Energy 100 129
[3] Crose M, Sang Il Kwon J, Nayhouse M, Ni D and Christofides P D 2015 Chem. Eng. Sci 136 50
[4] Schmidt H 2006 Characterization of a high-density, large-area VHF plasma source (Lausanne: EPFL)
[5] Schmitt J P M 1989 Thin Solid Films 174 193
[6] Meyyappan M and Colgan M J 1996 J. Vac. Sci. Technol. A 14 2790
[7] Surendra M and Graves D B 1991 Appl. Phys. Lett 59 2091
[8] Curtins H, Wyrsch N, Favre M and Shah A V 1987 Plasma Chem Plasma P 7 267
[9] Liu Y X, Zhang Q Z, Zhao K, Zhang Y R, Gao F, Song Y H and Wang Y N 2022 Chin. Phys. B 31 085202
[10] Kim H J and Lee H J 2017 J. Phys. D: Appl. Phys. 122 053301
[11] Kim H J and Lee H J 2017 Plasma Sources Sci. Technol. 26 085003
[12] Kim H J 2021 Vacuum 187 110104
[13] Kim H J and Lee H J 2016 Plasma Sources Sci. Technol. 25 065006
[14] Schmidt H, Sansonnens L, Howling A A, Hollenstein Ch, Elyaakoubi M and Schmitt J P M 2004 J. Appl. Phys. 95 4559
[15] Sansonnens L, Pletzer A, Magni D, Howling A A, Hollenstein C and Schmitt J P M 1997 Plasma Sources Sci. Technol. 6 170
[16] Lieberman M A, Booth J P, Chabert P, Rax J M and Turner M M 2002 Plasma Sources Sci. Technol. 11 283
[17] Chabert P, Raimbault J L, Rax J M and Lieberman M A 2004 Phys. Plasmas 11 1775
[18] Lee I, Graves D B and Lieberman M A 2008 Plasma Sources Sci. Technol. 17 015018
[19] Lieberman M A, Lichtenberg A J, Kawamura E and Marakhtanov A M 2015 Plasma Sources Sci. Technol. 24 055011
[20] Wen D Q, Kawamura E, Lieberman M A, Lichtenberg A J and Wang Y N 2017 J. Phys. D: Appl. Phys. 50 495201
[21] Zhao K, Liu Y X, Kawamura E, Wen D Q, Lieberman M A and Wang Y N 2018 Plasma Sources Sci. Technol. 27 055017
[22] Lieberman M A, Kawamura E and Chabert P 2022 Plasma Sources Sci. Technol. 31 114007
[23] Liu J K, Zhang Y R, Zhao K, Wen D Q and Wang Y N 2021 Plasma Sci. Technol. 23 035401
[24] Liu Y X, Gao F, Liu J and Wang Y N 2014 J. Appl. Phys. 116 043303
[25] Han D M, Liu Y X, Gao F, Wang X Y, Li A, Xu J, Jing Z G and Wang Y N 2018 J. Appl. Phys.123 223304
[26] Han D M, Su Z X, Zhao K, Liu Y X, Gao F and Wang Y N 2021 Plasma Sci. Technol. 23 055402
[27] Sansonnens L, Schmidt H, Howling A A, Hollenstein Ch, Ellert Ch and Buechel A 2006 J. Vac. Sci. Technol. A 24 1425
[28] Chen Z, Rauf S and Collins K 2010 J. Appl. Phys. 108 073301
[29] Faraz T, Arts K, Karwal S, Knoops H C M and Kessels W M M 2019 Plasma Sources Sci. Technol. 28 024002
[30] Kuboi N 2023 J. Micro/Nanopattern. Mats. Metro. 22 041502
[31] Oehrlein G S, Brandstadter S M, Bruce R L, Chang J P, DeMott J C, Donnelly V M, Dussart R, Fischer A, Gottscho R A, Hamaguchi S, Honda M, Hori M, Ishikawa K, Jaloviar S G, Kanarik K J, Karahashi K, Ko A, Kothari H, Kuboi N, Kushner M J, Lill T, Luan P, Mesbah A, Miller E, Nath S, Ohya Y, Omura M, Park C, Poulose J, Rauf S, Sekine M, Smith T G, Stafford N, Standaert T and Ventzek P L G 2024 J. Vac. Sci. Technol. B 42 041501
[32] Chang J and Chang J P 2017 J. Phys. D: Appl. Phys. 50 253001
[33] Qiu H T, Wang Y N, Ma T C Acta Phys. Sin. 2002 51 1332 （邱华檀, 王友年, 马腾才 2002 51 1332）
[34] Tinck S and Bogaerts A 2012 Plasma Processes & Polym. 9 522
[35] Kessels W M M, Hoefnagels J P M, Boogaarts M G H, Schram D C and Van De Sanden M C M 2001 J. Appl. Phys. 89 2065
[36] Liu J K 2022 Simulation study of nonlinear harmonics and resonance effects in very high frequency capacitively coupled plasmas Dalian: Dalian University of Technology （刘建凯 2022 甚高频容性耦合等离子体中非线性谐波和共振效应的模拟研究 大连：大连理工大学）
[37] Sansonnens L 2005 J. Appl. Phys. 97 063304
[38] Jia W Z, Wang X F, Song Y H and Wang Y N 2017 J. Phys. D: Appl. Phys. 50 165206
[39] Jia W Z, Liu R Q, Wang X F, Liu X M, Song Y H and Wang Y N 2018 Phys. Plasmas 25 093501
[40] Bleecker K D, Bogaerts A, Gijbels R and Goedheer W 2004 Phys. Rev. E 69 056409
[41] Brinkmann R P 2007 J. Appl. Phys. 102 093303
Metrics
- Abstract views: 47
- PDF Downloads: 4
- Cited By: 0
下载:
