双频容性耦合等离子体相分辨发射光谱诊断

杜永权; 刘文耀; 朱爱民; 李小松; 赵天亮; 刘永新; 高飞; 徐勇; 王友年

doi:10.7498/aps.62.205208

摘要

采用相分辨发射光谱法, 对双频容性耦合纯Ar和不同含O2量的Ar-O2混合气体放电等离子体的鞘层激发模式进行了探究. 在射频耦合电源上极板的鞘层区域处观察到两种电子激发模式: 鞘层扩张引起的电子碰撞激发模式和二次电子引起的电子碰撞激发模式; 并发现这两种激发模式均受到低频射频电源周期的调制. 在纯Ar放电等离子体中, 两种激发模式的激发轮廓相似; 而在Ar-O2混合气放电等离子体中, 随着含O2量的增加, 二次电子的激发轮廓变弱. 此外, 利用相分辨发射光谱法对不同含O2量的Ar-O2混合气放电下Ar的 750.4 nm谱线的平均低频电源周期轴向分布进行了研究, 得到了距耦合电源上极板约3.8 mm处为双频容性耦合射频等离子体的鞘层边界.

关键词:

Abstract

In this article we use phase resolved optical emission spectroscopy to study emission pattern in plasma sheath of dual frequency capacitively coupled plasma in Ar and Ar-O2 discharge. Two emission patterns are found in sheath region of radio frequency coupled powered electrode. The first pattern is related to electron impact excitation because of the sheath expansion. The second pattern is caused by electron impact excitation of secondary electrons. Two emission patterns are also highly modulated with the low frequency cycle. Under the condition of argon discharge, the emission intensities of the two excitation processes are very similar. The emission structure by secondary electrons becomes weak with the increase of O2 content in the gas mixture. In addition, we also use phase resolved optical emission spectroscopy to study low frequency cycle averaged axial emission profile of excited atomic argon at 751 nm in Ar-O2 mixture gas. Distance from the powered electrode (about 3.8 mm) is defined as the boundary sheath of dual frequency capacitively coupled plasma.

Keywords:

dual frequency capacitively coupled plasma /
plasma sheaths /
optical emission spectroscopy

作者及机构信息

1.
大连理工大学等离子体物理化学实验室, 大连 116024;

2.
大连理工大学物理与光电工程学院, 大连 116024

基金项目: 国家自然科学基金(批准号: 10975029)和国家重大科技专项(批准号: 2011ZX02403-001) 资助的课题.

Authors and contacts

1.
Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian, 116024, China;

2.
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

Funds: Project supported by National Natural Science Foundation of China (Grant No. 10975029) and the Major National Science and Technology Project of China (Grant No. 2011ZX02403-001).

参考文献

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施引文献

[1]	Lieberman M A 2005 The 27th International Conference on Pheno-mena in Ionised Gases Eindhoven, the Netherlands, July 17-22, 2005 p6
[2]
[3]	Boyle P C, Ellingboe A R, Turner M M 2004 Plasma Sour. Sci. Technol. 13 493
[4]	Kitajima T, Takeo Y, Petrovic Z L, Makabe T 2000 Appl. Phys. Lett. 77 489
[5]
[6]	Denda T, Miyoshi Y, Komukai Y, Goto T, Petrovic Z L, Makabe T 2004 J. Appl. Phys. 95 870
[7]
[8]	Kawamura E, Lieberman M A, Lichtenberg A J 2006 Phys. Plasmas 13 053506
[9]
[10]	Turner M M, Chabert P 2006 Phys. Rev. Lett. 96 205001
[11]
[12]
[13]	Jiang X Z, Liu Y X, Yang S, Lu W Q, Bi Z H, Li X S, Wang Y N 2011 J. Vac. Sci. Technol. A 29 011006
[14]	Yuan Q H, Yin G Q, Xin Y, Ning Z Y 2011 Phys. Plasmas 18 053501
[15]
[16]	Liu Y X, Zhang Q Z, Jiang W, Hou L J, Jiang X Z, Lu W Q, Wang Y N 2011 Phys. Rev. Lett. 107 055002
[17]
[18]
[19]	Schulze J, Schngel E, Donk Z, Luggenhlscher D, Czarnetzki U 2010 J. Phys. D: Appl. Phys. 43 124016
[20]
[21]	de Rosny G, Mosburg E R, Abelson J R, Devaud G, Kerns R C 1983 J. Appl. Phys. 54 2272
[22]
[23]	Ishimaru M, Ohba T, Ohmori T, Yagisawa T, Kitajima T, Makabe T 2008 Appl. Phys. Lett. 92 071501
[24]
[25]	Mahony C M O, Graham W G 1999 IEEE Trans. Plasma Sci. 27 72
[26]
[27]	Mahony C M O, Wazzan R A, Graham W G 1997 Appl. Phys. Lett. 71 608
[28]
[29]	Dittmann K 2009 Ph. D. Dissertation (Greifswald: Ernst-Moritz-Arndt University of Greifswald)
[30]	Mutsukura N, Kobayashi K, Machi Y 1989 J. Appl. Phys. 66 4688
[31]
[32]	Dittmann K, Drozdov D, Krames B, Meichsner J 2007 J. Phys. D: Appl. Phys. 40 6593
[33]
[34]	Dittmann K, Matyash K, Nemschokmichal S, Meichsner J, Schneider R 2010 Contrib. Plasma. Phys. 50 942
[35]
[36]
[37]	Gans T, Der Gathen V S V, Czarnetzki U, Dobele H F 2002 Contrib. Plasma Phys. 42 596
[38]
[39]	Gans T, Lin C C, Schulz von der Gathen V, Dbele H F 2003 Phys. Rev. A 67 012707
[40]	Gans T, Schulz von der Gathen V, Dbele H F 2004 Contrib. Plasma Phys. 44 523
[41]
[42]
[43]	Booth J P, Hancock G, Perry N D, Toogood M J 1989 J. Appl. Phys. 66 5251
[44]
[45]	Gans T, Gathen V S-v d, Dbele H F 2001 Plasma Sour. Sci. Technol. 10 17
[46]
[47]	Gans T, Schulze J, OConnell D, Czarnetzki U, Faulkner R, Ellingboe A R, Turner M M 2006 Appl. Phys. Lett. 89 261502
[48]
[49]	Schulze J, Gans T, OConnell D, Czarnetzki U, Ellingboe A R, Turner M M 2007 J. Phys. D: Appl. Phys. 40 7008
[50]	Jiang X Z, Liu Y X, Bi Z H, Lu W Q, Wang Y N 2012 Acta Phys. Sin. 61 015204 (in Chinese) [蒋相站, 刘永新, 毕振华, 陆文琪, 王友年 2012 61 015204]
[51]
[52]
[53]	National Institute of Standards and Technology Atomic Spectra Database, ASD Version 3, www.physics.nist.gov [2013]
[54]
[55]	Sadeghi N, Setser D W, Francis A, Czarnetzki U, Dbele H F 2001 J. Chem. Phys. 115 3144
[56]
[57]	Czarnetzki U, Luggenhlscher D, Dbele H F 1998 Plasma Sources Sci. Technol. 8 230
[58]
[59]	Gans T, Lin C C, Schulz von der Gathen V, Dbele H F 2001 J. Phys. D: Appl. Phys. 34 L39
[60]
[61]	Mutsukura N, Kobayashi K, Machi Y 1989 J. Appl. Phys. 66 4688
[62]
[63]	Mutsukura N, Kobayashi K, Machi Y 1990 J. Appl. Phys. 68 2657

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