辅助放电下刷状空气等离子体羽的放电特性和参数诊断

张雪雪; 贾鹏英; 冉俊霞; 李金懋; 孙换霞; 李雪辰

doi:10.7498/aps.73.20231946

摘要

大气压等离子体射流(APPJ)能产生富含活性粒子的等离子体羽, 在众多领域具有广泛的应用前景. 从应用角度考虑, 如何产生大尺度弥散等离子体羽是APPJ研究的热点之一. 目前, 利用惰性气体APPJ已经能产生令人满意的大尺度等离子体羽, 但从经济性上考虑, 如何产生大尺度空气等离子体羽更具有应用价值. 针对于此, 本工作设计了一个具有辅助放电的APPJ, 产生了大尺度刷形空气等离子体羽. 结果表明, 刷状空气等离子体羽可以在一定电压峰值(V_p)内产生, 并且随着V_p增大等离子体羽的长度和发光强度都增大. 电压和发光信号波形表明, 每半个电压周期最多会有一次放电. 每半个电压周期的放电概率和光脉冲的强度都随着V_p增大而增大, 但放电起始时刻的电压值会随着V_p增大而降低. 高速影像研究表明弥散刷形空气等离子体羽和小尺度空气等离子体羽的产生机制类似, 均源于分叉正流光的时间叠加. 此外, 采集了刷形空气等离子体羽的发射光谱, 并利用其对放电的电子温度、电子密度、分子振动温度和气体温度进行了研究. 结果表明, 等离子体羽的气体温度较低, 且基本不随V_p变化. 然而电子密度、电子温度和分子振动温度均随着V_p增大而升高. 利用激光诱导荧光光谱技术研究了等离子体羽的OH浓度, 发现OH分布较为均匀, 且其浓度随着V_p增大而增大. 最后, 对这些变化规律进行定性分析.

关键词:

Abstract

Atmospheric pressure plasma jet (APPJ) can produce plasma plumes rich in active species, which has a wide scope of applications. From the perspective of applications, it is one of the hot issues in APPJ research to generate a diffuse plasma plume on a large scale. At present, large-scale plasma plume has been produced by noble working gases, which is more economic and valuable if it is reproduced by air used as the working gas. In this work, an APPJ with an auxiliary discharge is proposed, with which a large-scale air plasma plume with a brush shape is produced. Results indicate that the brush-shaped air plume can exist by changing voltage amplitude (V_p) in a certain range. The length and brightness of the plasma plume increase with V_p increasing. The waveforms of voltage and light emission signalindicate that the discharge can start at most once within half a cycle of applied voltage. The probability of discharge and the intensity of light emission pulse for each half a voltage cycle increase with V_p increasing, but the voltage value at the discharge moment decreases with V_p increasing. High-speed imaging study shows that the generation mechanisms of diffuse brush-shaped air plasma plumes and small-scale air plasma are similar, both originating from the temporal superposition of bifurcated normal flow light. In addition, optical emission spectra from the brush-shaped air plasma plume are utilized to study electron temperature, electron density, molecular vibrational temperature, and gas temperature. With V_p increasing, gas temperature is low and almost unchanged, while electron density, electron temperature, and molecular vibrational temperature increase. In addition, OH concentration of the plasma plume is investigated by laser-induced fluorescence, indicating that OH is uniformly distributed, and its concentration increases with the V_p increasing. All these results mentioned above are qualitatively analyzed.

Keywords:

作者及机构信息

1.
河北大学物理科学与技术学院, 保定　071002

2.
黑龙江工业学院电气与信息工程学院, 鸡西　158100

通信作者: 李雪辰, plasmalab@126.com

基金项目: 国家自然科学基金(批准号: 12375250, 11875121, 51977057, 11805013)、河北省自然科学基金(批准号: A2023201012, A2020201025,A2022201036)和黑龙江省省属本科高校基本科研业务费(批准号: 2022-KYYWF-0475)资助的课题.

Authors and contacts

1.
College of Physics Science and Technology, Hebei University, Baoding 071002, China

2.
School of Electrical and Information Engineering, Heilongjiang University of Technology, Jixi 158100, China

Corresponding author: Li Xue-Chen, plasmalab@126.com

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 12375250, 11875121, 51977057, 11805013), the Natural Science Foundation of Hebei Province, China (Grant Nos. A2023201012, A2020201025, A2022201036), and the Fundamental Research Funds for the Undergraduate Universities in Heilongjiang Province, China (Grant No. 2022-KYYWF-0475).

文章全文 : translate this paragraph

参考文献

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施引文献

图 1 实验装置示意图

Fig. 1. Schematic diagram of the experimental setup.

下载: 全尺寸图片幻灯片

图 2 曝光时间(t_exp)为0.5 s, 不同V_p下等离子体羽的照片　(a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV

Fig. 2. Images of the plasma plume under different V_p with an exposure time (t_exp) of 0.5 s: (a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV.

下载: 全尺寸图片幻灯片

图 3 外加电压和发光信号的波形, (a)—(d)分别对应图2(a)—(d)

Fig. 3. Waveforms of applied voltage and light emission signal from the plasma plume, (a)–(d) correspond to Fig. 2(a)-(d), respectively.

下载: 全尺寸图片幻灯片

图 4 (a) V_inc随V_p的变化关系; (b) 平均发光脉冲强度和每半个电压周期内放电概率随V_p的变化关系

Fig. 4. (a) V_inc as a function of V_p; (b) average pulse intensity and probability per voltage half cycle as functions of V_p.

下载: 全尺寸图片幻灯片

图 5 不同t_exp下等离子体羽的ICCD图像, V_p为14.0 kV

Fig. 5. ICCD images of the plasma plume with varying t_exp, V_p is 14.0 kV.

下载: 全尺寸图片幻灯片

图 6 等离子体羽的总发射光谱

Fig. 6. Optical emission spectrum of the plasma plume.

下载: 全尺寸图片幻灯片

图 7 谱线强度比I_{371 nm}/I_{380 nm} (a)与I_{391 nm}/I_{380 nm} (b)随V_p的变化关系

Fig. 7. Line intensity ratios of I_{371 nm}/I_{380 nm} (a) and I_{391 nm}/I_{380 nm} (b) as functions of V_p.

下载: 全尺寸图片幻灯片

图 8 T_g (a)和T_v (b)的拟合图, T_g (c)和T_v (d)随V_p 的变化关系

Fig. 8. A fitting process to calculate T_g (a) and T_v (b); T_g (c) and T_v (d) as functions of V_p.

下载: 全尺寸图片幻灯片

图 9 不同V_p下等离子体羽的LIF照片　(a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV

Fig. 9. Images of laser induced fluorescence under different V_p: (a) 9.0 kV; (b) 10.8 kV; (c) 12.4 kV; (d) 14.0 kV.

下载: 全尺寸图片幻灯片

map

[1]	Naidis G V, Sosnin E A, Panarin V A, Skakun V S, Tarasenko V F 2016 IEEE Trans. Plasma Sci. 44 3249 Google Scholar
[2]	Reuter S, Von Woedtke T, Weltmann K D 2018 J. Phys. D Appl. Phys. 51 233001 Google Scholar
[3]	Li X C, Liu R J, Li X N, Gao K, Wu J C, Gong D D, Jia P Y 2019 Phys. Plasmas 26 023510 Google Scholar
[4]	Chen S L, Cheng T, Chen Z Q, Chen X Y, Zhang G J 2021 Appl. Surf. Sci. 544 148956 Google Scholar
[5]	Jia P Y, Jia H X, Ran J X, Wu K Y, Wu J C, Pang X X, Li X C 2023 Chin. Phys. B 32 085202 Google Scholar
[6]	Gangal U, Exarhos S, Contreras T, Rich C C, Dolan K, Yang V, Frontiera R R, Bruggeman P 2022 Plasma Process. Polym. 19 e2200031 Google Scholar
[7]	Xuan L T Q, Nguyen L N, Dao N T 2021 Nanotechnol. 33 105603
[8]	Ning W, Dai D, Zhang Y H 2019 Appl. Phys. Lett. 114 054104 Google Scholar
[9]	Satale V V, Ganesh V, Dey A, Krishnamurthy S, Bhat S V 2021 Int. J. Hydrogen Energy 46 12715 Google Scholar
[10]	Liu D W, Zhang Y Z, Xu M Y, Chen H X, Lu X P, Ostrikov K K 2020 Plasma Process. Polym. 17 e1900218 Google Scholar
[11]	Xu Z M, Lan Y, Ma J, Shen J, Han W, Hu S H, Ye C B, Xi W H, Zhang Y D, Yang C J, Zhao X, Cheng C 2020 Plasma Sci. Technol. 22 103001 Google Scholar
[12]	Lata S, Chakravorty S, Mitra T, Pradhan P K, Mohanty S, Patel P, Jha E, Panda P K, Verma S K, Suar M 2022 Mater. Today Bio. 13 100200 Google Scholar
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[21]	Darny T, Bauville G, Fleury M, Pasquiers S, Sousa J S 2021 Plasma Sources Sci. Technol. 30 105021 Google Scholar
[22]	Matsusaka S 2019 Adv. Powder Technol. 30 2851 Google Scholar
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[35]	Wu S Q, Liu X Y, Mao W H, Chen W, Liu C, Zhang C H 2018 J. Appl. Phys. 124 243302 Google Scholar
[36]	Liu K, Zhang X H, Zhou X F, Huo X M, Wang X H, Ostrikov K K 2022 J. Phys. D Appl. Phys. 55 485202 Google Scholar
[37]	Liu K, Hu H, Lei J, Hu Y, Zheng Z 2016 Phys. Plasmas 23 123510 Google Scholar
[38]	Lu X P, Liu D W, Xian Y B, Nie L L, Cao Y G, He G Y 2021 Phys. Plasmas 28 100501 Google Scholar
[39]	Yang Y W, Wu J Y, Chiang M H, Wu J S 2012 IEEE Trans. Plasma Sci. 40 3003 Google Scholar
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[41]	Li X C, Bao W T, Chu J D, Zhang P P, Jia P Y 2015 Plasma Sources Sci. Technol. 24 065020 Google Scholar
[42]	Li X C, Wu K Y, Liu R J, Yang L W, Geng J L, Wang B, Jia P Y 2019 IEEE Trans. Plasma Sci. 47 1330 Google Scholar
[43]	Li Z, Liu J, Lu X 2020 Plasma Sources Sci. Technol. 29 045015 Google Scholar
[44]	Wu J C, Jia P Y, Ran J X, Chen J Y, Zhang F R, Wu K Y, Zhao N, Ren C H, Yin Z Q, Li X C 2021 Phys. Plasmas 28 073501 Google Scholar
[45]	卢新培, 吴帆, 李嘉胤 2021 高电压技术 47 1831 Google Scholar Lu X P, Wu F, Li J Y 2021 High Voltage Eng. 47 1831 Google Scholar
[46]	Jiang J K, Gonzalvo Y A, Bruggeman P J 2020 Plasma Sources Sci. Technol. 29 045023 Google Scholar
[47]	Darny T, Pouvesle J M, Fontane J, Joly L, Dozias S, Robert E 2017 Plasma Sources Sci. Technol. 26 105001 Google Scholar
[48]	Lichten W 1957 J. Chem. Phys. 26 306 Google Scholar
[49]	Akishev Y, Aponin G, Petryakov A, Trushkin N 2018 J. Phys. D Appl. Phys. 51 274006 Google Scholar
[50]	Yuri R P 1991 Gas Discharge Physics (New York: Springer-Verlag) pp53–60
[51]	Lu X P, Laroussi M 2006 J. Appl. Phys. 100 063302 Google Scholar
[52]	Wu J C, Li X C, Ran J X, Jia H X, Wu K Y, Han G X, Liu J N, Chen J Y, Pang X X, Jia P Y 2023 Plasma Process. Polym. 20 e2200188 Google Scholar
[53]	Wu K Y, Zhao N, Niu Q M, Wu J C, Zhou S, Jia P Y, Li X C 2022 Plasma Sci. Technol. 24 055405 Google Scholar
[54]	Belmonte T, Noël C, Gries T, Martin J, Henrion G 2015 Plasma Sources Sci. Technol. 24 064003 Google Scholar
[55]	Li X C, Zhou S, Gao K, Ran J X, Wu K Y, Jia P Y 2022 IEEE Trans. Plasma Sci. 50 1717 Google Scholar
[56]	Ran J X, Zhang X X, Zhang Y, Wu K Y, Zhao N, He X R, Dai X H, Liang Q H, Li X C 2023 Plasma Sci. Technol. 25 055403 Google Scholar
[57]	Masoud N, Martus K, Figus M, Becker K 2005 Contrib. Plasma Phys. 45 32 Google Scholar
[58]	Yue Y F, Wu F, Cheng H, Xian Y B, Liu D W, Lu X P, Pei X K 2017 J. Appl. Phys. 121 033302 Google Scholar

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