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An atmospheric-pressure argon plasma discharge with a length of 63 cm is generated in a quartz capillary by using a pair of hollow needle electrodes. The discharge mode transition from abnormal glow to arc is investigated by means of electrical measurement and optical emission spectroscopy. The effects of the distance between two needle electrodes and the operating frequency of power supply on the voltage-current characteristics are discussed. The plasma electron density was estimated to be the order of 1014 cm-3 in the arc discharge. Moreover, the variation of gas temperature with the applied voltage is also studied, which is closely associated with the power dissipation. Furthermore, in measuring the oxygen atoms generated in argon/oxygen arc plasma discharge by optical actinometry, we found that the amount of oxygen atoms almost does not change with the rise of oxygen concentration.
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Keywords:
- atmospheric pressure plasma /
- abnormal glow discharge /
- arc discharge /
- optical emission spectroscopy
[1] ［1］Ni T L, Ding F, Zhu X D, Wen X H, Zhou H Y 2008 Appl. Phys. Lett. 92 241503
[2] ［2］Laroussi M, Hynes W, Akan T, Lu X P, Tendero C 2008 IEEE Trans. Plasma Sci. 36 1298
[3] ［3］Kim D B, Rhee J K, Gweon B, Moon S Y, Choe W 2007 Appl. Phys. Lett. 91 151502
[4] ［4］Li S Z, Lim J P, Uhm H S 2006 Phys. Lett. A 360 304
[5] ［5］Qi B, Ren C S, Ma T C, Wang Y N, Wang D Z 2006 Acta Phys. Sin. 55 331 (in Chinese) ［齐冰、任春生、马腾才、王友年、王德真 2006 55 331］
[6] ［6］Anghel S D, Simon A 2007 Plasma Sour. Sci. Technol. 16 B1
[7] ［7］Lu X, Xiong Q, Xiong Z, Hu J, Zhou F, Gong W, Xian Y, Zou C, Tang Z, Jiang Z, Pan Y 2009 J. Appl. Phys. 105 043304
[8] ［8］Sands B L, Ganguly B N, Tachibana K 2008 Appl. Phys. Lett. 92 151503
[9] ［9］Li S Z, Lim J P 2008 Plasma Sci. Technol. 10 61
[10] ］Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504
[11] ］Chen G L, Chen S H, Chen W X, Yang S Z 2008 Chin. Phys. B 18 4568
[12] ］Shin D H, Hong Y C, Uhm H S 2006 IEEE Trans. Plasma Sci. 34 2464
[13] ］Hong Y C, Cho S C, Kim J H, Uhm H S 2007 Phys. Plasmas 14 074502
[14] ］Pointu A M, Ricard A, Odic E, Ganciu M 2008 Plasma Process. Polym. 5 559
[15] ］Yoshiki H, Saito T 2008 J. Vac. Sci. Technol. A 26 338
[16] ］Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502
[17] ］Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Phys. Plasmas 16 073503
[18] ］Hong Y C, Cho S C, Uhm H S 2007 Appl. Phys. Lett. 90 141501
[19] ］Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Appl. Phys. Lett. 94 111501
[20] ］Moon S Y, Choe W 2003 Spectroch. Acta B 58 249
[21] ］Walkup R E, Saenger K L, Selwyn G S 1986 J. Chem. Phys. 84 2668
[22] ］Lieberman M A， Lichtenberg A J 2007 Principles of Plasma Discharges and Materials Processing(Beijing: Science Press) p208 (in Chinese) ［力伯曼M A、里登伯格A J 2007 等离子体放电原理与材料处理（中译本）（北京：科学出版社）第208页］
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[1] ［1］Ni T L, Ding F, Zhu X D, Wen X H, Zhou H Y 2008 Appl. Phys. Lett. 92 241503
[2] ［2］Laroussi M, Hynes W, Akan T, Lu X P, Tendero C 2008 IEEE Trans. Plasma Sci. 36 1298
[3] ［3］Kim D B, Rhee J K, Gweon B, Moon S Y, Choe W 2007 Appl. Phys. Lett. 91 151502
[4] ［4］Li S Z, Lim J P, Uhm H S 2006 Phys. Lett. A 360 304
[5] ［5］Qi B, Ren C S, Ma T C, Wang Y N, Wang D Z 2006 Acta Phys. Sin. 55 331 (in Chinese) ［齐冰、任春生、马腾才、王友年、王德真 2006 55 331］
[6] ［6］Anghel S D, Simon A 2007 Plasma Sour. Sci. Technol. 16 B1
[7] ［7］Lu X, Xiong Q, Xiong Z, Hu J, Zhou F, Gong W, Xian Y, Zou C, Tang Z, Jiang Z, Pan Y 2009 J. Appl. Phys. 105 043304
[8] ［8］Sands B L, Ganguly B N, Tachibana K 2008 Appl. Phys. Lett. 92 151503
[9] ［9］Li S Z, Lim J P 2008 Plasma Sci. Technol. 10 61
[10] ］Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504
[11] ］Chen G L, Chen S H, Chen W X, Yang S Z 2008 Chin. Phys. B 18 4568
[12] ］Shin D H, Hong Y C, Uhm H S 2006 IEEE Trans. Plasma Sci. 34 2464
[13] ］Hong Y C, Cho S C, Kim J H, Uhm H S 2007 Phys. Plasmas 14 074502
[14] ］Pointu A M, Ricard A, Odic E, Ganciu M 2008 Plasma Process. Polym. 5 559
[15] ］Yoshiki H, Saito T 2008 J. Vac. Sci. Technol. A 26 338
[16] ］Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502
[17] ］Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Phys. Plasmas 16 073503
[18] ］Hong Y C, Cho S C, Uhm H S 2007 Appl. Phys. Lett. 90 141501
[19] ］Li S Z, Huang W T, Zhang J L, Wang D Z 2009 Appl. Phys. Lett. 94 111501
[20] ］Moon S Y, Choe W 2003 Spectroch. Acta B 58 249
[21] ］Walkup R E, Saenger K L, Selwyn G S 1986 J. Chem. Phys. 84 2668
[22] ］Lieberman M A， Lichtenberg A J 2007 Principles of Plasma Discharges and Materials Processing(Beijing: Science Press) p208 (in Chinese) ［力伯曼M A、里登伯格A J 2007 等离子体放电原理与材料处理（中译本）（北京：科学出版社）第208页］
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