-
II-oxides wide-bandgap semiconductor, including the beryllium oxide (BeO), magnesium oxide (MgO), zinc oxide (ZnO), have large exciton binding energy (ZnO 60 meV, MgO 80 meV), high optical gain (ZnO 300 cm–1) and wide tunable band gap (3.37 eV ZnO, MgO 7.8 eV, BeO 10.6 eV), which are the advantages of achieving low-threshold laser devices in the ultraviolet wavelength. It is also one of the important candidates to replace the traditional gas arc lamp (such as mercury lamp, deuterium lamp, excimer lamp, xenon lamp etc.) as the source of deep ultraviolet and even vacuum ultraviolet. Although, during the past decades, the ZnO-based pn homojunction devices have made great progress in the near-UV electroluminescence, but as the band gap broadens, the acceptor (or donor) ionization energy becomes higher (On the order of hundreds meV), which causing the room temperature equivalent thermal energy (26 meV) cannot make the impurities ionizing effectively. In addition, the self-compensation effect in the doping process further weakens the carrier yield. These above drawbacks have become the bottleneck that hinders II-oxides wide-bandgap semiconductor from achieving ultraviolet laser devices and expanding to shorter wavelengths, and are also a common problem faced by other wide-bandgap semiconductor materials. The regulation of the electrical and luminescent properties of materials often depends on the control of critical defect states. The rich point defects and their combination types make the II-oxides wide-bandgap semiconductors an important platform for studying defect physics. For the identification and characterization of specific point defects, it is expected to discover and further construct shallower defect states, which will provide a basis for the regulation of electrical performance. In this paper, recent research results of II-oxides wide-bandgap semiconductors will be described from three aspects: high-quality epitaxial growth, impurity and point defects, p-type doping and ultraviolet electroluminescence. Through the overview of related research works, II-oxides wide-bandgap semiconductors are clarified as deep ultraviolet light sources materials. Meanwhile, indicates that the key to the regulation of electrical performance in the future lies in the regulation of point defects.
-
Keywords:
- wide-bandgap /
- point defects /
- doping /
- ionization energy
[1] Prakash V, Agarwal A, Mussada E K 2019 Silicon 11 1617Google Scholar
[2] Neubert M, Rudolph P 2001 Prog. Cryst. Growth Charact. Mater. 43 119Google Scholar
[3] Mullin J B 2004 J. Cryst. Growth 264 578Google Scholar
[4] Nakamura S 2015 Rev. Mod. Phys. 87 1139Google Scholar
[5] Akasaki I 2015 Rev. Mod. Phys. 87 1119Google Scholar
[6] Amano H 2015 Rev. Mod. Phys. 87 1133Google Scholar
[7] Liang Y H, Towe E 2018 Appl. Phys. Rev. 5 011107Google Scholar
[8] Walsh A, Zunger A 2017 Nat. Mater. 16 964Google Scholar
[9] Chen Y F, Ko H J, Hong S K, Yao T, Segawa Y 2000 J. Cryst. Growth 214 87Google Scholar
[10] Chen Y F, Ko H J, Hong S K, Yao T 2000 Appl. Phys. Lett. 76 559Google Scholar
[11] Fons P, Iwata K, Yamada A, Matsubara K, Niki S, Nakahara K, Tanabe T, Takasu H 2000 Appl. Phys. Lett. 77 1801Google Scholar
[12] Fons P, Iwata K, Niki S, Yamada A, Matsubara K, Watanabe M 2000 J. Cryst. Growth 209 532Google Scholar
[13] Liu J S, Shan C X, Wang S P, Sun F, Yao B, Shen D Z 2010 J. Cryst. Growth 312 2861Google Scholar
[14] Kato H, Miyamoto K, Sano M, Yao T 2004 Appl. Phys. Lett. 84 4562Google Scholar
[15] Hong S K, Hanada T, Ko H J, Chen Y F, Yao T, Imai D, Araki K, Shinohara M, Saitoh K, Terauchi M 2002 Phys. Rev. B 65 115331Google Scholar
[16] Park J S, Hong S K, Minegishi T, Park S H, Im I H, Hanada T, Cho M W, Yao T, Lee J W, Lee J Y 2007 Appl. Phys. Lett. 90 201907Google Scholar
[17] Xie X H, Li B H, Zhang Z Z, Wang S P, Shen D Z 2018 Sci. Rep. 8 17020Google Scholar
[18] Helbig R 1972 J. Cryst. Growth. 15 25Google Scholar
[19] Look D C, Reynolds D C, Sizelove J R, Jones R L, Litton C W, Cantwell G, Harsch W C 1998 Solid State Commun. 105 399Google Scholar
[20] Ohshima E, Ogino H, Niikura I, Maeda K, Sato M, Ito M, Fukuda T 2004 J. Cryst. Growth 260 166Google Scholar
[21] Maeda K, Sato M, Niikura I, Fukuda T 2005 Semicond. Sci. Technol. 20 S49Google Scholar
[22] Ehrentraut D, Maeda K, Kano M, Fujii K, Fukuda T 2011 J. Cryst. Growth 320 18Google Scholar
[23] Graubner S, Neumann C, Volbers N, Meyer B K, Blasing J, Krost A 2007 Appl. Phys. Lett. 90 042103Google Scholar
[24] Takamizu D, Nishimoto Y, Akasaka S, Yuji H, Tamura K, Nakahara K, Onuma T, Tanabe T, Takasu H, Kawasaki M, Chichibu S F 2008 J. Appl. Phys. 103 063502Google Scholar
[25] Kato H, Sano M, Miyamoto K, Yao T 2003 Jpn. J. Appl. Phys. Part 2-Lett. 42 L1002Google Scholar
[26] Kato H, Sano M, Miyamoto K, Yao T 2003 Jpn. J. Appl. Phys. Part 1-Regul. Pap. Short Notes Rev. Pap. 42 2241Google Scholar
[27] Park S H, Minegishi T, Lee H J, Oh D C, Ko H J, Chang J H, Yao T 2011 J. Appl. Phys. 110 053520Google Scholar
[28] Tsukazaki A, Akasaka S, Nakahara K, Ohno Y, Ohno H, Maryenko D, Ohtomo A, Kawasaki M 2010 Nat. Mater. 9 889Google Scholar
[29] Nakahara K, Akasaka S, Yuji H, Tamura K, Fujii T, Nishimoto Y, Takamizu D, Sasaki A, Tanabe T, Takasu H, Amaike H, Onuma T, Chichibu S F, Tsukazaki A, Ohtomo A, Kawasaki M 2010 Appl. Phys. Lett. 97 013501Google Scholar
[30] Makino T, Segawa Y, Kawasaki M, Ohtomo A, Shiroki R, Tamura K, Yasuda T, Koinuma H 2001 Appl. Phys. Lett. 78 1237Google Scholar
[31] Choopun S, Vispute R D, Yang W, Sharma R P, Venkatesan T, Shen H 2002 Appl. Phys. Lett. 80 1529Google Scholar
[32] Sharma A K, Narayan J, Muth J F, Teng C W, Jin C, Kvit A, Kolbas R M, Holland O W 1999 Appl. Phys. Lett. 75 3327Google Scholar
[33] Teng C W, Muth J F, Ozgur U, Bergmann M J, Everitt H O, Sharma A K, Jin C, Narayan J 2000 Appl. Phys. Lett. 76 979Google Scholar
[34] Coli G, Bajaj K K 2001 Appl. Phys. Lett. 78 2861Google Scholar
[35] Ohtomo A, Shiroki R, Ohkubo I, Koinuma H, Kawasaki M 1999 Appl. Phys. Lett. 75 4088Google Scholar
[36] Vashaei Z, Minegishi T, Suzuki H, Hanada T, Cho M W, Yao T, Setiawan A 2005 J. Appl. Phys. 98 054911Google Scholar
[37] Tanaka H, Fujita S, Fujita S 2005 Appl. Phys. Lett. 86 192911Google Scholar
[38] Zheng Q H, Huang F, Ding K, Huang J, Chen D G, Zhan Z B, Lin Z 2011 Appl. Phys. Lett. 98 221112Google Scholar
[39] Wang L K, Ju Z G, Zhang J Y, Zheng J, Shen D Z, Yao B, Zhao D X, Zhang Z Z, Li B H, Shan C X 2009 Appl. Phys. Lett. 95 131113Google Scholar
[40] Xie X H, Zhang Z Z, Li B H, Wang S P, Jiang M M, Shan C X, Zhao D X, Chen H Y, Shen D Z 2014 Opt. Express 22 246Google Scholar
[41] Ju Z G, Shan C X, Yang C L, Zhang J Y, Yao B, Zhao D X, Shen D Z, Fan X W 2009 Appl. Phys. Lett. 94 101902Google Scholar
[42] Ju Z G, Shan C X, Jiang D Y, Zhang J Y, Yao B, Zhao D X, Shen D Z, Fan X W 2008 Appl. Phys. Lett. 93 173505Google Scholar
[43] Kaneko K, Onuma T, Tsumura K, Uchida T, Jinno R, Yamaguchi T, Honda T, Fujita S 2016 Appl. Phys. Express 9 111102Google Scholar
[44] Onuma T, Ono M, Ishii K, Kaneko K, Yamaguchi T, Fujita S, Honda T 2018 Appl. Phys. Lett. 113 061903Google Scholar
[45] Kaneko K, Tsumura K, Ishii K, Onuma T, Honda T, Fujita S 2018 J. Electron. Mater. 47 4356Google Scholar
[46] Wen M C, Lu S A, Chang L, Chou M M C, Ploog K H 2017 J. Cryst. Growth 477 169Google Scholar
[47] Ryu Y R, Lee T S, Lubguban J A, Corman A B, White H W, Leem J H, Han M S, Park Y S, Youn C J, Kim W J 2006 Appl. Phys. Lett. 88 052103Google Scholar
[48] Kim W J, Leem J H, Han M S, Ryu Y R, Lee T S 2006 J. Appl. Phys. 99 096104Google Scholar
[49] Su L X, Zhu Y, Chen M M, Zhang Q L, Su Y Q, Ji X, Wu T Z, Gui X C, Xiang R, Tang Z K 2013 Appl. Phys. Lett. 103 072104Google Scholar
[50] Jeong T S, Han M S, Kim J H, Bae S J, Youn C J 2007 J. Phys. D-Appl. Phys. 40 370Google Scholar
[51] Chen M M, Xiang R, Su L X, Zhang Q L, Cao J S, Zhu Y, Gui X C, Wu T Z, Tang Z K 2012 J. Phys. D-Appl. Phys. 45 455101Google Scholar
[52] Ye D Q, Mei Z X, Liang H L, Liu Y L, Azarov A, Kuznetsov A, Du X L 2014 J. Phys. D-Appl. Phys. 47 175102Google Scholar
[53] Park S H, Ahn D 2014 Physica B 441 12Google Scholar
[54] Su L X, Zhu Y, Zhang Q L, Chen M M, Wu T Z, Gui X C, Pan B C, Xiang R, Tang Z K 2013 Appl. Surf. Sci. 274 341Google Scholar
[55] Yong D Y, He H Y, Su L X, Zhu Y, Tang Z K, Pan B C 2014 J. Alloys Compd. 608 197Google Scholar
[56] Ding K, Ullah M B, Avrutin V, Ozgur U, Morkoc H 2017 Appl. Phys. Lett. 111 182101Google Scholar
[57] Gorczyca I, Teisseyre H, Suski T, Christensen N E, Svane A 2016 J. Appl. Phys. 120 215704Google Scholar
[58] Toporkov M, Demchenko D O, Zolnai Z, Volk J, Avrutin V, Morkoc H, Ozgur U 2016 J. Appl. Phys. 119 095311Google Scholar
[59] Toporkov M, Avrutin V, Okur S, Izyumskaya N, Demchenko D, Volk J, Smith D J, Morkoc H, Ozgur U 2014 J. Cryst. Growth 402 60Google Scholar
[60] Yang C, Li X M, Gao X D, Cao X, Yang R, Li Y Z 2010 J. Cryst. Growth 312 978Google Scholar
[61] Toporkov M, Ullah M B, Demchenko D O, Avrutin V, Morkoc H, Ozgur U 2017 J. Cryst. Growth 467 145Google Scholar
[62] Ullah M B, Avrutin V, Nakagawara T, Hafiz S, Altuntas I, Ozgur U, Morkoc H 2017 J. Appl. Phys. 121 185704Google Scholar
[63] Roessler D M, Walker W C 1967 Phys. Rev. 159 733Google Scholar
[64] Cordero B, Gomez V, Platero-Prats A E, Reves M, Echeverria J, Cremades E, Barragan F, Alvarez S 2008 Dalton Trans. 21 2832
[65] Ashrafi A, Jagadish C 2007 J. Appl. Phys. 102 071101Google Scholar
[66] Zhu Y, Chen M M, Su L X, Su Y Q, Ji X, Gui X C, Tang Z K 2014 J. Alloys Compd. 616 505Google Scholar
[67] Chen M M, Zhu Y, Su L X, Zhang Q L, Chen A Q, Ji X, Xiang R, Gui X C, Wu T Z, Pan B C, Tang Z K 2013 Appl. Phys. Lett. 102 202103Google Scholar
[68] Freysoldt C, Grabowski B, Hickel T, Neugebauer J, Kresse G, Janotti A, Van de Walle C G 2014 Rev. Mod. Phys. 86 253Google Scholar
[69] Kohan A F, Ceder G, Morgan D, Van de Walle C G 2000 Phys. Rev. B 61 15019Google Scholar
[70] Sokol A A, French S A, Bromley S T, Catlow C R A, van Dam H J J, Sherwood P 2007 Faraday Discuss. 134 267Google Scholar
[71] Lyons J L, Janotti A, Van de Walle C G 2009 Appl. Phys. Lett. 95 252105Google Scholar
[72] Wang L G, Zunger A 2003 Phys. Rev. Lett. 90 256401Google Scholar
[73] Duan X M, Stampfl C, Bilek M M M, McKenzie D R 2009 Phys. Rev. B 79 235208Google Scholar
[74] Urban D F, Korner W, Elsasser C 2016 Phys. Rev. B 94 075140Google Scholar
[75] Puchala B, Morgan D 2012 Phys. Rev. B 85 195207Google Scholar
[76] Limpijumnong S, Zhang S B, Wei S H, Park C H 2004 Phys. Rev. Lett. 92 155504Google Scholar
[77] Li J, Wei S H, Li S S, Xia J B 2006 Phys. Rev. B 74 081201Google Scholar
[78] Gai Y Q, Li J B, Li S S, Xia J B, Yan Y F, Wei S H 2009 Phys. Rev. B 80 153201Google Scholar
[79] Xie X H, Li B H, Zhang Z Z, Shen D Z 2018 AIP Adv. 8 035115
[80] Lautenschlaeger S, Sann J, Volbers N, Meyer B K, Hoffmann A, Haboeck U, Wagner M R 2008 Phys. Rev. B 77 144108
[81] Akasaka S, Nakahara K, Yuji H, Tsukazaki A, Ohtomo A, Kawasaki M 2011 Appl. Phys. Express 4 035701
[82] Kozuka Y, Tsukazaki A, Kawasaki M 2014 Appl. Phys. Rev. 1 011303
[83] Akasaka S, Tsukazaki A, Nakahara K, Ohtomo A, Kawasaki M 2011 Jpn. J. Appl. Phys. 50 080215
[84] Oba F, Choi M, Togo A, Tanaka I 2011 Sci. Technol. Adv. Mater. 12 034302Google Scholar
[85] Ellmer K, Bikowski A 2016 J. Phys. D-Appl. Phys. 49 413002Google Scholar
[86] McCluskey M D, Jokela S J 2009 J. Appl. Phys. 106 071101Google Scholar
[87] Janotti A, Van de Walle C G 2009 Rep. Prog. Phys. 72 126501Google Scholar
[88] Janotti A, Van de Walle C G 2007 Phys. Rev. B 76 165202Google Scholar
[89] Oba F, Togo A, Tanaka I, Paier J, Kresse G 2008 Phys. Rev. B 77 245202Google Scholar
[90] Oba F, Nishitani S R, Isotani S, Adachi H, Tanaka I 2001 J. Appl. Phys. 90 824Google Scholar
[91] Borseth T M, Svensson B G, Kuznetsov A Y, Klason P, Zhao Q X, Willander M 2006 Appl. Phys. Lett. 89 262112Google Scholar
[92] Look D C, Leedy K D, Vines L, Svensson B G, Zubiaga A, Tuomisto F, Doutt D R, Brillson L J 2011 Phys. Rev. B 84 115202Google Scholar
[93] Vidya R, Ravindran P, Fjellvag H, Svensson B G, Monakhov E, Ganchenkova M, Nieminen R M 2011 Phys. Rev. B 83 045206Google Scholar
[94] Ton-That C, Weston L, Phillips M R 2012 Phys. Rev. B 86 115205Google Scholar
[95] Alkauskas A, Pasquarello A 2011 Phys. Rev. B 84 125206Google Scholar
[96] Knutsen K E, Galeckas A, Zubiaga A, Tuomisto F, Farlow G C, Svensson B G, Kuznetsov A Y 2012 Phys. Rev. B 86 121203Google Scholar
[97] Can M M, Shah S I, Doty M F, Haughn C R, Firat T 2012 J. Phys. D-Appl. Phys. 45 195104Google Scholar
[98] Kim D H, Lee G W, Kim Y C 2012 Solid State Commun. 152 1711Google Scholar
[99] Travlos A, Boukos N, Chandrinou C, Kwack H S, Dang L S 2009 J. Appl. Phys. 106 104307Google Scholar
[100] Selim F A, Weber M H, Solodovnikov D, Lynn K G 2007 Phys. Rev. Lett. 99 085502Google Scholar
[101] Erhart P, Albe K 2006 Appl. Phys. Lett. 88 201918Google Scholar
[102] Vlasenko L S, Watkins G D 2005 Phys. Rev. B 72 035203Google Scholar
[103] Liu H Y, Izyumskaya N, Avrutin V 2012 J. Appl. Phys. 112 033706Google Scholar
[104] Liu L, Xu J L, Wang D D, Jiang M M, Wang S P, Li B H, Zhang Z Z, Zhao D X, Shan C X, Yao B, Shen D Z 2012 Phys. Rev. Lett. 108 215501Google Scholar
[105] Xie X H, Li B H, Zhang Z Z, Shen D Z 2017 J. Phys. D-Appl. Phys. 50 325304Google Scholar
[106] Sanyal D, Roy T K, Chakrabarti M, Dechoudhury S, Bhowmick D, Chakrabarti A 2008 J. Phys.-Condes. Matter 20 045217Google Scholar
[107] Ono R, Togimitsu T, Sato W 2015 J. Radioanal. Nucl. Chem. 303 1223Google Scholar
[108] Khan E H, Weber M H, McCluskey M D 2013 Phys. Rev. Lett. 111 017401Google Scholar
[109] Makkonen I, Korhonen E, Prozheeva V, Tuomisto F 2016 J. Phys.-Condes. Matter 28 224002Google Scholar
[110] Chakrabarti M, Jana D, Sanyal D 2013 Vacuum 87 16Google Scholar
[111] Sarkar A, Chakrabarti M, Ray S K, Bhowmick D, Sanyal D 2011 J. Phys.-Condes. Matter 23 155801Google Scholar
[112] Zubiaga A, Garcia J A, Plazaola F, Tuomisto F, Zuniga-Perez J, Munoz-Sanjose V 2007 Phys. Rev. B 75 205305Google Scholar
[113] Chen Z Q, Betsuyaku K, Kawasuso A 2008 Phys. Rev. B 77 113204Google Scholar
[114] Erdem E 2017 Nanoscale 9 10983Google Scholar
[115] Lambrecht W R L, Boonchun A 2013 Phys. Rev. B 87 195207Google Scholar
[116] Parashar S K S, Murty B S, Repp S, Weber S, Erdem E 2012 J. Appl. Phys. 111 113712Google Scholar
[117] Vlasenko L S 2010 Appl. Magn. Reson. 39 103Google Scholar
[118] Vlasenko L S 2009 Physica B 404 4774Google Scholar
[119] Zheng H, Weismann A, Berndt R 2013 Phys. Rev. Lett. 110 226101Google Scholar
[120] Xu H, Dong L, Shi X Q, Van Hove M A, Ho W K, Lin N, Wu H S, Tong S Y 2014 Phys. Rev. B 89 235403Google Scholar
[121] Stavale F, Nilius N, Freund H J 2013 J. Phys. Chem. Lett. 4 3972Google Scholar
[122] Dulub O, Boatner L A, Diebold U 2002 Surf. Sci. 519 201Google Scholar
[123] Zubiaga A, Garcia J A, Plazaola F, Tuomisto F, Saarinen K, Zuniga Perez J, Munoz-Sanjose V 2006 J. Appl. Phys. 99 053516Google Scholar
[124] Lin B X, Fu Z X, Jia Y B 2001 Appl. Phys. Lett. 79 943Google Scholar
[125] Dong Y F, Tuomisto F, Svensson B G, Kuznetsov A Y, Brillson L J 2010 Phys. Rev. B 81 081201Google Scholar
[126] Reshchikov M A 2014 J. Appl. Phys. 115 012010Google Scholar
[127] Zhu L C, Lockrey M, Phillips M R, Cuong T T 2018 Phys. Status Solidi A-Appl. Mat. 215 1800389Google Scholar
[128] Wu X L, Siu G G, Fu C L, Ong H C 2001 Appl. Phys. Lett. 78 2285Google Scholar
[129] Liu X Y, Shan C X, Zhu H, Li B H, Jiang M M, Yu S F, Shen D Z 2015 Sci. Rep. 5 13641Google Scholar
[130] Zhu H, Shan C X, Li B H, Zhang Z Z, Shen D Z, Choy K L 2011 J. Mater. Chem. 21 2848Google Scholar
[131] McCluskey M D, Corolewski C D, Lv J P, Tarun M C, Teklemichael S T, Walter E D, Norton M G, Harrison K W, Ha S 2015 J. Appl. Phys. 117 112802Google Scholar
[132] Fan J C, Sreekanth K M, Xie Z, Chang S L, Rao K V 2013 Prog. Mater. Sci. 58 874Google Scholar
[133] Reynolds J G, Reynolds C L 2014 Adv. Condens. Matter Phys. 2014 457058
[134] Tsukazaki A, Ohtomo A, Onuma T, Ohtani M, Makino T, Sumiya M, Ohtani K, Chichibu S F, Fuke S, Segawa Y, Ohno H, Koinuma H, Kawasaki M 2005 Nat. Mater. 4 42
[135] Jiao S J, Zhang Z Z, Lu Y M, Shen D Z, Yao B, Zhang J Y, Li B H, Zhao D X, Fan X W, Tang Z K 2006 Appl. Phys. Lett. 88 031911Google Scholar
[136] Chu S, Olmedo M, Yang Z, Kong J Y, Liu J L 2008 Appl. Phys. Lett. 93 181106Google Scholar
[137] Chu S, Wang G P, Zhou W H, Lin Y Q, Chernyak L, Zhao J Z, Kong J Y, Li L, Ren J J, Liu J L 2011 Nat. Nanotechnol. 6 506Google Scholar
[138] Xie X H, Li B H, Zhang Z Z, Shen D Z 2018 J. Phys. D-Appl. Phys. 51 225104Google Scholar
[139] Stehr J E, Wang X J, Filippov S, Pearton S J, Ivanov I G, Chen W M, Buyanova I A 2013 J. Appl. Phys. 113 103509Google Scholar
[140] Yong D Y, He H Y, Tang Z K, Wei S H, Pan B C 2015 Phys. Rev. B 92 235207Google Scholar
[141] Chavillon B, Cario L, Renaud A, Tessier F, Chevire F, Boujtita M, Pellegrin Y, Blart E, Smeigh A 2012 J. Am. Chem. Soc. 134 464Google Scholar
[142] Ye Z Z, He H P, Jiang L 2018 Nano Energy 52 527Google Scholar
[143] Chen A Q, Zhu H, Wu Y Y, Chen M M, Zhu Y, Gui X C, Tang Z K 2016 Adv. Funct. Mater. 26 3696Google Scholar
[144] Sun F, Shan C X, Li B H, Zhang Z Z, Shen D Z, Zhang Z Y, Fan D 2011 Opt. Lett. 36 499Google Scholar
[145] Liu J S, Shan C X, Shen H, Li B H, Zhang Z Z, Liu L, Zhang L G, Shen D Z 2012 Appl. Phys. Lett. 101 011106Google Scholar
-
图 1 ZnO外延生长过程中缓冲层的RHEED线条图像演变过程 (a)氧等离子体处理后的蓝宝石(0001)表面; (b) 二维成核阶段的MgO缓冲层表面; (c) MgO缓冲层开始三维成岛状生长; (d) 薄层低温ZnO缓冲层生长在MgO上; (e) 退火后的ZnO缓冲层表现出平整二维表面[9]
Figure 1. Evolution of RHEED line image of buffer layer during epitaxial growth of ZnO: (a) Oxygen plasma treated sapphire (0001) surface; (b) MgO buffer layer surface in two-dimensional nucleation stage; (c) the MgO buffer layer begins to grow into three-dimensional islands; (d) thin layer low temperature ZnO buffer layer grown on MgO; (e) annealed ZnO buffer layer exhibits a flat two-dimensional surface[9]
图 7 ZnO薄膜中杂质浓度的深度分布情况 (a)非故意掺杂层中Si, Mo, Ta, Al的分布情况; (b)氮掺杂层中C, B, N, Cl, F的分布情况; (c) 施主型杂质元素经抑制后的纵向分布情况[79]
Figure 7. Depth distribution of impurity concentration in ZnO thin films: (a) Distribution of Si, Mo, Ta and Al in unintentionally doped layers; (b) longitudinal distribution of donor-type impurity elements after suppression[79]
-
[1] Prakash V, Agarwal A, Mussada E K 2019 Silicon 11 1617Google Scholar
[2] Neubert M, Rudolph P 2001 Prog. Cryst. Growth Charact. Mater. 43 119Google Scholar
[3] Mullin J B 2004 J. Cryst. Growth 264 578Google Scholar
[4] Nakamura S 2015 Rev. Mod. Phys. 87 1139Google Scholar
[5] Akasaki I 2015 Rev. Mod. Phys. 87 1119Google Scholar
[6] Amano H 2015 Rev. Mod. Phys. 87 1133Google Scholar
[7] Liang Y H, Towe E 2018 Appl. Phys. Rev. 5 011107Google Scholar
[8] Walsh A, Zunger A 2017 Nat. Mater. 16 964Google Scholar
[9] Chen Y F, Ko H J, Hong S K, Yao T, Segawa Y 2000 J. Cryst. Growth 214 87Google Scholar
[10] Chen Y F, Ko H J, Hong S K, Yao T 2000 Appl. Phys. Lett. 76 559Google Scholar
[11] Fons P, Iwata K, Yamada A, Matsubara K, Niki S, Nakahara K, Tanabe T, Takasu H 2000 Appl. Phys. Lett. 77 1801Google Scholar
[12] Fons P, Iwata K, Niki S, Yamada A, Matsubara K, Watanabe M 2000 J. Cryst. Growth 209 532Google Scholar
[13] Liu J S, Shan C X, Wang S P, Sun F, Yao B, Shen D Z 2010 J. Cryst. Growth 312 2861Google Scholar
[14] Kato H, Miyamoto K, Sano M, Yao T 2004 Appl. Phys. Lett. 84 4562Google Scholar
[15] Hong S K, Hanada T, Ko H J, Chen Y F, Yao T, Imai D, Araki K, Shinohara M, Saitoh K, Terauchi M 2002 Phys. Rev. B 65 115331Google Scholar
[16] Park J S, Hong S K, Minegishi T, Park S H, Im I H, Hanada T, Cho M W, Yao T, Lee J W, Lee J Y 2007 Appl. Phys. Lett. 90 201907Google Scholar
[17] Xie X H, Li B H, Zhang Z Z, Wang S P, Shen D Z 2018 Sci. Rep. 8 17020Google Scholar
[18] Helbig R 1972 J. Cryst. Growth. 15 25Google Scholar
[19] Look D C, Reynolds D C, Sizelove J R, Jones R L, Litton C W, Cantwell G, Harsch W C 1998 Solid State Commun. 105 399Google Scholar
[20] Ohshima E, Ogino H, Niikura I, Maeda K, Sato M, Ito M, Fukuda T 2004 J. Cryst. Growth 260 166Google Scholar
[21] Maeda K, Sato M, Niikura I, Fukuda T 2005 Semicond. Sci. Technol. 20 S49Google Scholar
[22] Ehrentraut D, Maeda K, Kano M, Fujii K, Fukuda T 2011 J. Cryst. Growth 320 18Google Scholar
[23] Graubner S, Neumann C, Volbers N, Meyer B K, Blasing J, Krost A 2007 Appl. Phys. Lett. 90 042103Google Scholar
[24] Takamizu D, Nishimoto Y, Akasaka S, Yuji H, Tamura K, Nakahara K, Onuma T, Tanabe T, Takasu H, Kawasaki M, Chichibu S F 2008 J. Appl. Phys. 103 063502Google Scholar
[25] Kato H, Sano M, Miyamoto K, Yao T 2003 Jpn. J. Appl. Phys. Part 2-Lett. 42 L1002Google Scholar
[26] Kato H, Sano M, Miyamoto K, Yao T 2003 Jpn. J. Appl. Phys. Part 1-Regul. Pap. Short Notes Rev. Pap. 42 2241Google Scholar
[27] Park S H, Minegishi T, Lee H J, Oh D C, Ko H J, Chang J H, Yao T 2011 J. Appl. Phys. 110 053520Google Scholar
[28] Tsukazaki A, Akasaka S, Nakahara K, Ohno Y, Ohno H, Maryenko D, Ohtomo A, Kawasaki M 2010 Nat. Mater. 9 889Google Scholar
[29] Nakahara K, Akasaka S, Yuji H, Tamura K, Fujii T, Nishimoto Y, Takamizu D, Sasaki A, Tanabe T, Takasu H, Amaike H, Onuma T, Chichibu S F, Tsukazaki A, Ohtomo A, Kawasaki M 2010 Appl. Phys. Lett. 97 013501Google Scholar
[30] Makino T, Segawa Y, Kawasaki M, Ohtomo A, Shiroki R, Tamura K, Yasuda T, Koinuma H 2001 Appl. Phys. Lett. 78 1237Google Scholar
[31] Choopun S, Vispute R D, Yang W, Sharma R P, Venkatesan T, Shen H 2002 Appl. Phys. Lett. 80 1529Google Scholar
[32] Sharma A K, Narayan J, Muth J F, Teng C W, Jin C, Kvit A, Kolbas R M, Holland O W 1999 Appl. Phys. Lett. 75 3327Google Scholar
[33] Teng C W, Muth J F, Ozgur U, Bergmann M J, Everitt H O, Sharma A K, Jin C, Narayan J 2000 Appl. Phys. Lett. 76 979Google Scholar
[34] Coli G, Bajaj K K 2001 Appl. Phys. Lett. 78 2861Google Scholar
[35] Ohtomo A, Shiroki R, Ohkubo I, Koinuma H, Kawasaki M 1999 Appl. Phys. Lett. 75 4088Google Scholar
[36] Vashaei Z, Minegishi T, Suzuki H, Hanada T, Cho M W, Yao T, Setiawan A 2005 J. Appl. Phys. 98 054911Google Scholar
[37] Tanaka H, Fujita S, Fujita S 2005 Appl. Phys. Lett. 86 192911Google Scholar
[38] Zheng Q H, Huang F, Ding K, Huang J, Chen D G, Zhan Z B, Lin Z 2011 Appl. Phys. Lett. 98 221112Google Scholar
[39] Wang L K, Ju Z G, Zhang J Y, Zheng J, Shen D Z, Yao B, Zhao D X, Zhang Z Z, Li B H, Shan C X 2009 Appl. Phys. Lett. 95 131113Google Scholar
[40] Xie X H, Zhang Z Z, Li B H, Wang S P, Jiang M M, Shan C X, Zhao D X, Chen H Y, Shen D Z 2014 Opt. Express 22 246Google Scholar
[41] Ju Z G, Shan C X, Yang C L, Zhang J Y, Yao B, Zhao D X, Shen D Z, Fan X W 2009 Appl. Phys. Lett. 94 101902Google Scholar
[42] Ju Z G, Shan C X, Jiang D Y, Zhang J Y, Yao B, Zhao D X, Shen D Z, Fan X W 2008 Appl. Phys. Lett. 93 173505Google Scholar
[43] Kaneko K, Onuma T, Tsumura K, Uchida T, Jinno R, Yamaguchi T, Honda T, Fujita S 2016 Appl. Phys. Express 9 111102Google Scholar
[44] Onuma T, Ono M, Ishii K, Kaneko K, Yamaguchi T, Fujita S, Honda T 2018 Appl. Phys. Lett. 113 061903Google Scholar
[45] Kaneko K, Tsumura K, Ishii K, Onuma T, Honda T, Fujita S 2018 J. Electron. Mater. 47 4356Google Scholar
[46] Wen M C, Lu S A, Chang L, Chou M M C, Ploog K H 2017 J. Cryst. Growth 477 169Google Scholar
[47] Ryu Y R, Lee T S, Lubguban J A, Corman A B, White H W, Leem J H, Han M S, Park Y S, Youn C J, Kim W J 2006 Appl. Phys. Lett. 88 052103Google Scholar
[48] Kim W J, Leem J H, Han M S, Ryu Y R, Lee T S 2006 J. Appl. Phys. 99 096104Google Scholar
[49] Su L X, Zhu Y, Chen M M, Zhang Q L, Su Y Q, Ji X, Wu T Z, Gui X C, Xiang R, Tang Z K 2013 Appl. Phys. Lett. 103 072104Google Scholar
[50] Jeong T S, Han M S, Kim J H, Bae S J, Youn C J 2007 J. Phys. D-Appl. Phys. 40 370Google Scholar
[51] Chen M M, Xiang R, Su L X, Zhang Q L, Cao J S, Zhu Y, Gui X C, Wu T Z, Tang Z K 2012 J. Phys. D-Appl. Phys. 45 455101Google Scholar
[52] Ye D Q, Mei Z X, Liang H L, Liu Y L, Azarov A, Kuznetsov A, Du X L 2014 J. Phys. D-Appl. Phys. 47 175102Google Scholar
[53] Park S H, Ahn D 2014 Physica B 441 12Google Scholar
[54] Su L X, Zhu Y, Zhang Q L, Chen M M, Wu T Z, Gui X C, Pan B C, Xiang R, Tang Z K 2013 Appl. Surf. Sci. 274 341Google Scholar
[55] Yong D Y, He H Y, Su L X, Zhu Y, Tang Z K, Pan B C 2014 J. Alloys Compd. 608 197Google Scholar
[56] Ding K, Ullah M B, Avrutin V, Ozgur U, Morkoc H 2017 Appl. Phys. Lett. 111 182101Google Scholar
[57] Gorczyca I, Teisseyre H, Suski T, Christensen N E, Svane A 2016 J. Appl. Phys. 120 215704Google Scholar
[58] Toporkov M, Demchenko D O, Zolnai Z, Volk J, Avrutin V, Morkoc H, Ozgur U 2016 J. Appl. Phys. 119 095311Google Scholar
[59] Toporkov M, Avrutin V, Okur S, Izyumskaya N, Demchenko D, Volk J, Smith D J, Morkoc H, Ozgur U 2014 J. Cryst. Growth 402 60Google Scholar
[60] Yang C, Li X M, Gao X D, Cao X, Yang R, Li Y Z 2010 J. Cryst. Growth 312 978Google Scholar
[61] Toporkov M, Ullah M B, Demchenko D O, Avrutin V, Morkoc H, Ozgur U 2017 J. Cryst. Growth 467 145Google Scholar
[62] Ullah M B, Avrutin V, Nakagawara T, Hafiz S, Altuntas I, Ozgur U, Morkoc H 2017 J. Appl. Phys. 121 185704Google Scholar
[63] Roessler D M, Walker W C 1967 Phys. Rev. 159 733Google Scholar
[64] Cordero B, Gomez V, Platero-Prats A E, Reves M, Echeverria J, Cremades E, Barragan F, Alvarez S 2008 Dalton Trans. 21 2832
[65] Ashrafi A, Jagadish C 2007 J. Appl. Phys. 102 071101Google Scholar
[66] Zhu Y, Chen M M, Su L X, Su Y Q, Ji X, Gui X C, Tang Z K 2014 J. Alloys Compd. 616 505Google Scholar
[67] Chen M M, Zhu Y, Su L X, Zhang Q L, Chen A Q, Ji X, Xiang R, Gui X C, Wu T Z, Pan B C, Tang Z K 2013 Appl. Phys. Lett. 102 202103Google Scholar
[68] Freysoldt C, Grabowski B, Hickel T, Neugebauer J, Kresse G, Janotti A, Van de Walle C G 2014 Rev. Mod. Phys. 86 253Google Scholar
[69] Kohan A F, Ceder G, Morgan D, Van de Walle C G 2000 Phys. Rev. B 61 15019Google Scholar
[70] Sokol A A, French S A, Bromley S T, Catlow C R A, van Dam H J J, Sherwood P 2007 Faraday Discuss. 134 267Google Scholar
[71] Lyons J L, Janotti A, Van de Walle C G 2009 Appl. Phys. Lett. 95 252105Google Scholar
[72] Wang L G, Zunger A 2003 Phys. Rev. Lett. 90 256401Google Scholar
[73] Duan X M, Stampfl C, Bilek M M M, McKenzie D R 2009 Phys. Rev. B 79 235208Google Scholar
[74] Urban D F, Korner W, Elsasser C 2016 Phys. Rev. B 94 075140Google Scholar
[75] Puchala B, Morgan D 2012 Phys. Rev. B 85 195207Google Scholar
[76] Limpijumnong S, Zhang S B, Wei S H, Park C H 2004 Phys. Rev. Lett. 92 155504Google Scholar
[77] Li J, Wei S H, Li S S, Xia J B 2006 Phys. Rev. B 74 081201Google Scholar
[78] Gai Y Q, Li J B, Li S S, Xia J B, Yan Y F, Wei S H 2009 Phys. Rev. B 80 153201Google Scholar
[79] Xie X H, Li B H, Zhang Z Z, Shen D Z 2018 AIP Adv. 8 035115
[80] Lautenschlaeger S, Sann J, Volbers N, Meyer B K, Hoffmann A, Haboeck U, Wagner M R 2008 Phys. Rev. B 77 144108
[81] Akasaka S, Nakahara K, Yuji H, Tsukazaki A, Ohtomo A, Kawasaki M 2011 Appl. Phys. Express 4 035701
[82] Kozuka Y, Tsukazaki A, Kawasaki M 2014 Appl. Phys. Rev. 1 011303
[83] Akasaka S, Tsukazaki A, Nakahara K, Ohtomo A, Kawasaki M 2011 Jpn. J. Appl. Phys. 50 080215
[84] Oba F, Choi M, Togo A, Tanaka I 2011 Sci. Technol. Adv. Mater. 12 034302Google Scholar
[85] Ellmer K, Bikowski A 2016 J. Phys. D-Appl. Phys. 49 413002Google Scholar
[86] McCluskey M D, Jokela S J 2009 J. Appl. Phys. 106 071101Google Scholar
[87] Janotti A, Van de Walle C G 2009 Rep. Prog. Phys. 72 126501Google Scholar
[88] Janotti A, Van de Walle C G 2007 Phys. Rev. B 76 165202Google Scholar
[89] Oba F, Togo A, Tanaka I, Paier J, Kresse G 2008 Phys. Rev. B 77 245202Google Scholar
[90] Oba F, Nishitani S R, Isotani S, Adachi H, Tanaka I 2001 J. Appl. Phys. 90 824Google Scholar
[91] Borseth T M, Svensson B G, Kuznetsov A Y, Klason P, Zhao Q X, Willander M 2006 Appl. Phys. Lett. 89 262112Google Scholar
[92] Look D C, Leedy K D, Vines L, Svensson B G, Zubiaga A, Tuomisto F, Doutt D R, Brillson L J 2011 Phys. Rev. B 84 115202Google Scholar
[93] Vidya R, Ravindran P, Fjellvag H, Svensson B G, Monakhov E, Ganchenkova M, Nieminen R M 2011 Phys. Rev. B 83 045206Google Scholar
[94] Ton-That C, Weston L, Phillips M R 2012 Phys. Rev. B 86 115205Google Scholar
[95] Alkauskas A, Pasquarello A 2011 Phys. Rev. B 84 125206Google Scholar
[96] Knutsen K E, Galeckas A, Zubiaga A, Tuomisto F, Farlow G C, Svensson B G, Kuznetsov A Y 2012 Phys. Rev. B 86 121203Google Scholar
[97] Can M M, Shah S I, Doty M F, Haughn C R, Firat T 2012 J. Phys. D-Appl. Phys. 45 195104Google Scholar
[98] Kim D H, Lee G W, Kim Y C 2012 Solid State Commun. 152 1711Google Scholar
[99] Travlos A, Boukos N, Chandrinou C, Kwack H S, Dang L S 2009 J. Appl. Phys. 106 104307Google Scholar
[100] Selim F A, Weber M H, Solodovnikov D, Lynn K G 2007 Phys. Rev. Lett. 99 085502Google Scholar
[101] Erhart P, Albe K 2006 Appl. Phys. Lett. 88 201918Google Scholar
[102] Vlasenko L S, Watkins G D 2005 Phys. Rev. B 72 035203Google Scholar
[103] Liu H Y, Izyumskaya N, Avrutin V 2012 J. Appl. Phys. 112 033706Google Scholar
[104] Liu L, Xu J L, Wang D D, Jiang M M, Wang S P, Li B H, Zhang Z Z, Zhao D X, Shan C X, Yao B, Shen D Z 2012 Phys. Rev. Lett. 108 215501Google Scholar
[105] Xie X H, Li B H, Zhang Z Z, Shen D Z 2017 J. Phys. D-Appl. Phys. 50 325304Google Scholar
[106] Sanyal D, Roy T K, Chakrabarti M, Dechoudhury S, Bhowmick D, Chakrabarti A 2008 J. Phys.-Condes. Matter 20 045217Google Scholar
[107] Ono R, Togimitsu T, Sato W 2015 J. Radioanal. Nucl. Chem. 303 1223Google Scholar
[108] Khan E H, Weber M H, McCluskey M D 2013 Phys. Rev. Lett. 111 017401Google Scholar
[109] Makkonen I, Korhonen E, Prozheeva V, Tuomisto F 2016 J. Phys.-Condes. Matter 28 224002Google Scholar
[110] Chakrabarti M, Jana D, Sanyal D 2013 Vacuum 87 16Google Scholar
[111] Sarkar A, Chakrabarti M, Ray S K, Bhowmick D, Sanyal D 2011 J. Phys.-Condes. Matter 23 155801Google Scholar
[112] Zubiaga A, Garcia J A, Plazaola F, Tuomisto F, Zuniga-Perez J, Munoz-Sanjose V 2007 Phys. Rev. B 75 205305Google Scholar
[113] Chen Z Q, Betsuyaku K, Kawasuso A 2008 Phys. Rev. B 77 113204Google Scholar
[114] Erdem E 2017 Nanoscale 9 10983Google Scholar
[115] Lambrecht W R L, Boonchun A 2013 Phys. Rev. B 87 195207Google Scholar
[116] Parashar S K S, Murty B S, Repp S, Weber S, Erdem E 2012 J. Appl. Phys. 111 113712Google Scholar
[117] Vlasenko L S 2010 Appl. Magn. Reson. 39 103Google Scholar
[118] Vlasenko L S 2009 Physica B 404 4774Google Scholar
[119] Zheng H, Weismann A, Berndt R 2013 Phys. Rev. Lett. 110 226101Google Scholar
[120] Xu H, Dong L, Shi X Q, Van Hove M A, Ho W K, Lin N, Wu H S, Tong S Y 2014 Phys. Rev. B 89 235403Google Scholar
[121] Stavale F, Nilius N, Freund H J 2013 J. Phys. Chem. Lett. 4 3972Google Scholar
[122] Dulub O, Boatner L A, Diebold U 2002 Surf. Sci. 519 201Google Scholar
[123] Zubiaga A, Garcia J A, Plazaola F, Tuomisto F, Saarinen K, Zuniga Perez J, Munoz-Sanjose V 2006 J. Appl. Phys. 99 053516Google Scholar
[124] Lin B X, Fu Z X, Jia Y B 2001 Appl. Phys. Lett. 79 943Google Scholar
[125] Dong Y F, Tuomisto F, Svensson B G, Kuznetsov A Y, Brillson L J 2010 Phys. Rev. B 81 081201Google Scholar
[126] Reshchikov M A 2014 J. Appl. Phys. 115 012010Google Scholar
[127] Zhu L C, Lockrey M, Phillips M R, Cuong T T 2018 Phys. Status Solidi A-Appl. Mat. 215 1800389Google Scholar
[128] Wu X L, Siu G G, Fu C L, Ong H C 2001 Appl. Phys. Lett. 78 2285Google Scholar
[129] Liu X Y, Shan C X, Zhu H, Li B H, Jiang M M, Yu S F, Shen D Z 2015 Sci. Rep. 5 13641Google Scholar
[130] Zhu H, Shan C X, Li B H, Zhang Z Z, Shen D Z, Choy K L 2011 J. Mater. Chem. 21 2848Google Scholar
[131] McCluskey M D, Corolewski C D, Lv J P, Tarun M C, Teklemichael S T, Walter E D, Norton M G, Harrison K W, Ha S 2015 J. Appl. Phys. 117 112802Google Scholar
[132] Fan J C, Sreekanth K M, Xie Z, Chang S L, Rao K V 2013 Prog. Mater. Sci. 58 874Google Scholar
[133] Reynolds J G, Reynolds C L 2014 Adv. Condens. Matter Phys. 2014 457058
[134] Tsukazaki A, Ohtomo A, Onuma T, Ohtani M, Makino T, Sumiya M, Ohtani K, Chichibu S F, Fuke S, Segawa Y, Ohno H, Koinuma H, Kawasaki M 2005 Nat. Mater. 4 42
[135] Jiao S J, Zhang Z Z, Lu Y M, Shen D Z, Yao B, Zhang J Y, Li B H, Zhao D X, Fan X W, Tang Z K 2006 Appl. Phys. Lett. 88 031911Google Scholar
[136] Chu S, Olmedo M, Yang Z, Kong J Y, Liu J L 2008 Appl. Phys. Lett. 93 181106Google Scholar
[137] Chu S, Wang G P, Zhou W H, Lin Y Q, Chernyak L, Zhao J Z, Kong J Y, Li L, Ren J J, Liu J L 2011 Nat. Nanotechnol. 6 506Google Scholar
[138] Xie X H, Li B H, Zhang Z Z, Shen D Z 2018 J. Phys. D-Appl. Phys. 51 225104Google Scholar
[139] Stehr J E, Wang X J, Filippov S, Pearton S J, Ivanov I G, Chen W M, Buyanova I A 2013 J. Appl. Phys. 113 103509Google Scholar
[140] Yong D Y, He H Y, Tang Z K, Wei S H, Pan B C 2015 Phys. Rev. B 92 235207Google Scholar
[141] Chavillon B, Cario L, Renaud A, Tessier F, Chevire F, Boujtita M, Pellegrin Y, Blart E, Smeigh A 2012 J. Am. Chem. Soc. 134 464Google Scholar
[142] Ye Z Z, He H P, Jiang L 2018 Nano Energy 52 527Google Scholar
[143] Chen A Q, Zhu H, Wu Y Y, Chen M M, Zhu Y, Gui X C, Tang Z K 2016 Adv. Funct. Mater. 26 3696Google Scholar
[144] Sun F, Shan C X, Li B H, Zhang Z Z, Shen D Z, Zhang Z Y, Fan D 2011 Opt. Lett. 36 499Google Scholar
[145] Liu J S, Shan C X, Shen H, Li B H, Zhang Z Z, Liu L, Zhang L G, Shen D Z 2012 Appl. Phys. Lett. 101 011106Google Scholar
Catalog
Metrics
- Abstract views: 13529
- PDF Downloads: 306
- Cited By: 0