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By using a tri-electrode dielectric barrier discharge device, a uniform discharge with fairly large volume is realized in the main discharge region in atmospheric pressure air. The characteristics of the main discharge are investigated by optical and electrical methods. Results show that the main discharge includes two discharge modes with changing the input power of the source, which are a plasma plume discharge and a plasma column discharge. The inception voltage decreases with the increase of the peak value of the applied voltage for plume discharge. It can be deduced that the pre-ionization of air in the main discharge region is important for the main discharge, which results from the UV emitted from the coaxial dielectric barrier discharge. Spatially resolved measurements are conducted on the plasma plume and the plasma column with photomultiplier tubes. It is found that the plasma plume behaves like a plasma bullet that corresponds to a fast moving layer of light emission zone. Comparatively, the discharges at different positions of the plasma column almost volley, which means that the plasma column is of continuous discharge. Through analyzing the optical spectrum emitted from the main discharge, the vibrational temperature and rotational temperature are calculated. Results indicate that both the vibrational temperature and the rotational temperature decrease with the increase of peak value of the applied voltage. These results are of significance for the industrial applications of dielectric barrier discharge.
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Keywords:
- dielectric barrier discharge /
- plasma plume /
- plasma column /
- emission spectrum
[1] Nicolas G, Steve M, Francoise M 2000 J. Phys. D: Appl. Phys. 33 L104
[2] Richmonds C, Sankaran R M 2008 Appl. Phys. Lett. 93 131501
[3] Eliason B, Kogelschatz U 1991 IEEE Trans. Plasma Sci. 19 309
[4] Fridman G, Friedman G, Gutsol A, Shekhter A B, Vasilets V N, Fridman A 2008 Plasma Process. Polym. 5 503
[5] Kong M G, Kroesen G, Morfill G, Nosenko T, Shimizu T, van Di jk J, Zimmermann J L 2009 New J. Phys. 11 115012
[6] Iza F, Kim G J, Lee S M, Lee J K, Walsh J L, Zhang Y T, Kong M G 2008 Plasma Proc. Polym. 5 322
[7] Roth J R 1997 Phys. Rev. E 55 6731
[8] Fang Z, Qiu Y, Zhang C, Kuffel E 2007 J. Phys. D: Appl. Phys. 40 1401
[9] Park H D, Dhali S K 2000 Appl. Phys. Lett. 77 14
[10] Qi B, Ren C S, Wang D Z, Li S Z, Wang K 2006 Appl. Phys. Lett. 89 131503
[11] Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502
[12] Tang J, Li S, Zhao W, Wang Y S, Duan Y X 2012 Appl. Phys. Lett. 100 253505
[13] Li X C, Yuan N, Jia P Y, Chang Y Y, Ji Y F 2011 Acta Phys. Sin. 60 125204 (in Chinese) [李雪辰, 袁宁, 贾鹏英, 常媛媛, 稽亚飞 2011 60 125204]
[14] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[15] Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504
[16] Walsh J L, Iza F, Janson N B, Law V J, Kong M G 2009 J. Phys. D: Appl. Phys. 43 075201
[17] Qian M Y, Ren C S, Wang D Z, Zhang J L, Wei G D 2010 J. Appl. Phys. 107 063303
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[1] Nicolas G, Steve M, Francoise M 2000 J. Phys. D: Appl. Phys. 33 L104
[2] Richmonds C, Sankaran R M 2008 Appl. Phys. Lett. 93 131501
[3] Eliason B, Kogelschatz U 1991 IEEE Trans. Plasma Sci. 19 309
[4] Fridman G, Friedman G, Gutsol A, Shekhter A B, Vasilets V N, Fridman A 2008 Plasma Process. Polym. 5 503
[5] Kong M G, Kroesen G, Morfill G, Nosenko T, Shimizu T, van Di jk J, Zimmermann J L 2009 New J. Phys. 11 115012
[6] Iza F, Kim G J, Lee S M, Lee J K, Walsh J L, Zhang Y T, Kong M G 2008 Plasma Proc. Polym. 5 322
[7] Roth J R 1997 Phys. Rev. E 55 6731
[8] Fang Z, Qiu Y, Zhang C, Kuffel E 2007 J. Phys. D: Appl. Phys. 40 1401
[9] Park H D, Dhali S K 2000 Appl. Phys. Lett. 77 14
[10] Qi B, Ren C S, Wang D Z, Li S Z, Wang K 2006 Appl. Phys. Lett. 89 131503
[11] Kiriu S, Miyazoe H, Takamine F, Sai M, Choi J H, Tomai T, Terashima K 2009 Appl. Phys. Lett. 94 191502
[12] Tang J, Li S, Zhao W, Wang Y S, Duan Y X 2012 Appl. Phys. Lett. 100 253505
[13] Li X C, Yuan N, Jia P Y, Chang Y Y, Ji Y F 2011 Acta Phys. Sin. 60 125204 (in Chinese) [李雪辰, 袁宁, 贾鹏英, 常媛媛, 稽亚飞 2011 60 125204]
[14] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[15] Shi J J, Zhong F C, Zhang J, Liu D W, Kong M G 2008 Phys. Plasmas 15 013504
[16] Walsh J L, Iza F, Janson N B, Law V J, Kong M G 2009 J. Phys. D: Appl. Phys. 43 075201
[17] Qian M Y, Ren C S, Wang D Z, Zhang J L, Wei G D 2010 J. Appl. Phys. 107 063303
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