Model of secondary electron emission at high incident electron energy for metal

Yang Wen-Jin; Li Yong-Dong; Liu Chun-Liang

doi:10.7498/aps.62.087901

Abstract

The models of the true secondary electron emission and backscattered electron emission for metal are provided, based on the physical process of secondary electron emission from metal at high incident electron energy. The formula for the true secondary electron yield at high incident electron energy is derived with the Bethe equation known to provide accurate and simple analytical expressions for the stopping power and the probability that a secondary electron produced in a material reaches the surface and is emitted into the vacuum. The formula for the backscattered electron yield at high incident electron energy is derived with the absorbing rule for the incident electron in the material. All the above results lead to a new model for secondary electron emission from metal at high incident electron energy. The secondary electron yields of Au, Ag, Cu and Al derived with the new model are in good agreement with the results obtained from the scatters process simulation code-Casino.

Keywords:

Authors and contacts

1.
Xi’an Jiaotong University, Electronic Physics and Devices Laboratory, Xi’an 710049, China
Funds: Project supported by the National Natural Science Foundation of China (Grant No. 50977076) and the Foundation of National Key Laboratory of Space Microwave Technology, China (Grant No. 9140C530103110C5301).

References

[1]	Reimer L, Drescher H 1977 J. Phys. D:Appl. Phys. 10 805
[2]	Furman M A, Pivi M T F 2003 Tech. Rep. (Lawrence Berkeley National Laboratory No SLAC-PUB-9912/LBNL-49771)
[3]	Rodney J, Vaughan M 1989 IEEE T. Electron. Dev. 36 1963
[4]	Xie A G, Pei Y J, Sun H B, Wang R 2004 High Power Laser and Particle Beams 16 1059 (in Chinese) [谢爱根, 裴元吉, 孙红兵, 王荣 2004 强激光与粒子束 16 1059]
[5]	Xie A G, Zhao H F, Song B, Pei Y J 2009 Phys. Res. B:Beam Interact. Mater. Atoms 267 1761
[6]	Xie A G, Zhang J, Wang T B 2011 Jpn. J. Appl. Phys. 50 126601
[7]	Bethe H 1930 Ann. Phys. 5 325
[8]	Kanaya K, Okayama S 1972 J. Phys. D:Appl. Phys. 5 43
[9]	Hovington P, Drouin D, Gauvin R 1997 Scanning 19 1
[10]	Kanaya K, Kawakatsu H 1972 J. Phys. D:Appl. Phys. 5 1727
[11]	Drouin D, Hovington P, Gauvin R 1997 Scanning 19 p20
[12]	Joy D C, Luo S 1989 Scanning 11 176
[13]	Seiler H 1983 J. Phys. D:Appl. Phys. 54 R1
[14]	Xie A G, Li C Q, Song B, Pei Y J 2008 Chin. Sci. Bull. 53 3067 (in Chinese) [谢爱根, 李传起, 宋标, 裴元吉 2008 科学通报 53 3067]
[15]	Balcon N, Payan D, Belhaj M, Tondu T, Inguimbert V 2011 IEEE Trans. Plasma Sci. 40 282
[16]	Kanayat K, Okayama S 1972 J. Phys. D:Appl. Phys. 5 43

Cited By

[1]	Reimer L, Drescher H 1977 J. Phys. D:Appl. Phys. 10 805
[2]	Furman M A, Pivi M T F 2003 Tech. Rep. (Lawrence Berkeley National Laboratory No SLAC-PUB-9912/LBNL-49771)
[3]	Rodney J, Vaughan M 1989 IEEE T. Electron. Dev. 36 1963
[4]	Xie A G, Pei Y J, Sun H B, Wang R 2004 High Power Laser and Particle Beams 16 1059 (in Chinese) [谢爱根, 裴元吉, 孙红兵, 王荣 2004 强激光与粒子束 16 1059]
[5]	Xie A G, Zhao H F, Song B, Pei Y J 2009 Phys. Res. B:Beam Interact. Mater. Atoms 267 1761
[6]	Xie A G, Zhang J, Wang T B 2011 Jpn. J. Appl. Phys. 50 126601
[7]	Bethe H 1930 Ann. Phys. 5 325
[8]	Kanaya K, Okayama S 1972 J. Phys. D:Appl. Phys. 5 43
[9]	Hovington P, Drouin D, Gauvin R 1997 Scanning 19 1
[10]	Kanaya K, Kawakatsu H 1972 J. Phys. D:Appl. Phys. 5 1727
[11]	Drouin D, Hovington P, Gauvin R 1997 Scanning 19 p20
[12]	Joy D C, Luo S 1989 Scanning 11 176
[13]	Seiler H 1983 J. Phys. D:Appl. Phys. 54 R1
[14]	Xie A G, Li C Q, Song B, Pei Y J 2008 Chin. Sci. Bull. 53 3067 (in Chinese) [谢爱根, 李传起, 宋标, 裴元吉 2008 科学通报 53 3067]
[15]	Balcon N, Payan D, Belhaj M, Tondu T, Inguimbert V 2011 IEEE Trans. Plasma Sci. 40 282
[16]	Kanayat K, Okayama S 1972 J. Phys. D:Appl. Phys. 5 43

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Catalog

Vol. 62, Issue 8 - 2013-04-20

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