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不同电介质结构下介质阻挡放电特性研究

董丽芳 杨玉杰 刘为远 岳晗 王帅 刘忠伟 陈强

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不同电介质结构下介质阻挡放电特性研究

董丽芳, 杨玉杰, 刘为远, 岳晗, 王帅, 刘忠伟, 陈强

Characteristics of dielectric barrier discharge with different dielectric layer structures

Liu Wei-Yuan, Yue Han, Wang Shuai, Liu Zhong-Wei, Chen Qiang, Dong Li-Fang, Yang Yu-Jie
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  • 设计制作了单面有氧化铟锡(ITO)导电介质层的双玻璃介质层的介质阻挡放电装置,研究了其放电特性,并将其与双玻璃介质层和单玻璃介质层的介质阻挡放电进行了比较.从电荷输运的角度分析,上述三种装置分别实现了电荷的二维、零维和三维输运.采用两种不同的双玻璃介质层装置,获得了单个稳定的放电丝.与无ITO导电层的双玻璃结构得到的单个放电丝相比,单面有导电ITO介质的双玻璃结构中,单放电丝呈"T"字型,其光晕是前者光晕的2倍,其放电电流大于前者电流,其放电时间间隔长短交替现象更为明显,且存在强度大小交替的现象.分析表明,壁电荷输运及二次电子发射的不同导致了不同电介质结构放电特性的不同.
    A dielectric barrier discharge device with two glass dielectric layers, one of which is covered with an indium tin oxide (ITO) conductive layer, was designed. Its discharge characteristics was studied and compared with that in dielectric barrier discharge devices with two glass dielectric layers and single glass layer. The charge transport in two dimensions, zero dimension, and three dimensions were realized by the above three devices respectively. Single steady filament is obtained in the two devices with two glass layers. Different from the single filament obtained in the device with two glass dielectric layers without ITO conductive layer, the single filament obtained by using the device of two glass dielectric layers with ITO conductive layer in one side was "T" shapes, its halo was twice as much as that of the former, its current was greater, and the phenomenon of discharge interval changing alternatively between long and short was more evident. Moreover, the discharge intensity also varied alternatively between strong and weak. The analysis indicated that the differences of the wall charge transport and secondary electron emission between different dielectric structures lead to different discharge characteristics.
    • 基金项目: 国家自然科学基金(批准号:10975043,10775037)、河北省自然科学基金(批准号:A2008000564,A2010000185)和北京市印刷包装材料与技术重点实验室开放课题(批准号: KF201006)资助的课题.
    [1]

    Stollenwerk L 2009 New J. Phys. 11 103034

    [2]

    Stollenwerk L, Laven J G, Purwins H -G 2007 Phys. Rev. Lett. 98 255001

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    3129

    [4]

    Reece R J, Jozef R, Dai X, Sherman D M 2005 J. Phys. D: Appl. Phys. 38 555

    [5]

    Kogelschatz U 2003 Plasma Chemistry and Plasma Processing 23 1

    [6]

    Duan X X, Ouyang J T, Zhao X F, He F 2009 Phys. Rev. E 80 016202

    [7]

    Shi H, Wang Y H, Wang D Z 2008 Phys. Plasmas 15 122306

    [8]

    Zhang H Y, Wang D Z, Wang X G 2007 Chin. Phys. 16 1089

    [9]

    Ouyang J T, He F, Mao J S, Feng S 2006 Acta Phys. Sin. 55 5969 (in Chanese) [欧阳吉庭、何 锋、缪劲松、冯 硕 2006 55 5969]

    [10]

    Zhang Y, Gu B, Wang WC, Peng XW, Wang DZ 2009 Acta Phys. Sin. 58 5532 (in Chinese) [张 燕、顾 彪、王文春、彭许文、王德真 2009 58 5532]

    [11]

    Dong LF, Yang L, Zhang YZ, Yue H 2009 Acta Phys. Sin. 58 8461 (in Chanese) [董丽芳、杨 丽、张彦召、岳 晗 2009 58 8461]

    [12]

    Li G, Xu YJ, Mu KJ, Nie CQ, Zhu JQ, Zhang Y, Li HM 2008 Acta Phys. Sin. 57 6444 (in Chinese) [李 钢、徐燕 〖12] Yin ZQ, Wan JY, Huang MQ, Wang HJ 2007 Acta Phys. Sin. 56 7078 (in Chinese) [尹增谦、万景瑜、黄明强、王慧娟 2007 57 6444]

    [13]

    Zhang ZT, Yang B, Xiao Y, Xu Y, Wu X D 2004 Nuclear Fusion and Plasma Physics 24 208 (in Chinese) [张芝涛、杨 〖14] Wang YH, Wang DZ 2003 Acta Phys. Sin. 52 1694 (in Chinese) [王艳辉、王德真2003 52 1694]

    [14]

    StrümpelC, AstrovYA, Purwins H-G2002 Phys. Rev. E 65 066210

    [15]

    Strümpel C, Purwins H -G 2001 Phys. Rev. E 63 026409

    [16]

    Astrov Y A, Ammelt E, Purwins H -G 1997 Phys. Rev. Lett. 21

    [17]

    Dong L F, Ran J X, Mao Z G 2005 Appl. Phys. Lett. 86 161501

    [18]

    Merbahi N, Sewraj N, Marchal F, Salamero Y, Millet P 2004 J. Phys. D: Appl. Phys. 37 1664

    [19]

    Gurevich S V, Amiranashvili Sh, Purwins H -G 2006 Phys. Rev. E 74 066201

  • [1]

    Stollenwerk L 2009 New J. Phys. 11 103034

    [2]

    Stollenwerk L, Laven J G, Purwins H -G 2007 Phys. Rev. Lett. 98 255001

    [3]

    3129

    [4]

    Reece R J, Jozef R, Dai X, Sherman D M 2005 J. Phys. D: Appl. Phys. 38 555

    [5]

    Kogelschatz U 2003 Plasma Chemistry and Plasma Processing 23 1

    [6]

    Duan X X, Ouyang J T, Zhao X F, He F 2009 Phys. Rev. E 80 016202

    [7]

    Shi H, Wang Y H, Wang D Z 2008 Phys. Plasmas 15 122306

    [8]

    Zhang H Y, Wang D Z, Wang X G 2007 Chin. Phys. 16 1089

    [9]

    Ouyang J T, He F, Mao J S, Feng S 2006 Acta Phys. Sin. 55 5969 (in Chanese) [欧阳吉庭、何 锋、缪劲松、冯 硕 2006 55 5969]

    [10]

    Zhang Y, Gu B, Wang WC, Peng XW, Wang DZ 2009 Acta Phys. Sin. 58 5532 (in Chinese) [张 燕、顾 彪、王文春、彭许文、王德真 2009 58 5532]

    [11]

    Dong LF, Yang L, Zhang YZ, Yue H 2009 Acta Phys. Sin. 58 8461 (in Chanese) [董丽芳、杨 丽、张彦召、岳 晗 2009 58 8461]

    [12]

    Li G, Xu YJ, Mu KJ, Nie CQ, Zhu JQ, Zhang Y, Li HM 2008 Acta Phys. Sin. 57 6444 (in Chinese) [李 钢、徐燕 〖12] Yin ZQ, Wan JY, Huang MQ, Wang HJ 2007 Acta Phys. Sin. 56 7078 (in Chinese) [尹增谦、万景瑜、黄明强、王慧娟 2007 57 6444]

    [13]

    Zhang ZT, Yang B, Xiao Y, Xu Y, Wu X D 2004 Nuclear Fusion and Plasma Physics 24 208 (in Chinese) [张芝涛、杨 〖14] Wang YH, Wang DZ 2003 Acta Phys. Sin. 52 1694 (in Chinese) [王艳辉、王德真2003 52 1694]

    [14]

    StrümpelC, AstrovYA, Purwins H-G2002 Phys. Rev. E 65 066210

    [15]

    Strümpel C, Purwins H -G 2001 Phys. Rev. E 63 026409

    [16]

    Astrov Y A, Ammelt E, Purwins H -G 1997 Phys. Rev. Lett. 21

    [17]

    Dong L F, Ran J X, Mao Z G 2005 Appl. Phys. Lett. 86 161501

    [18]

    Merbahi N, Sewraj N, Marchal F, Salamero Y, Millet P 2004 J. Phys. D: Appl. Phys. 37 1664

    [19]

    Gurevich S V, Amiranashvili Sh, Purwins H -G 2006 Phys. Rev. E 74 066201

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  • 被引次数: 0
出版历程
  • 收稿日期:  2010-03-30
  • 修回日期:  2010-04-27
  • 刊出日期:  2011-01-05

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