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Optical properties, stress and microstructure of Nb2O5 thin films prepared by ion beam sputtering (IBS) are investigated, and the effects of assist ion beam energy and ion current on characteristics of Nb2O5 thin films are systematically discussed. The results show that with different parameters of assisted ion source, the refractive index changes from 2.310 to 2.276 and residual stress varies from -281MPa to -152 MPa. The extinction coefficient of Nb2O5 can be under 10-4, and the surface is very smooth in an optimum deposition condition. Thin films deposited by IBS exhibit better optical properties and microstructures than those deposited by ion assisted deposition (IAD).
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Keywords:
- Nb2O5 thin films /
- ion beam sputtering /
- optical properties /
- stress
[1] Wei D T 1989 Appl. Opt. 28 2813
[2] Becker J, Scheuer V 1990 Appl. Opt. 29 4303
[3] Ristau D 2005 Proc. of SPIE 5963 596313
[4] Zhang D J, Li M Y, Gu P F 2004 Journal of Zhejiang University (Engineering Science) 38 1387 (in Chinese) [张德景、李明宇、顾培夫 2004 浙江大学学报 (工学版) 38 1387]
[5] Lee C C, Hsu J C, WONG D H 2000 Optical and Quantum Electronics 32 327
[6] Lee C C, Tien C L, Hsu J C 2002 Appl. Opt. 41 2043
[7] Cetinörgü E, Baloukas B, Zabeida O, Klemberg-Sapieha J, Martinu L 2009 Appl. Opt. 48 4536
[8] Liu J S 2003 Ion Beam Deposition Film Technology and Application (Beijing: National Defense Industry Press) p61—69 (in Chinese) [刘金声 2003 离子束沉积薄膜技术及其应用 (北京:国防工业出版社) 第61—69页]
[9] Cen W, Zhang Y G, Chen W L, Gu P F 2009 Acta Phys. Sin. 58 7025 [岑 忞、章岳光、陈卫兰、顾培夫 2009 58 7025]
[10] Tang J F, Gu P F, Liu X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) p403— 412 (in Chinese) [唐晋发、顾培夫、刘 旭、李海峰 2006 现代光学薄膜技术 (浙江:浙江大学出版社) 第403—412 页]
[11] Mohan S, Krishna M 1995 Vacuum 46 645
[12] Kaiser N, Pulker H K (Translated by Liu X, Wang Z S, Yi K) 2008 Optical Interference Coatings (Hangzhou: Zhejiang University Press) p145—158 (in Chinese) [凯泽 N, 普克 H K著 刘旭,王占山,易葵译 2008 光学干涉薄膜 (杭州:浙江大学出版社),第145—158页]
[13] Chen W L, Gu P F, Wang Y, Zhang Y G, Liu X 2009 Acta Phys. Sin. 58 4316 (in Chinese) [陈为兰、顾培夫、王 颖、章岳光、刘 旭 2009 57 4316]
[14] Gu P F, Zheng Z R, Zhao Y J, Liu X 2006 Acta Phys.Sin. 55 6459 (in Chinese) [顾培夫、郑臻荣、赵永江、刘 旭 2006 55 6459]
[15] Di Y X, Ji X H, Hu M, Qin Y W, Chen J L 2006 Acta Phys. Sin. 55 5451 (in Chinese) [邸玉贤、计欣华、胡 明、秦玉文、陈金龙 2006 55 5451]
[16] Chen T C, Chu C J, Ho C H, Wu C C, Lee C C 2007 J. Appl. Phys. 101 043513
[17] Davis C A 1993 Thin Solid Films 226 30
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[1] Wei D T 1989 Appl. Opt. 28 2813
[2] Becker J, Scheuer V 1990 Appl. Opt. 29 4303
[3] Ristau D 2005 Proc. of SPIE 5963 596313
[4] Zhang D J, Li M Y, Gu P F 2004 Journal of Zhejiang University (Engineering Science) 38 1387 (in Chinese) [张德景、李明宇、顾培夫 2004 浙江大学学报 (工学版) 38 1387]
[5] Lee C C, Hsu J C, WONG D H 2000 Optical and Quantum Electronics 32 327
[6] Lee C C, Tien C L, Hsu J C 2002 Appl. Opt. 41 2043
[7] Cetinörgü E, Baloukas B, Zabeida O, Klemberg-Sapieha J, Martinu L 2009 Appl. Opt. 48 4536
[8] Liu J S 2003 Ion Beam Deposition Film Technology and Application (Beijing: National Defense Industry Press) p61—69 (in Chinese) [刘金声 2003 离子束沉积薄膜技术及其应用 (北京:国防工业出版社) 第61—69页]
[9] Cen W, Zhang Y G, Chen W L, Gu P F 2009 Acta Phys. Sin. 58 7025 [岑 忞、章岳光、陈卫兰、顾培夫 2009 58 7025]
[10] Tang J F, Gu P F, Liu X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) p403— 412 (in Chinese) [唐晋发、顾培夫、刘 旭、李海峰 2006 现代光学薄膜技术 (浙江:浙江大学出版社) 第403—412 页]
[11] Mohan S, Krishna M 1995 Vacuum 46 645
[12] Kaiser N, Pulker H K (Translated by Liu X, Wang Z S, Yi K) 2008 Optical Interference Coatings (Hangzhou: Zhejiang University Press) p145—158 (in Chinese) [凯泽 N, 普克 H K著 刘旭,王占山,易葵译 2008 光学干涉薄膜 (杭州:浙江大学出版社),第145—158页]
[13] Chen W L, Gu P F, Wang Y, Zhang Y G, Liu X 2009 Acta Phys. Sin. 58 4316 (in Chinese) [陈为兰、顾培夫、王 颖、章岳光、刘 旭 2009 57 4316]
[14] Gu P F, Zheng Z R, Zhao Y J, Liu X 2006 Acta Phys.Sin. 55 6459 (in Chinese) [顾培夫、郑臻荣、赵永江、刘 旭 2006 55 6459]
[15] Di Y X, Ji X H, Hu M, Qin Y W, Chen J L 2006 Acta Phys. Sin. 55 5451 (in Chinese) [邸玉贤、计欣华、胡 明、秦玉文、陈金龙 2006 55 5451]
[16] Chen T C, Chu C J, Ho C H, Wu C C, Lee C C 2007 J. Appl. Phys. 101 043513
[17] Davis C A 1993 Thin Solid Films 226 30
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