SiO2薄膜内部短程有序微结构研究

刘华松; 季一勤; 姜玉刚; 王利栓; 冷健; 孙鹏; 庄克文

doi:10.7498/aps.62.187801

摘要

SiO2薄膜是重要的低折射率材料之一, 针对离子束溅射(IBS)和电子束蒸发(EB)的SiO2薄膜, 采用红外光谱反演技术获得在400–1500 cm-1波数内的介电常数, 通过对介电能损函数的分析获得了两种薄膜在横向和纵向光学振动模式下的振动频率和Si–O–Si键角.研究结果表明, 在EB SiO2薄膜短程有序范围内, SiO4的连接方式主要是类柯石英结构、3-平面折叠环和热液石英结构的SiO4连接方式; 在IBS SiO2薄膜短程有序范围内, SiO4的连接方式复杂主要是类柯石英结构、3-平面折叠环、 4-平面折叠环结构和类热液石英结构.

关键词:

Abstract

SiO2 is one of important low refractive index materials, and SiO2 films are prepared by both ion-beam sputtering (IBS) and electron-beam evaporating (EB) technology. Dielectric constants of SiO2 films are calculated by infrared spectrum inversion technique in a wavenumber range from 400 cm-1 to 1500 cm-1. Through analyzing dielectric energy loss function, the oscillation frequency and the Si–O–Si angle of two types of SiO2 films are obtained in the transverse optics and longitudinal optics oscillating mode. The research results indicate that the attended modes of SiO4 are main coesite-like structure, three-plane folding ring structure, and keatite-like structure in the range of short-range order for EB-SiO2 films, but the attended modes of SiO4 are main coesite-like structure, three-plane folding ring structure, four-plane folding ring structure, and keatite-like structure in the range of short-range order for IBS-SiO2 films.

Keywords:

作者及机构信息

1.
天津津航技术物理研究所, 天津市薄膜光学重点实验室, 天津 300192

基金项目: 国家自然科学基金重点项目(批准号:61235011);国家重大科学仪器专项子项目(批准号:2012YQ04016405);天津市自然科学基金(批准号:13JCYBJC17300)和天津市青年自然科学基金(批准号:12JCQNIC01200)资助的课题.

Authors and contacts

1.
Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300192, China

Funds: Project supported by the Key Program of the National Natural Science Foundation of China (Grant No. 61235011), the Subproject of National Key Scientific Instruments Project of China (Grant No. 2012YQ04016405), the Natural Science Foundation of Tianjin, China (Grant No. 13JCYBJC17300), and the Natural Science Foundation for Young Scientists of Tianjin, China (Grant No. 12JCQNIC01200).

参考文献

[1]	Martinet C, Devine R A B 1995 J. Appl. Phys. 77 4343
[2]	Lisovskii I P, Litovchenko V G, Lozinskii V G, Steblovskii G I 1992 Thin Solid Films 213 164
[3]	Tabata A, Matsuno N, Suzuoki Y, Mizutani T 1996 Thin Solid Films 289 84
[4]	Pliskin W A 1977 J. Vac. Sci. Technol. 14 1064
[5]	Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, Richard B, Stevenson I, Sadkhin G, Morton D, McEldowney S, Klinger R, Martin P J, Court N, Dligatch S, Gross M, Netterfield R P 2004 Appl. Opt. 43 2670
[6]	Brunet-Bruneau A, Fisson S, Vuye G, Rivory J 2000 J. Appl. Phys. 87 7303
[7]	Brunet-Bruneau A, Fisson S, Gallas B, Vuye G, Rivory J 2000 Thin Solid Films 377-378 57
[8]	Brunet-Bruneau A, Rivory J, Rafin B, Robic J Y, Chaton P 1997 J. Appl. Phys. 82 1330
[9]	Palik E D 1991 Hand Book of Optical Constant of Solids II (New York: Academic) p224
[10]	Miloua R, Kebbab Z, Chiker F, Sahraoui K, Khadraoui M, Benramdane N 2012 Opt. Lett. 37 449
[11]	Macleod H A 1986 Thin Film Optical Filters (Bristol: Adam Hilger) p35
[12]	Dobrowolski J A, Kemp R A 1990 Appl. Opt. 29 2876
[13]	Gunde M K 2000 Physica B 292 286
[14]	Martinet C, Devin R A B 1995 Journal of Non-Crystalline Solids 187 96
[15]	Pulker H K 1999 Coating on Glass (Amsterdam: Elsevier) p351
[16]	Zhang X G, Wang C, Lu Z Q, Yang J, Li L, Yang Y 2011 Acta Phys. Sin. 60 096101 (in Chinese) [张学贵, 王茺, 鲁植全, 杨杰, 李亮, 杨宇 2011 60 096101]
[17]	Luo Y Y, Zhu X F 2011 Acta Phys. Sin. 60 086104 (in Chinese) [罗银燕, 朱贤方 2011 60 086104]
[18]	Yuan W J, Zhang Y G, Shen W D, Ma Q, Liu X 2011 Acta Phys. Sin. 60 047803 (in Chinese) [袁文佳, 章岳光, 沈伟东, 马群, 刘旭 2011 60 047803]
[19]	Yan Z J, Wang Y Y, Xu R, Jiang Z M 2004 Acta Phys. Sin. 53 2771 (in Chinese) [阎志军, 王印月, 徐闰, 蒋最敏 2004 53 2771]

施引文献

[1]	Martinet C, Devine R A B 1995 J. Appl. Phys. 77 4343
[2]	Lisovskii I P, Litovchenko V G, Lozinskii V G, Steblovskii G I 1992 Thin Solid Films 213 164
[3]	Tabata A, Matsuno N, Suzuoki Y, Mizutani T 1996 Thin Solid Films 289 84
[4]	Pliskin W A 1977 J. Vac. Sci. Technol. 14 1064
[5]	Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, Richard B, Stevenson I, Sadkhin G, Morton D, McEldowney S, Klinger R, Martin P J, Court N, Dligatch S, Gross M, Netterfield R P 2004 Appl. Opt. 43 2670
[6]	Brunet-Bruneau A, Fisson S, Vuye G, Rivory J 2000 J. Appl. Phys. 87 7303
[7]	Brunet-Bruneau A, Fisson S, Gallas B, Vuye G, Rivory J 2000 Thin Solid Films 377-378 57
[8]	Brunet-Bruneau A, Rivory J, Rafin B, Robic J Y, Chaton P 1997 J. Appl. Phys. 82 1330
[9]	Palik E D 1991 Hand Book of Optical Constant of Solids II (New York: Academic) p224
[10]	Miloua R, Kebbab Z, Chiker F, Sahraoui K, Khadraoui M, Benramdane N 2012 Opt. Lett. 37 449
[11]	Macleod H A 1986 Thin Film Optical Filters (Bristol: Adam Hilger) p35
[12]	Dobrowolski J A, Kemp R A 1990 Appl. Opt. 29 2876
[13]	Gunde M K 2000 Physica B 292 286
[14]	Martinet C, Devin R A B 1995 Journal of Non-Crystalline Solids 187 96
[15]	Pulker H K 1999 Coating on Glass (Amsterdam: Elsevier) p351
[16]	Zhang X G, Wang C, Lu Z Q, Yang J, Li L, Yang Y 2011 Acta Phys. Sin. 60 096101 (in Chinese) [张学贵, 王茺, 鲁植全, 杨杰, 李亮, 杨宇 2011 60 096101]
[17]	Luo Y Y, Zhu X F 2011 Acta Phys. Sin. 60 086104 (in Chinese) [罗银燕, 朱贤方 2011 60 086104]
[18]	Yuan W J, Zhang Y G, Shen W D, Ma Q, Liu X 2011 Acta Phys. Sin. 60 047803 (in Chinese) [袁文佳, 章岳光, 沈伟东, 马群, 刘旭 2011 60 047803]
[19]	Yan Z J, Wang Y Y, Xu R, Jiang Z M 2004 Acta Phys. Sin. 53 2771 (in Chinese) [阎志军, 王印月, 徐闰, 蒋最敏 2004 53 2771]

[1]	李其柱, 范浩涵, 高梓恒, 南鹏飞, 朱铁军, 葛炳辉. 原位加热诱导Nb扩散引起Nb_0.8CoSb有序度的转变. , 2024, 73(11): 116401. doi: 10.7498/aps.73.20240325
[2]	李海涛, 江亚晓, 涂丽敏, 李少华, 潘玲, 李文标, 杨仕娥, 陈永生. 退火温度对电子束蒸发沉积Cu2O薄膜性能的影响. , 2018, 67(5): 053301. doi: 10.7498/aps.67.20172463
[3]	刘华松, 杨霄, 王利栓, 姜承慧, 刘丹丹, 季一勤, 张锋, 陈德应. SiO2薄膜红外波段介电常数谱的高斯振子模型研究. , 2017, 66(5): 054211. doi: 10.7498/aps.66.054211
[4]	郭昭龙, 赵海新, 赵卫. 纳米ZnO-SiO2自清洁增透薄膜的制备及其性能. , 2016, 65(6): 064206. doi: 10.7498/aps.65.064206
[5]	李维勤, 张海波, 鲁君. 非聚焦电子束照射SiO2薄膜带电效应. , 2012, 61(2): 027302. doi: 10.7498/aps.61.027302
[6]	杨杰, 王茺, 靳映霞, 李亮, 陶东平, 杨宇. 离子束溅射Ge量子点的应变调制生长. , 2012, 61(1): 016804. doi: 10.7498/aps.61.016804
[7]	张学贵, 王茺, 鲁植全, 杨杰, 李亮, 杨宇. 离子束溅射自组装Ge/Si量子点生长的演变. , 2011, 60(9): 096101. doi: 10.7498/aps.60.096101
[8]	罗银燕, 朱贤方. 电阻热蒸发镀膜与电子束蒸发镀膜对纳米球刻蚀方法制备二维银纳米阵列结构的影响. , 2011, 60(8): 086104. doi: 10.7498/aps.60.086104
[9]	范平, 蔡兆坤, 郑壮豪, 张东平, 蔡兴民, 陈天宝. Bi-Sb-Te基热电薄膜温差电池离子束溅射制备与表征. , 2011, 60(9): 098402. doi: 10.7498/aps.60.098402
[10]	袁文佳, 章岳光, 沈伟东, 马群, 刘旭. 离子束溅射制备Nb2O5光学薄膜的特性研究. , 2011, 60(4): 047803. doi: 10.7498/aps.60.047803
[11]	范平, 郑壮豪, 梁广兴, 张东平, 蔡兴民. Sb2Te3热电薄膜的离子束溅射制备与表征. , 2010, 59(2): 1243-1247. doi: 10.7498/aps.59.1243
[12]	刘亮, 马小柏, 聂瑞娟, 姚丹, 王福仁. Mg/B多层膜退火法中不同制备条件对MgB2超导薄膜性质的影响. , 2009, 58(11): 7966-7971. doi: 10.7498/aps.58.7966
[13]	何丽静, 林晓娉, 王铁宝, 刘春阳. 单晶Si表面离子束溅射沉积Co纳米薄膜的研究. , 2007, 56(12): 7158-7164. doi: 10.7498/aps.56.7158
[14]	黄丽清, 潘华强, 王军, 童慧敏, 朱可, 任冠旭, 王永昌. 多孔氧化铝膜上自组织生长Sn纳米点阵列的研究. , 2007, 56(11): 6712-6716. doi: 10.7498/aps.56.6712
[15]	侯海虹, 孙喜莲, 申雁鸣, 邵建达, 范正修, 易葵. 电子束蒸发氧化锆薄膜的粗糙度和光散射特性. , 2006, 55(6): 3124-3127. doi: 10.7498/aps.55.3124
[16]	张东平, 齐红基, 邵建达, 范瑞瑛, 范正修. 离子束溅射法薄膜生长中结瘤微缺陷的生长机理. , 2005, 54(3): 1385-1389. doi: 10.7498/aps.54.1385
[17]	顾培夫, 陈海星, 郑臻荣, 刘旭. 弱吸收多层薄膜消光系数的反演. , 2005, 54(8): 3722-3725. doi: 10.7498/aps.54.3722
[18]	齐红基, 易　葵, 贺洪波, 邵建达. 溅射粒子能量对金属Mo薄膜表面特性的影响. , 2004, 53(12): 4398-4404. doi: 10.7498/aps.53.4398
[19]	阎志军, 王印月, 徐闰, 蒋最敏. 电子束蒸发制备HfO2高k薄膜的结构特性. , 2004, 53(8): 2771-2774. doi: 10.7498/aps.53.2771
[20]	朱开贵, 石建中, 邵庆益. 镶嵌在SiO2薄膜中InAs纳米颗粒的Raman散射. , 2000, 49(11): 2304-2306. doi: 10.7498/aps.49.2304

计量

文章访问数: 6001
PDF下载量: 920
被引次数: 0

姓名
邮箱
手机号码
标题
留言内容
验证码

搜索

留言板