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High Power impulse Unbalanced Magnetron Sputtering has been coupled to a direct current source (dc-HPPUMS or dc-HiPUMS). A coaxial coil and an attached hollow cathode were applied to control discharge properties and improve pulsed power density. A large extent breakdown was induced for avalanche discharge mechanism. The magnetic trap on sputtering target traps the secondary electrons excited by the avalanche and forms a drift current in magnetic trap. The peak pulse current density is higher than 100 A/cm2 with a pulse frequency less than 40 Hz. The space charge limited condition controls the discharge for plasma far away from equilibrium. The discharge theory was taken to describe the high ionization mechanism in dc-HPPUMS discharge. The parameters deduced from Child law agree with the experimental results.
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Keywords:
- discharge /
- pulse technology
[1] Kouznetsov V, Maca K, Schneider J M, Helmersson U and Petrov I 1999 Surf. and Coat. Tech. 122 290
[2] Ehiasarian A P, New R, Münz W D 2002 Vacuum 65 147
[3] Christiea D J 2005 J. Vac. Sci. Technol. A 23 330
[4] Bohlmark J, Lattemann M, Gudmundsson J T, Ehiasarian A P, YAranda Gonzalvo Y, Brenning N, Helmersson U 2006 Thin Solid Films 515 1522
[5] Anders A, Andersson J, Ehiasarian A 2007 Journal of Applied Physics 102 113303
[6] Andersson J, Ehiasarian A P, Anders A 2008 Phys. Rev. Lett. 93 071504
[7] Thornton J A 1978 J.Vac.Sci.Technol. A 15 171
[8] Windows B, Savvides N 1986 J.Vac.Sci.Technol. A 4 196
[9] Rossnagel S M, Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276
[10] Sugai H 2002 The Plasma Engineering (1st ed) (Beijing: Science Press) p58 (in Chinese) [菅井秀郎 2002 等离子体电子工程 (北京: 科学出版社) 第58页]
[11] Roth J R 1998 Production Plasma Engineering (1st ed) (Beijing: Science press) p68 (in Chinese) [罗思 J R 1998 工业等离子体工程 (第一版) (北京:科学出版社) 第68页]
[12] Mu Z X,Li G Q,Che D L 2004 Acta Phys. Sin. 53 1994 (in Chinese) [牟宗信, 李国卿, 车德良 2004 53 1994 ]
[13] Bradley J W, Cecconello M 1998 Vacuum 49 315
[14] Lieberman M A, Lichtenberg A J 2007 Principles of plasma discharges and materials processing (1st ed) (Beijing: Science press) p66 (in Chinese) [力伯曼 M A ,里登伯格 A J著,蒲以康等译 2007 (第一版)(北京:科学出版社) 第66页]
[15] Mesyats G A 2007 Physics of vacuum discharge and high power pulse technology (1st ed) (Beijing: Defense Production Press) p39 (in Chinese) [米夏兹著 Г,李国政译 2007 真空放电物理和高功率脉冲技术 (第一版) (北京:国防出版社)第39页]
[16] Liu X S 2005 High pulsed power technology (1st ed) (Beijing: Defense Production Press) p221 (in Chinese) [刘锡三编著 2005 高功率脉冲技术 (第一版) (北京:国防工业出版社 第221页]
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[1] Kouznetsov V, Maca K, Schneider J M, Helmersson U and Petrov I 1999 Surf. and Coat. Tech. 122 290
[2] Ehiasarian A P, New R, Münz W D 2002 Vacuum 65 147
[3] Christiea D J 2005 J. Vac. Sci. Technol. A 23 330
[4] Bohlmark J, Lattemann M, Gudmundsson J T, Ehiasarian A P, YAranda Gonzalvo Y, Brenning N, Helmersson U 2006 Thin Solid Films 515 1522
[5] Anders A, Andersson J, Ehiasarian A 2007 Journal of Applied Physics 102 113303
[6] Andersson J, Ehiasarian A P, Anders A 2008 Phys. Rev. Lett. 93 071504
[7] Thornton J A 1978 J.Vac.Sci.Technol. A 15 171
[8] Windows B, Savvides N 1986 J.Vac.Sci.Technol. A 4 196
[9] Rossnagel S M, Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276
[10] Sugai H 2002 The Plasma Engineering (1st ed) (Beijing: Science Press) p58 (in Chinese) [菅井秀郎 2002 等离子体电子工程 (北京: 科学出版社) 第58页]
[11] Roth J R 1998 Production Plasma Engineering (1st ed) (Beijing: Science press) p68 (in Chinese) [罗思 J R 1998 工业等离子体工程 (第一版) (北京:科学出版社) 第68页]
[12] Mu Z X,Li G Q,Che D L 2004 Acta Phys. Sin. 53 1994 (in Chinese) [牟宗信, 李国卿, 车德良 2004 53 1994 ]
[13] Bradley J W, Cecconello M 1998 Vacuum 49 315
[14] Lieberman M A, Lichtenberg A J 2007 Principles of plasma discharges and materials processing (1st ed) (Beijing: Science press) p66 (in Chinese) [力伯曼 M A ,里登伯格 A J著,蒲以康等译 2007 (第一版)(北京:科学出版社) 第66页]
[15] Mesyats G A 2007 Physics of vacuum discharge and high power pulse technology (1st ed) (Beijing: Defense Production Press) p39 (in Chinese) [米夏兹著 Г,李国政译 2007 真空放电物理和高功率脉冲技术 (第一版) (北京:国防出版社)第39页]
[16] Liu X S 2005 High pulsed power technology (1st ed) (Beijing: Defense Production Press) p221 (in Chinese) [刘锡三编著 2005 高功率脉冲技术 (第一版) (北京:国防工业出版社 第221页]
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