[1] |
Liu Hua-Song, Yang Xiao, Wang Li-Shuan, Jiang Cheng-Hui, Liu Dan-Dan, Ji Yi-Qin, Zhang Feng, Chen De-Ying. Gaussian oscillator model of the dielectric constant of SiO2 thin film in infrared range. Acta Physica Sinica,
2017, 66(5): 054211.
doi: 10.7498/aps.66.054211
|
[2] |
Liu Hua-Song, Ji Yi-Qin, Jiang Yu-Gang, Wang Li-Shuan, Leng Jian, Sun Peng, Zhuang Ke-Wen. Study on internal short-range order microstructure characteristic of SiO2 thin film. Acta Physica Sinica,
2013, 62(18): 187801.
doi: 10.7498/aps.62.187801
|
[3] |
Li Wei-Qin, Zhang Hai-Bo, Lu Jun. Charging effects of SiO2 thin films under defocused electron beam irradiation. Acta Physica Sinica,
2012, 61(2): 027302.
doi: 10.7498/aps.61.027302
|
[4] |
Zhou Hong-Juan, Zhen Cong-Mian, Zhang Yong-Jin, Zhao Cui-Lian, Ma Li, Hou Deng-Lu. Preparation and magnetism of the N doped SiO2 thin film. Acta Physica Sinica,
2010, 59(5): 3499-3503.
doi: 10.7498/aps.59.3499
|
[5] |
Wang Qiao-Zhan, Yu Run-Sheng, Qin Xiu-Bo, Li Yu-Xiao, Wang Bao-Yi, Jia Quan-Jie. Pore structure determination of mesoporous SiO2 thin films by slow positron annihilation spectroscopy. Acta Physica Sinica,
2009, 58(12): 8478-8483.
doi: 10.7498/aps.58.8478
|
[6] |
Sun Xiao-Fei, Wei Chang-Ping, Li Qi-Yuan. Preparation and characterization of Ag-Au alloys/SiO2 composite thin films. Acta Physica Sinica,
2009, 58(8): 5816-5820.
doi: 10.7498/aps.58.5816
|
[7] |
Weng Wei-Xiang, Yan Wen-Sheng, Sun Zhi-Hu, Yao Tao, Guo Yu-Xian, Wang Feng, Wei Shi-Qiang, Zhang Guo-Bin, Xu Peng-Shou. Structural and magnetic properties of Ni1-xFex O thin films synthesized by pulsed laser deposition. Acta Physica Sinica,
2008, 57(9): 5788-5792.
doi: 10.7498/aps.57.5788
|
[8] |
Ren Peng, Liu Zhong-Liang, Ye Jian, Jiang Yong, Liu Jin-Feng, Sun Yu, Xu Peng-Shou, Sun Zhi-Hu, Pan Zhi-Yun, Yan Wen-Sheng, Wei Shi-Qiang. Structural study of MnxSi1-x magnetic semiconductor thin films. Acta Physica Sinica,
2008, 57(7): 4322-4327.
doi: 10.7498/aps.57.4322
|
[9] |
Jiang Hai-Qing, Yao Xi, Che Jun, Wang Min-Qiang. Luminescence and optical constant of ZnSe/SiO2 composite thin films. Acta Physica Sinica,
2006, 55(4): 2084-2091.
doi: 10.7498/aps.55.2084
|
[10] |
Zhang Yun, Zhang Bo-Ping, Jiao Li-Shi, Zhang Hai-Long, Li Xiang-Yang. Preparation and characterization of Au/SiO2 nano-composite multilayer films. Acta Physica Sinica,
2006, 55(7): 3730-3735.
doi: 10.7498/aps.55.3730
|
[11] |
Gou Jie, He Zhi-Wei, Pan Guo-Hui, Wang Yin-Yue. Density of defect states in low-k porous SiO2:F film researched by SCLC method. Acta Physica Sinica,
2006, 55(6): 2936-2940.
doi: 10.7498/aps.55.2936
|
[12] |
Zhang Yun, Zhang Bo-Ping, Jiao Li-Shi, Li Xiang-Yang. Microstructure and photoabsorption of Au/SiO2 nano-composite films. Acta Physica Sinica,
2006, 55(4): 2078-2083.
doi: 10.7498/aps.55.2078
|
[13] |
Gu Pei-Fu, Zheng Zhen-Rong, Zhao Yong-Jiang, Liu Xu. Study on the mechanism and measurement of stress of TiO2 and SiO2 thin-films. Acta Physica Sinica,
2006, 55(12): 6459-6463.
doi: 10.7498/aps.55.6459
|
[14] |
He Zhi-Wei, Zhen Cong-Mian, Lan Wei, Wang Yin-Yue. Deposition of nanoporous silica thin films by sol-gel. Acta Physica Sinica,
2003, 52(12): 3130-3134.
doi: 10.7498/aps.52.3130
|
[15] |
. . Acta Physica Sinica,
2002, 51(4): 882-888.
doi: 10.7498/aps.51.882
|
[16] |
WU GUANG-MING, WANG YU, SHEN JUN, YANG TIAN-HE, ZHANG QING-YUAN, ZHOU BIN, DENG ZHONG-SHENG, FAN BIN, ZHOU DONG-PING, ZHANG FENG-SHAN. . Acta Physica Sinica,
2001, 50(1): 175-181.
doi: 10.7498/aps.50.175
|
[17] |
ZHU KAI-GUI, SHI JIAN-ZHONG, SHAO QING-YI. RAMAN SCATTERING FROM InAs NANOCRYSTALS EMBEDDED IN SiO2 THIN FILMS. Acta Physica Sinica,
2000, 49(11): 2304-2306.
doi: 10.7498/aps.49.2304
|
[18] |
Shi Wang-Zhou, Yao Wei-Guo, Qi-Zhen-Zhong, He Yi-Zhen. . Acta Physica Sinica,
1995, 44(7): 1172-1176.
doi: 10.7498/aps.44.1172
|
[19] |
QI MING, LUO JIN-SHENG. A STUDY ON THE PROPERTIES OF SiO2 THIN FILM THERMALLY NITRIDED IN AMMONIA AND ITS INTERFACE. Acta Physica Sinica,
1988, 37(10): 1600-1606.
doi: 10.7498/aps.37.1600
|
[20] |
SHIN SHIH-KONG, HUANG CHAANG, YU FUNG-SHU. MEASUREMENT OF THE THICKNESS OF THERMALLY GROWN SiO2 THIN FILMS. Acta Physica Sinica,
1964, 20(7): 654-661.
doi: 10.7498/aps.20.654
|