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Electronic structures and optical properties of boron and phosphorus doped β-Si3N4

Cheng Chao-Qun Li Gang Zhang Wen-Dong Li Peng-Wei Hu Jie Sang Sheng-Bo Deng Xiao

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Electronic structures and optical properties of boron and phosphorus doped β-Si3N4

Cheng Chao-Qun, Li Gang, Zhang Wen-Dong, Li Peng-Wei, Hu Jie, Sang Sheng-Bo, Deng Xiao
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  • The electronic structures and optical properties of boron/phosphorus mono- and co-doped β silicon nitride are studied by the first-principles plane-wave ultrasoft pseudopotential method with the generalized gradient approximation. The results are obtained as follows. The B-doped system has a better stability than the P-doped system, while the P-doped structure has a stronger ionicity. The mono-doping and co-doping can narrow the band gap of β silicon nitride while the co-doping introduces the deep impurity levels and strengthens the localized states. The mono-doping causes the imaginary part of dielectric function, the peaks of absorption spectra and energy loss spectra to red-shift, and their amplitudes to decrease, resulting in a significant difference from the intrinsic state. The co-doping induces the peak of imaginary part of the dielectric function to blue-shift, broadens the energy loss peak, greatly enhances the electronic transition in the high energy region, and controlling the ratio of the numbers of atoms (B and P) in co-doping can achieve a low charged defect concentration, implying its potential application in the field of microelectronics.
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 51205275, 51205276, 51205273), National High Technology Research and Development Program of China (Grant No. 2013AA041109), the Natural Science Foundation of Shanxi Province, China (Grant No. 2013021017-1), and the Shanxi Provincial Foundation for Returned Scholars (Main Program), China (Grant No. 2013-035).
    [1]

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    [2]

    Yu B H, Chen D 2014 Acta Phys. Sin. 63 047101 (in Chinese) [余本海, 陈东 2014 63 047101]

    [3]

    Gritsenko V A 2012 Physics-Uspekhi 55 498

    [4]

    Papaioannou G J, Exarchos M, Theonas V 2006 Appl. Phys. Lett. 89 103512

    [5]

    Li G, San H S, Chen X Y 2009 J. Appl. Phys. 105 124503

    [6]

    Li G, Chen X Y 2012 Appl. Phys. A 109 539

    [7]

    Lu X F, La P Q, Guo X, Wei Y P, Nan X L, He L 2013 J. Mod. Phys. B 27 1250212

    [8]

    Lu X F, La P Q, Guo X, Wei Y P, Nan X L, He L 2013 Comput. Mater. Sci. 79 174

    [9]

    Yang L, Li J B, Yang X Z, Dai J H 2004 Chin. J. Rare Metals 28 609 (in Chinese) [杨柳, 李建保, 杨晓战, 戴金辉 2004 稀有金属 28 609]

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    Tong X G, Yang X Z, Li J B 2005 Rare Metal Mat. Eng. 34 508 (in Chinese) [童旭光, 杨晓战, 李建保 2005 稀有金属材料与工程 34 508]

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    Xu M, Ding Y C, Xiong G, Zhu W J, He H L 2008 Phys. B: Condens. Matter 403 2515

    [12]

    van Spengen W M 2012 J. Micromech. Microeng. 22 074001

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    Hasegawa S, Segawa M, Kurata Y 1986 Appl. Phys. Lett. 49 1178

    [14]

    Hasegawa S, Segawa M, Kurata Y 1988 J. Appl. Phys. 64 1931

    [15]

    Guo H H, Yang T, Tao P, Zhang Z D 2014 Chin. Phys. B 23 017201

    [16]

    Zhang C L, Han P D, Wang X H, Zhang Z X, Wang L P, Xu H X 2014 Chin. Phys. B 22 126802

    [17]

    Pan H Z, Xu M, Zhu W J, Zhou H P 2006 Acta Phys. Sin. 55 3585 (in Chinese) [潘洪哲, 徐明, 祝文军, 周海平 2006 55 3585]

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    Perdew J P, Burke K, Ernzerhof M 1996 Phys. Rev. Lett. 77 3865

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    Car R, Parrinello M 1985 Phys. Rev. Lett. 55 2471

    [20]

    Vanderbilt D 1990 Phys. Rev. B 41 7892

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    Wrazien S J, Zhao Y J, Krayer J D 2003 Solid-State Electron. 47 885

    [22]

    Fischer T H, Almlöf J 1992 J. Phys. Chem. 96 9768

    [23]

    Segall M D, Indan P L D, Probert M J, Pickard C J, Hasnip P J, Clark S J, Payne M C 2002 J. Phys.: Condens. Matter 14 2717

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    Xie X J, Zhong L P, Liang Z H, Fan C M, Han P D 2013 Chin. J. Inorg. Chem. 29 2514 (in Chinese) [解学佳, 钟丽萍, 梁镇海, 樊彩梅, 韩培德 2013 无机化学学报 29 2514]

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    Rangelov G, Stober J, Eisenhut B, Fauster T 1991 Phys. Rev. B 44 1954

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    Borgen O, Seip H M 1961 Acta Chem. Scand. 15 1709

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    Billy M, Labbe J C, Selvaraj A, Roult G 1983 Mater. Res. Bull. 18 921

    [28]

    Lin W, Zhang Y F, Li Y, Chen Y, Li J Q 2006 Acta Phys. Chim. Sin. 22 76 (in Chinese) [林伟, 章永凡, 李奕, 陈勇, 李俊篯 2006 物理化学学报 22 76]

    [29]

    Milman V, Warren M C 2001 J. Phys.: Condens. Matter 13 241

    [30]

    Carson R D, Schnatterly S E 1986 Phys. Rev. B 33 2432

    [31]

    Liu E K, Zhu B S, Luo J S 2011 The Physics of Semiconductors (Beijing: Publishing House of Electronics Industry) p132-139 (in Chinese) [刘恩科, 朱秉升, 罗晋生 2011 半导体物理学(北京:电子工业出版社) 第132–139页]

    [32]

    Li G, Zhang W D, Li P W, Sang S B, Hu J, Zhao Q H, Chen X Y 2014 IEEE Trans. Electron Dev. 61 2963

    [33]

    Shen X C 1992 The Optical Properties of Semiconductor (Beijing: Science Press) p24 (in Chinese) [沈学础 1992 半导体光学性质(北京:科学出版社) 第24页]

    [34]

    Wang Y R, Zou Q, Lu D W 1994 Physics 23 350 (in Chinese) [王永瑞, 邹骐, 卢党吾 1994 物理 23 350]

  • [1]

    Lu X F, Chen M, Fan L, Wang C, Wang H J 2013 Appl. Phys. Lett. 102 031907

    [2]

    Yu B H, Chen D 2014 Acta Phys. Sin. 63 047101 (in Chinese) [余本海, 陈东 2014 63 047101]

    [3]

    Gritsenko V A 2012 Physics-Uspekhi 55 498

    [4]

    Papaioannou G J, Exarchos M, Theonas V 2006 Appl. Phys. Lett. 89 103512

    [5]

    Li G, San H S, Chen X Y 2009 J. Appl. Phys. 105 124503

    [6]

    Li G, Chen X Y 2012 Appl. Phys. A 109 539

    [7]

    Lu X F, La P Q, Guo X, Wei Y P, Nan X L, He L 2013 J. Mod. Phys. B 27 1250212

    [8]

    Lu X F, La P Q, Guo X, Wei Y P, Nan X L, He L 2013 Comput. Mater. Sci. 79 174

    [9]

    Yang L, Li J B, Yang X Z, Dai J H 2004 Chin. J. Rare Metals 28 609 (in Chinese) [杨柳, 李建保, 杨晓战, 戴金辉 2004 稀有金属 28 609]

    [10]

    Tong X G, Yang X Z, Li J B 2005 Rare Metal Mat. Eng. 34 508 (in Chinese) [童旭光, 杨晓战, 李建保 2005 稀有金属材料与工程 34 508]

    [11]

    Xu M, Ding Y C, Xiong G, Zhu W J, He H L 2008 Phys. B: Condens. Matter 403 2515

    [12]

    van Spengen W M 2012 J. Micromech. Microeng. 22 074001

    [13]

    Hasegawa S, Segawa M, Kurata Y 1986 Appl. Phys. Lett. 49 1178

    [14]

    Hasegawa S, Segawa M, Kurata Y 1988 J. Appl. Phys. 64 1931

    [15]

    Guo H H, Yang T, Tao P, Zhang Z D 2014 Chin. Phys. B 23 017201

    [16]

    Zhang C L, Han P D, Wang X H, Zhang Z X, Wang L P, Xu H X 2014 Chin. Phys. B 22 126802

    [17]

    Pan H Z, Xu M, Zhu W J, Zhou H P 2006 Acta Phys. Sin. 55 3585 (in Chinese) [潘洪哲, 徐明, 祝文军, 周海平 2006 55 3585]

    [18]

    Perdew J P, Burke K, Ernzerhof M 1996 Phys. Rev. Lett. 77 3865

    [19]

    Car R, Parrinello M 1985 Phys. Rev. Lett. 55 2471

    [20]

    Vanderbilt D 1990 Phys. Rev. B 41 7892

    [21]

    Wrazien S J, Zhao Y J, Krayer J D 2003 Solid-State Electron. 47 885

    [22]

    Fischer T H, Almlöf J 1992 J. Phys. Chem. 96 9768

    [23]

    Segall M D, Indan P L D, Probert M J, Pickard C J, Hasnip P J, Clark S J, Payne M C 2002 J. Phys.: Condens. Matter 14 2717

    [24]

    Xie X J, Zhong L P, Liang Z H, Fan C M, Han P D 2013 Chin. J. Inorg. Chem. 29 2514 (in Chinese) [解学佳, 钟丽萍, 梁镇海, 樊彩梅, 韩培德 2013 无机化学学报 29 2514]

    [25]

    Rangelov G, Stober J, Eisenhut B, Fauster T 1991 Phys. Rev. B 44 1954

    [26]

    Borgen O, Seip H M 1961 Acta Chem. Scand. 15 1709

    [27]

    Billy M, Labbe J C, Selvaraj A, Roult G 1983 Mater. Res. Bull. 18 921

    [28]

    Lin W, Zhang Y F, Li Y, Chen Y, Li J Q 2006 Acta Phys. Chim. Sin. 22 76 (in Chinese) [林伟, 章永凡, 李奕, 陈勇, 李俊篯 2006 物理化学学报 22 76]

    [29]

    Milman V, Warren M C 2001 J. Phys.: Condens. Matter 13 241

    [30]

    Carson R D, Schnatterly S E 1986 Phys. Rev. B 33 2432

    [31]

    Liu E K, Zhu B S, Luo J S 2011 The Physics of Semiconductors (Beijing: Publishing House of Electronics Industry) p132-139 (in Chinese) [刘恩科, 朱秉升, 罗晋生 2011 半导体物理学(北京:电子工业出版社) 第132–139页]

    [32]

    Li G, Zhang W D, Li P W, Sang S B, Hu J, Zhao Q H, Chen X Y 2014 IEEE Trans. Electron Dev. 61 2963

    [33]

    Shen X C 1992 The Optical Properties of Semiconductor (Beijing: Science Press) p24 (in Chinese) [沈学础 1992 半导体光学性质(北京:科学出版社) 第24页]

    [34]

    Wang Y R, Zou Q, Lu D W 1994 Physics 23 350 (in Chinese) [王永瑞, 邹骐, 卢党吾 1994 物理 23 350]

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Publishing process
  • Received Date:  23 June 2014
  • Accepted Date:  25 September 2014
  • Published Online:  05 March 2015

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