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Characteristics of helicon plasma in a 45 cm long discharge tube were diagnosed by the Langmuir electrostatic probe, optical emission spectroscopy (OES), and integrated capacitively coupled detector (ICCD). The discharge in helical wave mode was confirmed by the sharply variation of electron density and electron temperature based on the Langmuir data. We have noticed that the variation of electron density measured by the Langmuir electrostatic-probe is consistent with the OES measurement. Intensities in the spectra of argon atoms and ions are strongly related to discharge modes. The photos taken by ICCD can distinguish the discharge modes in the radial region. Intensity changes in the radial region reflect the electron motivation and the energy transfer path in the helicon plasma.
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Keywords:
- helicon discharge /
- optical emission spectroscopy /
- integrated capacitively coupled detector /
- changes in radial region
[1] Aigrain P 1960 Proceeding of the International Conference Semiconductor Physics Prague, Czechoslovakia, 1960 p224
[2] Boswell R W 1970 Phys. Lett. A 33 457
[3] Fang T Z 1998 Physics 28 163 (in Chinese) [房同珍1998物理28 163]
[4] Porte L, Yun S M, Arnush D, Chen F F 2003 Plasma Source Sci. Technol. 12 287
[5] Chen F F 2003 Phys. Plasmas 10 2586
[6] Sudit I D, Chen F F 1996 Plasma Source Sci. Technol. 5 43
[7] Niemi K, Krämer M 2008 Phys. Plasmas 15 073503
[8] Fang T Z, Wang L, Jiang D M, Zhang H X 2001 Chin. Phys. Lett. 18 1098
[9] Fang T Z, Jiang N, Wang L 2005 Chin. Phys. 14 2256
[10] Franck C M, Grulke O, Klinger T 2003 Phys. Plasmas 10 323
[11] Boswell R W, Chen F F 1997 IEEE Trans. Plasma Sci. 25 1229
[12] Chen F F, Torreblanca H 2007 Plasma Phys. Control Fusion 49 A81
[13] Lafleur T, Charles C, Boswell R W 2011 J. Phys. D: Appl. Phys. 44 055202
[14] Lafleur T, Charles C, Boswell R W 2011 J. Phys. D: Appl. Phys. 44 185204
[15] Bo Y, Zhao Y, Jin C G, Yu T, Wu X M, Zhuge L J 2011 Micronano Electron. Technol. 48 739 (in Chinese) [柏洋, 赵岩, 金成刚, 余涛, 吴雪梅, 诸葛兰剑2011微纳电子技术 48 739]
[16] Xia G Q, Wang D X, Xue W H, Zhang J L 2011 J. Propuls. Technol. 32 857 (in Chinese) [夏广庆, 王冬雪, 薛伟华, 张家良2011推进技术 32 857]
[17] Cheng Y G, Cheng M S, Wang M G, Li X K 2014 Acta Phys. Sin. 63 035203 (in Chinese) [成玉国, 程谋森, 王墨戈, 李小康 2014 63 035203]
[18] Tysk S M, Denning C M, Scharer J E, White B O, Akhtar M K 2003 15th Topical Conference on RF Power Moran, USA, May 19-21, 2003 p427
[19] Lieberman M A, Lichtenberg A J (translated by Pu Y K) 2007 Principles of Plasma Discharges and Materials Processing (Beijing: Science Press) p142 (in Chinese) [力伯曼M A, 里登伯格A J著(蒲以康译) 2007 等离子体放电物理与材料 (北京: 科学出版社) 第142页]
[20] Loewenhardt P K, Blackwell B D, Boswell R W, Conway G D, Hamberger S M 1991 Phys. Rev. Lett. 67 2792
[21] Ellingboe A R, Boswell R W 1995 Phys. Plasmas 2 1807
[22] Chen F F, Boswell R W 1997 IEEE Trans. Plasma Sci. 25 1245
[23] Ellingboe A R, Boswell R W 1996 Phys. Plasmas 3 2797
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[1] Aigrain P 1960 Proceeding of the International Conference Semiconductor Physics Prague, Czechoslovakia, 1960 p224
[2] Boswell R W 1970 Phys. Lett. A 33 457
[3] Fang T Z 1998 Physics 28 163 (in Chinese) [房同珍1998物理28 163]
[4] Porte L, Yun S M, Arnush D, Chen F F 2003 Plasma Source Sci. Technol. 12 287
[5] Chen F F 2003 Phys. Plasmas 10 2586
[6] Sudit I D, Chen F F 1996 Plasma Source Sci. Technol. 5 43
[7] Niemi K, Krämer M 2008 Phys. Plasmas 15 073503
[8] Fang T Z, Wang L, Jiang D M, Zhang H X 2001 Chin. Phys. Lett. 18 1098
[9] Fang T Z, Jiang N, Wang L 2005 Chin. Phys. 14 2256
[10] Franck C M, Grulke O, Klinger T 2003 Phys. Plasmas 10 323
[11] Boswell R W, Chen F F 1997 IEEE Trans. Plasma Sci. 25 1229
[12] Chen F F, Torreblanca H 2007 Plasma Phys. Control Fusion 49 A81
[13] Lafleur T, Charles C, Boswell R W 2011 J. Phys. D: Appl. Phys. 44 055202
[14] Lafleur T, Charles C, Boswell R W 2011 J. Phys. D: Appl. Phys. 44 185204
[15] Bo Y, Zhao Y, Jin C G, Yu T, Wu X M, Zhuge L J 2011 Micronano Electron. Technol. 48 739 (in Chinese) [柏洋, 赵岩, 金成刚, 余涛, 吴雪梅, 诸葛兰剑2011微纳电子技术 48 739]
[16] Xia G Q, Wang D X, Xue W H, Zhang J L 2011 J. Propuls. Technol. 32 857 (in Chinese) [夏广庆, 王冬雪, 薛伟华, 张家良2011推进技术 32 857]
[17] Cheng Y G, Cheng M S, Wang M G, Li X K 2014 Acta Phys. Sin. 63 035203 (in Chinese) [成玉国, 程谋森, 王墨戈, 李小康 2014 63 035203]
[18] Tysk S M, Denning C M, Scharer J E, White B O, Akhtar M K 2003 15th Topical Conference on RF Power Moran, USA, May 19-21, 2003 p427
[19] Lieberman M A, Lichtenberg A J (translated by Pu Y K) 2007 Principles of Plasma Discharges and Materials Processing (Beijing: Science Press) p142 (in Chinese) [力伯曼M A, 里登伯格A J著(蒲以康译) 2007 等离子体放电物理与材料 (北京: 科学出版社) 第142页]
[20] Loewenhardt P K, Blackwell B D, Boswell R W, Conway G D, Hamberger S M 1991 Phys. Rev. Lett. 67 2792
[21] Ellingboe A R, Boswell R W 1995 Phys. Plasmas 2 1807
[22] Chen F F, Boswell R W 1997 IEEE Trans. Plasma Sci. 25 1245
[23] Ellingboe A R, Boswell R W 1996 Phys. Plasmas 3 2797
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