Fang Jia, Li Shuang-Liang, Xu Sheng-Zhi, Wei Chang-Chun, Zhao Ying, Zhang Xiao-Dan. Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopyJ. Acta Physica Sinica, 2013, 62(16): 168103. DOI: 10.7498/aps.62.168103