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Duan Ping, Cao An-Ning, Shen Hong-Juan, Zhou Xin-Wei, Qin Hai-Juan, Liu Jin-Yuan, Qing Shao-Wei. Effect of electron temperature on the characteristics of plasma sheath in Hall thruster. Acta Physica Sinica,
2013, 62(20): 205205.
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2013, 62(16): 168103.
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2012, 61(3): 036802.
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2012, 61(1): 018101.
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Meng Shi-Jian, Li Zheng-Hong, Qin Yi, Ye Fan, Xu Rong-Kun. X-ray continuum spectra for diagnosing plasma temperaturein aluminum wire array Z-pinches. Acta Physica Sinica,
2011, 60(4): 045211.
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Ding Yan-Li, Zhu Zhi-Li, Gu Jin-Hua, Shi Xin-Wei, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao. Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2010, 59(2): 1190-1195.
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Gu Jin-Hua, Ding Yan-Li, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao. A spectroscopic ellipsometry study of the abnormal scaling behavior of high-rate-deposited microcrystalline silicon films by VHF-PECVD technique. Acta Physica Sinica,
2009, 58(6): 4123-4127.
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2008, 57(6): 3892-3897.
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Guo Xue-Jun, Lu Jing-Xiao, Chen Yong-Sheng, Zhang Qing-Feng, Wen Shu-Tang, Zheng Wen, Shen Chen-Hai, Chen Qing-Dong. Research on the high-rate deposition of μc-Si:H by VHF-PECVD. Acta Physica Sinica,
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Zhou Bing-Qing, Liu Feng-Zhen, Zhu Mei-Fang, Zhou Yu-Qin, Wu Zhong-Hua, Chen Xing. Studies on surface roughness and growth mechanisms of microcrystalline silicon films by grazing incidence X-ray reflectivity. Acta Physica Sinica,
2007, 56(4): 2422-2427.
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Guo Qing-Lin, Zhou Yu-Long, Zhang Bo, Zhang Qiu-Lin, Zhang Jin-Ping, Huai Su-Fang. Influence of matrices on electron temperature of laser micro-plasma in argon atmosphere at reduced pressure. Acta Physica Sinica,
2007, 56(9): 5318-5322.
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Guo Qun-Chao, Geng Xin-Hua, Sun Jian Wei, Chang-Chun, Han Xiao-Yan, Zhang Xiao_Dan, Zhao Ying. Role of gas residence time in the deposition rate and properties of microcrystalline silicon films. Acta Physica Sinica,
2007, 56(5): 2790-2795.
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Chen Zhuo, He Wei, Pu Yi-Kang. Measurement of metastable state densities and electron temperatures in an electron cyclotron resonance argon plasma. Acta Physica Sinica,
2005, 54(5): 2153-2157.
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Zhang Xiao-Dan, Zhao Ying, Gao Yan-Tao, Zhu Feng, Wei Chang-Chun, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen. Fabrication of microcrystalline silicon thin film and the study of its microstructure and stability. Acta Physica Sinica,
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Zhou Bing-Qing, Liu Feng-Zhen, Zhu Mei-Fang, Gu Jin-Hua, Zhou Yu-Qin, Liu Jin-Long, Dong Bao-Zhong, Li Guo-Hua, Ding Kun. The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering. Acta Physica Sinica,
2005, 54(5): 2172-2175.
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Gu Jin-Hua, Zhou Yu-Qin, Zhu Mei-Fang, Li Guo-Hua, Ding Kun, Zhou Bing-Qing, Liu Feng-Zhen, Liu Jin-Long, Zhang Qun-Fang. Study on growth mechanism of low-temperature prepared microcrystalline Si thin f ilms. Acta Physica Sinica,
2005, 54(4): 1890-1894.
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Huang Song, Ning Zhao-Yuan, Xin Yu, Gan Zhao-Qiang. Characteristics of two-electron-temperature in inductively coupled CF4 plasmas. Acta Physica Sinica,
2004, 53(10): 3394-3397.
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Yang Jia-Min, Ding Yao-Nan, Chen Bo, Zheng Zhi-Jian, Yang Guo-Hong, Zhang Bao-Han, Wang Yao-Mei, Zhang Wen-Hai. Electron temperature measurement of low-energy laser produced plasma using iso-electronic x-ray spectroscopy. Acta Physica Sinica,
2003, 52(2): 411-414.
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