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Zhang Xiao-Bo, Qing Fang-Zhu, Li Xue-Song. Clean transfer of chemical vapor deposition graphene film. Acta Physica Sinica,
2019, 68(9): 096801.
doi: 10.7498/aps.68.20190279
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Fang Jia, Li Shuang-Liang, Xu Sheng-Zhi, Wei Chang-Chun, Zhao Ying, Zhang Xiao-Dan. Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy. Acta Physica Sinica,
2013, 62(16): 168103.
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Li Xin-Li, Gu Jin-Hua, Gao Hai-Bo, Chen Yong-Sheng, Gao Xiao-Yong, Yang Shi-E, Lu Jing-Xiao, Li Rui, Jiao Yue-Chao. Real time and ex situ spectroscopic ellipsometry analysis microcrystalline silicon thin films growth. Acta Physica Sinica,
2012, 61(3): 036802.
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Gao Hai-Bo, Li Rui, Lu Jing-Xiao, Wang Guo, Li Xin-Lin, Jiao Yue-Chao. High-rate deposition of microcrystalline silicon thin film by multi-step method. Acta Physica Sinica,
2012, 61(1): 018101.
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Ding Yan-Li, Zhu Zhi-Li, Gu Jin-Hua, Shi Xin-Wei, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao. Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2010, 59(2): 1190-1195.
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Shen Chen-Hai, Lu Jing-Xiao, Chen Yong-Sheng. High rate growth and electronic property of μc-Si:H. Acta Physica Sinica,
2009, 58(10): 7288-7293.
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Gu Jin-Hua, Ding Yan-Li, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao. A spectroscopic ellipsometry study of the abnormal scaling behavior of high-rate-deposited microcrystalline silicon films by VHF-PECVD technique. Acta Physica Sinica,
2009, 58(6): 4123-4127.
doi: 10.7498/aps.58.4123
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Han Xiao-Yan, Geng Xin-Hua, Hou Guo-Fu, Zhang Xiao-Dan, Li Gui-Jun, Yuan Yu-Jie, Wei Chang-Chun, Sun Jian, Zhang De-Kun, Zhao Ying. An optical emission spectroscopy study on the high rate growth of microcrystalline silicon films. Acta Physica Sinica,
2009, 58(2): 1344-1347.
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Han Xiao-Yan, Hou Guo-Fu, Wei Chang-Chun, Zhang Xiao-Dan, Dai Zhi-Hua, Li Gui-Jun, Sun Jian, Chen Xin-Liang, Zhang De-Kun, Xue Jun-Ming, Zhao Ying, Geng Xin-Hua. Optimization of high rate growth high quality μc-Si:H thin films and its application to the solar cells. Acta Physica Sinica,
2009, 58(6): 4254-4259.
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Han Xiao-Yan, Hou Guo-Fu, Li Gui-Jun, Zhang Xiao-Dan, Yuan Yu-Jie, Zhang De-Kun, Chen Xin-Liang, Wei Chang-Chun, Sun Jian, Geng Xin-Hua. Influence of low rate p/i interface layer on the performance of high growth rate microcrystalline silicon solar cells. Acta Physica Sinica,
2008, 57(8): 5284-5289.
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Ge Hong, Zhang Xiao-Dan, Yue Qiang, Zhao Jing, Zhao Ying. Study of space voltage distribution between large-area parallel-plate electrodes for very high frequency plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2008, 57(8): 5105-5110.
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Yuan Yu-Jie, Hou Guo-Fu, Xue Jun-Ming, Han Xiao-Yan, Liu Yun-Zhou, Yang Xing-Yun, Liu Li-Jie, Dong Pei, Zhao Ying, Geng Xin-Hua. The influence of n-layer on structural properties of i-layer in n-i-p μc-Si∶H thin film solar cells. Acta Physica Sinica,
2008, 57(6): 3892-3897.
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Chen Yong-Sheng, Gao Xiao-Yong, Yang Shi-E, Lu Jing-Xiao, Gu Jin-Hua. The influence of deposition temperature on the structure of microcrystalline silicon film. Acta Physica Sinica,
2007, 56(7): 4122-4126.
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Zhou Bing-Qing, Liu Feng-Zhen, Zhu Mei-Fang, Zhou Yu-Qin, Wu Zhong-Hua, Chen Xing. Studies on surface roughness and growth mechanisms of microcrystalline silicon films by grazing incidence X-ray reflectivity. Acta Physica Sinica,
2007, 56(4): 2422-2427.
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Guo Qun-Chao, Geng Xin-Hua, Sun Jian Wei, Chang-Chun, Han Xiao-Yan, Zhang Xiao_Dan, Zhao Ying. Role of gas residence time in the deposition rate and properties of microcrystalline silicon films. Acta Physica Sinica,
2007, 56(5): 2790-2795.
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Zhang Xiao-Dan, Zhao Ying, Gao Yan-Tao, Zhu Feng, Wei Chang-Chun, Sun Jian, Wang Yan, Geng Xin-Hua, Xiong Shao-Zhen. Study of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition. Acta Physica Sinica,
2005, 54(4): 1899-1903.
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Zhang Xiao-Dan, Zhao Ying, Gao Yan-Tao, Zhu Feng, Wei Chang-Chun, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen. Fabrication of microcrystalline silicon thin film and the study of its microstructure and stability. Acta Physica Sinica,
2005, 54(8): 3910-3914.
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Zhou Bing-Qing, Liu Feng-Zhen, Zhu Mei-Fang, Gu Jin-Hua, Zhou Yu-Qin, Liu Jin-Long, Dong Bao-Zhong, Li Guo-Hua, Ding Kun. The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering. Acta Physica Sinica,
2005, 54(5): 2172-2175.
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Gu Jin-Hua, Zhou Yu-Qin, Zhu Mei-Fang, Li Guo-Hua, Ding Kun, Zhou Bing-Qing, Liu Feng-Zhen, Liu Jin-Long, Zhang Qun-Fang. Study on growth mechanism of low-temperature prepared microcrystalline Si thin f ilms. Acta Physica Sinica,
2005, 54(4): 1890-1894.
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Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen. Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVD. Acta Physica Sinica,
2003, 52(11): 2865-2869.
doi: 10.7498/aps.52.2865
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