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Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on a substrate. The motorial characteristics of chromium atoms in an elliptical standing wave filed are discussed, and the simulation results are given with different deflective angles of elliptical standing wave. The full width at half maximum (FWHM) is 3.2 nm and the contrast is 36 ∶1 with a deflective angle of 0. The FWHM is 6.5nm and the contrast is 24 ∶1 with a deflective angel of 15, but when the deflective angle reaches 30, the stripe splits and two-peak configuration is formed.
[1] Drodofsky U, Stuhler J, Brezger B, Schulze Th, Drewsen M, Pfau T, Mlynek J 1997 Microelectronic Engineering 35 285
[2] Chen Y P, Chen X N, Li Z, Chen X Z 2003 Micronanoelectronic Technology 7 546 (in Chinese)[陈元培、陈旭南、李 展、陈献忠 2003 微纳电子技术 7 546]
[3] [4] [5] Mutzel M, Rasbach U, Meschede D, Burstedde C, Braun J, Kunoth A, Peithmann K, Buse K 2003 Appl. Phys. B 77 1
[6] Zhang W T, Li T B 2007 Chinese Journal of Quantum Electronics 24 85(in Chinese)[张文涛、李同保 2007 量子电子学报 24 85]
[7] [8] Zeng Z D, Shen H Y 1990 Optronics Lasers 1 168 (in Chinese)[曾振东、沈鸿元 1990 光电子激光 1 168]
[9] [10] [11] Zhen C L, Li T B, Ma Y, Ma S S, Zhang B W 2006 Atca Phys. Sin. 55 4528(in Chinese)[郑春兰、李同保、马 艳、马姗姗、张宝武 2006 55 4528]
[12] [13] Zhao M, Wang Z S, Ma B, Li F S 2008 Atca Opti. Sin. 28 381(in Chinese)[赵 敏、 王占山、马 彬、李佛生 2008 光学学报 28 381]
[14] [15] Myszkiewicz G, Hohlfeld J, Toonen A J 2004 Appl. Phys. Lett. 85 3842
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[1] Drodofsky U, Stuhler J, Brezger B, Schulze Th, Drewsen M, Pfau T, Mlynek J 1997 Microelectronic Engineering 35 285
[2] Chen Y P, Chen X N, Li Z, Chen X Z 2003 Micronanoelectronic Technology 7 546 (in Chinese)[陈元培、陈旭南、李 展、陈献忠 2003 微纳电子技术 7 546]
[3] [4] [5] Mutzel M, Rasbach U, Meschede D, Burstedde C, Braun J, Kunoth A, Peithmann K, Buse K 2003 Appl. Phys. B 77 1
[6] Zhang W T, Li T B 2007 Chinese Journal of Quantum Electronics 24 85(in Chinese)[张文涛、李同保 2007 量子电子学报 24 85]
[7] [8] Zeng Z D, Shen H Y 1990 Optronics Lasers 1 168 (in Chinese)[曾振东、沈鸿元 1990 光电子激光 1 168]
[9] [10] [11] Zhen C L, Li T B, Ma Y, Ma S S, Zhang B W 2006 Atca Phys. Sin. 55 4528(in Chinese)[郑春兰、李同保、马 艳、马姗姗、张宝武 2006 55 4528]
[12] [13] Zhao M, Wang Z S, Ma B, Li F S 2008 Atca Opti. Sin. 28 381(in Chinese)[赵 敏、 王占山、马 彬、李佛生 2008 光学学报 28 381]
[14] [15] Myszkiewicz G, Hohlfeld J, Toonen A J 2004 Appl. Phys. Lett. 85 3842
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