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A spectroscopic ellipsometry study of the abnormal scaling behavior of high-rate-deposited microcrystalline silicon films by VHF-PECVD technique

Gu Jin-Hua Ding Yan-Li Yang Shi-E Gao Xiao-Yong Chen Yong-Sheng Lu Jing-Xiao

Citation:

A spectroscopic ellipsometry study of the abnormal scaling behavior of high-rate-deposited microcrystalline silicon films by VHF-PECVD technique

Gu Jin-Hua, Ding Yan-Li, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao
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  • Abstract views:  8242
  • PDF Downloads:  1010
  • Cited By: 0
Publishing process
  • Received Date:  24 June 2008
  • Accepted Date:  03 November 2008
  • Published Online:  05 March 2009

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