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Gap length effect on discharge mode and etching profiles in asymmetric dual frequency capacitive CF4/Ar discharges

Dong Wan Xu Hai-Wen Dai Zhong-Ling Song Yuan-Hong Wang You-Nian

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Gap length effect on discharge mode and etching profiles in asymmetric dual frequency capacitive CF4/Ar discharges

Dong Wan, Xu Hai-Wen, Dai Zhong-Ling, Song Yuan-Hong, Wang You-Nian
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  • Abstract views:  6032
  • PDF Downloads:  193
  • Cited By: 0
Publishing process
  • Received Date:  22 March 2021
  • Accepted Date:  24 April 2021
  • Available Online:  28 April 2021
  • Published Online:  05 May 2021

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