Electronegativity of capacitively coupled Ar+O2 plasma excited at very high frequency

Yang Yu; Tang Cheng-Shuang; Zhao Yi-Fan; Yu Yi-Qing; Xin Yu

doi:10.7498/aps.66.185202

Abstract

By using pulsed laser induced detachment technique assisted with a Langmuir probe, the electronegative characteristics of the capacitively coupled Ar plasma doped with 5% O2 are studied in this paper. We first focus on the electrical signal of the probe after laser pulse has induced negative ion detachment, and then analyze characteristics of the probe signal with the probe bias below or above the plasma space potential. When the bias is set to be lower than the plasma potential, the probe signal usually shows a downward surge signal. As the bias is higher than the plasma potential, the main characteristics of the signal takes on an upward wide wave packet. The evolution behavior of the probe signal with bias from the downward surge valley to the upward wide wave packet might be due to the potential difference between the plasma space potential and the probe bias voltage. Furthermore, it shows that the position of the upward peak appears later than that of the downward surge valley, which may be related to the changing of the rate of the electron diffusion flux and the electric field drift flux. According to the dependence of probe collection signal on bias, the electronegativity describing the Ar+O2 plasma electronegative property is defined as saturation ratio of electron current after pulsed laser radiation to that of collection probe at a potential above plasma spatial potential. Plasma electronegativity is diagnosed with discharge pressure, radio-frequency (RF) input power and axial position. The experimental results show that the electronegativity of plasma decreases with input RF power increasing. As the gas pressure is kept at 12.0 Pa, the plasma electronegativity decreases from 5.05 to 0.98 with RF input power increasing from 50 to 300 W. It also shows an increasing trend of electronegativity with plasma discharge pressure increasing. Due to asymmetrical distribution of electrodes, the plasma electronegativity also takes on asymmetric one with respect to the axial position. In our experiments, the electronegativity near the power electrode shows about 1-4 times higher than that near the ground electrode, the lowest point of the plasma electronegativity seems to be located in the center of the plasma discharge. This may be related to the dynamics of the secondary electrons emitted from electrode and the competition processes between negative ion production in collisional dissociation of oxygen molecules and the losses of high energy electron and negative ion in collisional detachment of negative ion with oxygen molecule.

Keywords:

Authors and contacts

1.
College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, China

Corresponding author: Xin Yu, yuxin@suda.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 11675117).

References

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[4]	Samukawa S 1996 Appl. Phys. Lett. 68 316
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[22]	Meichsner J, Dittmann K, Kllig C 2012 Contribut. to Plasma Phys. 52 561
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[29]	Stoffels E, Stoffels W W, Vender D, Kando M, Kroesen G M, de Hoog F J 1995 Phys. Rev. E 51 2425
[30]	Wang T, Wang J, Tang C S, Yang Y, Xin Y 2017 Nuclear Fusion and Plasma Phys. 37 37(in Chinese)[王涛, 王俊, 唐成双, 杨郁, 辛煜2017核聚变与等离子体物理 37 37]
[31]	Oudini N, Sirse N, Benallal R, Taccogna F, Aanesland A, Bendib A, Ellingboe A R 2015 Phys. Plasmas 22 073509
[32]	Pandey A K, Karkari S K 2017 Phys. Plasmas 24 013507
[33]	Teichmann T, Kllig C, Dittmann K, Matyash K, Schneider R, Meichsner J 2013 Phys. Plasmas 20 113509
[34]	Devynck P, Auvray J, Bacal M, Berlemont P, Bruneteau J, Leroy R, Stern R A 1989 Rev. Sci. Instrum. 60 2873
[35]	Bryant P M, Bradley J W 2012 Plasma Sources Sci. Technol. 22 015014
[36]	Wang J, Wang T, Tang C S, Xin Y 2016 Acta Phys. Sin. 65 055203(in Chinese)[王俊, 王涛, 唐成双, 辛煜2016 65 055203]
[37]	Wang J 2016 M. S. Thesis (Suzhou:Soochow University) (in Chinese)[王俊2016硕士学位论文(苏州:苏州大学)
[38]	Gudmundsson J T, Thorsteinsson E G 2007 Plasma Sources Sci. Technol. 16 399
[39]	Jaffke T, Meinke M, Hashemi R, Christophorou L G, Illenberger E 1992 Chem. Phys. Lett. 193 62
[40]	Brockhaus A, Leu G F, Selenin V, Tarnev K, Engemann J 2006 Plasma Sources Sci. Technol. 15 171
[41]	Burrow P D 1973 J. Chem. Phys. 59 4922

Cited By

[1]	Lieberman M A, Lichtenberg A J (translated by Pu Y K et al.) 2007 Plasma Discharge Principle and Material Processing (Beijing:Science Press) (in Chinese)[力伯曼M A, 里登伯格A J著(蒲以康等译) 2007等离子体放电原理与材料处理(北京:科学出版社)]
[2]	Inoue T, Taniguchi M, Morishita T, Dairaku M, Hanada M, Imai T, Kashiwagi M, Sakamoto K, Seki T, Watanabe K 2005 Nuclear Fusion 45 790
[3]	Shibayama T, Shindo H, Horiike Y 1996 Plasma Sources Sci. Technol. 5 254
[4]	Samukawa S 1996 Appl. Phys. Lett. 68 316
[5]	Takizawa K, Kono A, Sasaki K 2007 Appl. Phys. Lett. 90 011503
[6]	Franklin R N, Snell J 2000 J. Phys. D:Appl. Phys. 33 1990
[7]	Lichtenberg A J, Vahedi V, Lieberman M A, Rognlien T 1994 J. Appl. Phys. 75 2339
[8]	Sheridan T E, Chabert P, Boswell R W 1999 Plasma Sources Sci. Technol. 8 457
[9]	Chabert P, Sheridan T E, Boswell R W, Perrin J 1999 Plasma Sources Sci. Technol. 8 561
[10]	Liu H P, Zou X, Zou B Y, Qiu M H 2012 Acta Phys. Sin. 61 035201(in Chinese)[刘惠平, 邹秀, 邹滨雁, 邱明辉2012 61 035201]
[11]	Tuszewski M, Gary S P 2003 Phys. Plasmas 10 539
[12]	Plihon N, Chabert P 2011 Phys. Plasmas 18 082102
[13]	Dittmann K, Kllig C, Meichsner J 2012 Plasma Phys. Controlled Fusion 54 124038
[14]	Godyak V A, Piejak R B, Alexandrovich B M 1992 Phys. Rev. Lett. 68 40
[15]	Braithwaite N S J, Allen J E 1988 J. Phys. D:Appl. Phys. 21 1733
[16]	Shindo M, Uchino S, Ichiki R, Yoshimura S, Kawai Y 2001 Rev. Sci. Instrum. 72 2288
[17]	Bacal M, Hamilton G W, Bruneteau A M, Doucet H J, Taillet J 1979 Rev. Sci. Instrum. 50 719
[18]	Bacal M, Berlemont P, Bruneteau A M, Leroy R, Stern R A 1991 J. Appl. Phys. 70 1212
[19]	Bacal M 2000 Rev. Sci. Instrum. 71 3981
[20]	Sirse N, Karkari S K, Mujawar M A, Conway J, Turner M M 2011 Plasma Sources Sci. Technol. 20 055003
[21]	Conway J, Sirse N, Karkari S K, Turner M M 2010 Plasma Sources Sci. Technol. 19 065002
[22]	Meichsner J, Dittmann K, Kllig C 2012 Contribut. to Plasma Phys. 52 561
[23]	Surendra M, Graves D B 1991 Appl. Phys. Lett. 59 2091
[24]	Zou S, Tang Z H, Ji L L, Su X D, Xin Y 2012 Acta Phys. Sin. 61 075204(in Chinese)[邹帅, 唐中华, 吉亮亮, 苏晓东, 辛煜2012 61 075204]
[25]	Hong B S, Yuan T, Zou S, Tang Z H, Xu D S, Yu Y Q, Wang X S, Xin Y 2013 Acta Phys. Sin. 62 115202(in Chinese)[洪布双, 苑涛, 邹帅, 唐中华, 徐东升, 虞一青, 王栩生, 辛煜2013 62 115202]
[26]	Dodd R, You S D, Bryant P M, Bradley J W 2010 Plasma Sources Sci. Technol. 19 015021
[27]	Katsch H M, Sturm T, Quandt E, Döbele H F 2000 Plasma Sources Sci. Technol. 9 323
[28]	Vender D, Stoffels W W, Stoffels E, Kroesen G M, de Hoog F J 1995 Phys. Rev. E 51 2436
[29]	Stoffels E, Stoffels W W, Vender D, Kando M, Kroesen G M, de Hoog F J 1995 Phys. Rev. E 51 2425
[30]	Wang T, Wang J, Tang C S, Yang Y, Xin Y 2017 Nuclear Fusion and Plasma Phys. 37 37(in Chinese)[王涛, 王俊, 唐成双, 杨郁, 辛煜2017核聚变与等离子体物理 37 37]
[31]	Oudini N, Sirse N, Benallal R, Taccogna F, Aanesland A, Bendib A, Ellingboe A R 2015 Phys. Plasmas 22 073509
[32]	Pandey A K, Karkari S K 2017 Phys. Plasmas 24 013507
[33]	Teichmann T, Kllig C, Dittmann K, Matyash K, Schneider R, Meichsner J 2013 Phys. Plasmas 20 113509
[34]	Devynck P, Auvray J, Bacal M, Berlemont P, Bruneteau J, Leroy R, Stern R A 1989 Rev. Sci. Instrum. 60 2873
[35]	Bryant P M, Bradley J W 2012 Plasma Sources Sci. Technol. 22 015014
[36]	Wang J, Wang T, Tang C S, Xin Y 2016 Acta Phys. Sin. 65 055203(in Chinese)[王俊, 王涛, 唐成双, 辛煜2016 65 055203]
[37]	Wang J 2016 M. S. Thesis (Suzhou:Soochow University) (in Chinese)[王俊2016硕士学位论文(苏州:苏州大学)
[38]	Gudmundsson J T, Thorsteinsson E G 2007 Plasma Sources Sci. Technol. 16 399
[39]	Jaffke T, Meinke M, Hashemi R, Christophorou L G, Illenberger E 1992 Chem. Phys. Lett. 193 62
[40]	Brockhaus A, Leu G F, Selenin V, Tarnev K, Engemann J 2006 Plasma Sources Sci. Technol. 15 171
[41]	Burrow P D 1973 J. Chem. Phys. 59 4922

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Vol. 66, Issue 18 - 2017-09-20

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