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To realize metrology of the nanometer thin film thickness with high accuracy, a series of the nanometer film thickness standard samples with single layer is developed which could be measured by contact instruments such as stylus contact surface step profiler and scanning probe microscopy. The measurement and calculation method of grazing incidence X-ray reflectometry (GIXRR) for film thickness are studied. The formula of linear fitting method based on the periodic Kiessig fringes for thickness measurement is presented. A tracing approach of film thickness measurement, which is traceable to the atomic lattice of monocrystalline silicon and national angle standard, is proposed, and a new optics calibration method is presented which can measure angular misalignment of GIXRR apparatus. The relative expanded uncertainty of the nanofilm thickness H measurement is U=0.3 nm+1.5%H with coverage factor k=2.
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Keywords:
- nano metrology /
- nanofilm thickness /
- grazing incidence X-ray reflectometry /
- thickness metrology
[1] Jiang Z D, Wang C Y, Yang S M 2013 Engineer. Science. 15 15 (in Chinese) [蒋庄德, 王琛英, 杨树明 2013 中国工程科学 15 15]
[2] Kamineni V K, Diebold A C 2011 AIP Confer. Proceed. 1395 33
[3] Mai Z H 2007 X-Ray Characterization of Thin Film Structure (Beijing: Science Press) p62 (in Chinese) [麦振洪 2007 薄膜结构X射线表征 (北京: 科学出版社) 第62 页]
[4] Seah M, Chiffre L 2006 Handbook of Materials Measurement Methods (Berlin Heidelberg: Springer-Verlag) p229
[5] Wu B, Hu M, Hou S B, L Z J, Gao W, Liang J R 2012 Acta Phys. Sin. 61 188101 (in Chinese) [武斌, 胡明, 后顺保, 吕志军, 高旺, 梁继然 2012 61 188101]
[6] Huang Y, Ye H A, Li Q S, Dou Y F 2013 Chin. Phys. B 22 027301
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[8] Gao S T, Du H, Lu M Z, Cui J J, Shi Y 2009 J. Nanosci. Nanotech. 9 692
[9] Su H C, Lee C H, Lin M Z, Huang T W 2012 Chin. J. Phys. 50 291
[10] Diebold A C 2013 J. Vacuum Sci. Technol. A: Vacuum, Surfaces, and Films 31 050804
[11] Fuertes M C, Barrera M P, Plá J 2012 Thin Solid Films 520 4853
[12] Nolot E, André A 2011 Thin Solid Films 519 2782
[13] Stoev K N, Sakurai K 1999 Spectrochimica Acta B: Atomic Spectroscopy 54 41
[14] Colombi P, Agnihotri D K, Asadchikov V E, Bontempi E, Bowen D K, Chang C, Depero L E, Farnworth M, Fujimoto T, Gibaud A 2008 J. Appl. Crystallogr. 41 143
[15] Kim K J 2011 J. Surface Anal. 17 177
[16] Vaudin M D, Kessler E G, Owen D M 2011 Metrologia 48 201
[17] Misumi I, Lu M, Tanaka H, Sugawara K, Gonda S, Kurosawa T 2008 Meas. Sci. Technol. 19 45101
[18] Paz V F, Emons M, Obata K, Ovsianikov A, Peterhänsel S, Frenner K, Osten W 2012 J. Laser Appl. 24 042004
[19] Matyi R J, Depero L E, Bontempi E, Colombi P, Gibaud A, Jergel M, Krumrey M, Lafford T A, Lamperti A, Meduna M, Vander L A, Wiemer C 2008 Thin Solid Films 516 7962
[20] Fewster P F 2013 X-ray Scattering from Semiconductors and Other Materials (Singapore: World Scientific Publishing Company) p170
[21] Chen C C, Liu L Y, Wang R Z, Song X M, Wang B, Yan H 2013 Acta Phys. Sin. 62 177701 (in Chinese) [陈程程, 刘立英, 王如志, 宋雪梅, 王波, 严辉 2013 62 177701]
[22] Zhang J T, Li Y, Luo Z Y 2010 Acta Phys. Sin. 59 186 (in Chinese) [张继涛, 李岩, 罗志勇 2010 59 186]
[23] Zhang J T 2010 Ph. D. Dissertation (Beijing: Tsinghua University) (in Chinese) [张继涛 2010 博士学位论文 (北京: 清华大学)]
[24] Zhang J T, Li Y, Luo Z Y, Wu X J 2010 Chin. Phys. Lett. 27 050601
[25] Zhang J T, Li Y, Luo Z Y, Wu X J 2012 Chin. Phys. B 21 010701
[26] Zhang J, Li Y, Wu X, Luo Z, Wei, H 2010 Opt. Express 18 7331
[27] Chen K, Cui M Q, Zheng L, Zhao Y D 2008 High Power Laser and Particle Beams 20 234 (in Chinese) [陈凯, 崔明启, 郑雷, 赵屹东 2008 强激光与粒子束 20 234]
[28] Durand O, Morizet N 2006 Appl. Surface Sci. 253 133
[29] Serafińczuk J, Pietrucha J, Schroeder G, Gotszalk T P 2011 Opt. Appl. 41 315
[30] Cao J, Yanagihara M, Yamamoto M, Goto Y, Namioka T 1994 Appl. Opt. 33 2013
[31] Bowen D K, Tanner B K 1993 Nanotechnology 4 175
[32] Zhu H L, Jin C S, Zhang L C 2008 Anal. Instrument 1 14 (in Chinese) [朱洪力, 金春水, 张立超 2008 分析仪器 1 14]
[33] Massa E, Mana G, Kuetgens U, Ferroglio L 2011 Metrologia 48 S37
[34] Vaudin M D, Kessler E G, Owen D 2011 Metrologia 48 201
[35] Windover D, Gil D L, Henins A, Cline J P 2009 AIP Confer. Proceed. 1173 50
[36] Schmidbauer M, Kwasniewski A, Schwarzkopf J 2012 Acta Crystallographica B: Struct. Sci. 68 8
[37] Krumrey M, Gleber G, Scholze F, Wernecke J 2011 Meas. Sci. Technol. 22 094032
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[1] Jiang Z D, Wang C Y, Yang S M 2013 Engineer. Science. 15 15 (in Chinese) [蒋庄德, 王琛英, 杨树明 2013 中国工程科学 15 15]
[2] Kamineni V K, Diebold A C 2011 AIP Confer. Proceed. 1395 33
[3] Mai Z H 2007 X-Ray Characterization of Thin Film Structure (Beijing: Science Press) p62 (in Chinese) [麦振洪 2007 薄膜结构X射线表征 (北京: 科学出版社) 第62 页]
[4] Seah M, Chiffre L 2006 Handbook of Materials Measurement Methods (Berlin Heidelberg: Springer-Verlag) p229
[5] Wu B, Hu M, Hou S B, L Z J, Gao W, Liang J R 2012 Acta Phys. Sin. 61 188101 (in Chinese) [武斌, 胡明, 后顺保, 吕志军, 高旺, 梁继然 2012 61 188101]
[6] Huang Y, Ye H A, Li Q S, Dou Y F 2013 Chin. Phys. B 22 027301
[7] Imamura M, Matsubayashi N, Fan J, Kojima I, Sasaki M 2011 Meas. Sci. Technol. 22 024007
[8] Gao S T, Du H, Lu M Z, Cui J J, Shi Y 2009 J. Nanosci. Nanotech. 9 692
[9] Su H C, Lee C H, Lin M Z, Huang T W 2012 Chin. J. Phys. 50 291
[10] Diebold A C 2013 J. Vacuum Sci. Technol. A: Vacuum, Surfaces, and Films 31 050804
[11] Fuertes M C, Barrera M P, Plá J 2012 Thin Solid Films 520 4853
[12] Nolot E, André A 2011 Thin Solid Films 519 2782
[13] Stoev K N, Sakurai K 1999 Spectrochimica Acta B: Atomic Spectroscopy 54 41
[14] Colombi P, Agnihotri D K, Asadchikov V E, Bontempi E, Bowen D K, Chang C, Depero L E, Farnworth M, Fujimoto T, Gibaud A 2008 J. Appl. Crystallogr. 41 143
[15] Kim K J 2011 J. Surface Anal. 17 177
[16] Vaudin M D, Kessler E G, Owen D M 2011 Metrologia 48 201
[17] Misumi I, Lu M, Tanaka H, Sugawara K, Gonda S, Kurosawa T 2008 Meas. Sci. Technol. 19 45101
[18] Paz V F, Emons M, Obata K, Ovsianikov A, Peterhänsel S, Frenner K, Osten W 2012 J. Laser Appl. 24 042004
[19] Matyi R J, Depero L E, Bontempi E, Colombi P, Gibaud A, Jergel M, Krumrey M, Lafford T A, Lamperti A, Meduna M, Vander L A, Wiemer C 2008 Thin Solid Films 516 7962
[20] Fewster P F 2013 X-ray Scattering from Semiconductors and Other Materials (Singapore: World Scientific Publishing Company) p170
[21] Chen C C, Liu L Y, Wang R Z, Song X M, Wang B, Yan H 2013 Acta Phys. Sin. 62 177701 (in Chinese) [陈程程, 刘立英, 王如志, 宋雪梅, 王波, 严辉 2013 62 177701]
[22] Zhang J T, Li Y, Luo Z Y 2010 Acta Phys. Sin. 59 186 (in Chinese) [张继涛, 李岩, 罗志勇 2010 59 186]
[23] Zhang J T 2010 Ph. D. Dissertation (Beijing: Tsinghua University) (in Chinese) [张继涛 2010 博士学位论文 (北京: 清华大学)]
[24] Zhang J T, Li Y, Luo Z Y, Wu X J 2010 Chin. Phys. Lett. 27 050601
[25] Zhang J T, Li Y, Luo Z Y, Wu X J 2012 Chin. Phys. B 21 010701
[26] Zhang J, Li Y, Wu X, Luo Z, Wei, H 2010 Opt. Express 18 7331
[27] Chen K, Cui M Q, Zheng L, Zhao Y D 2008 High Power Laser and Particle Beams 20 234 (in Chinese) [陈凯, 崔明启, 郑雷, 赵屹东 2008 强激光与粒子束 20 234]
[28] Durand O, Morizet N 2006 Appl. Surface Sci. 253 133
[29] Serafińczuk J, Pietrucha J, Schroeder G, Gotszalk T P 2011 Opt. Appl. 41 315
[30] Cao J, Yanagihara M, Yamamoto M, Goto Y, Namioka T 1994 Appl. Opt. 33 2013
[31] Bowen D K, Tanner B K 1993 Nanotechnology 4 175
[32] Zhu H L, Jin C S, Zhang L C 2008 Anal. Instrument 1 14 (in Chinese) [朱洪力, 金春水, 张立超 2008 分析仪器 1 14]
[33] Massa E, Mana G, Kuetgens U, Ferroglio L 2011 Metrologia 48 S37
[34] Vaudin M D, Kessler E G, Owen D 2011 Metrologia 48 201
[35] Windover D, Gil D L, Henins A, Cline J P 2009 AIP Confer. Proceed. 1173 50
[36] Schmidbauer M, Kwasniewski A, Schwarzkopf J 2012 Acta Crystallographica B: Struct. Sci. 68 8
[37] Krumrey M, Gleber G, Scholze F, Wernecke J 2011 Meas. Sci. Technol. 22 094032
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