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In order to better comprehend the dynamic behaviours of ion and electron during the Penning source discharge process under a low pressure and weak ionization condition, numerical simulation is carried out to study the penning source discharge and diffuse process. For constituting 2D axial symmetrical model and combining the particle simulation and Monte Carlo (PIC/MCC) method, elastic collision, excitation, and ionization reactions between electrons and hydrogen molecules, hydrogen atom and ions are taken into account. The effect of magnetic field configuration, secondary electron emission coefficient, derivational voltage, and gas pressure on the discharge characteristics is investigated. It has been found that the simulant discharge parameters, including electron and ion densities, anodic current and ionic current, H+ and H2+ densities, etc, are in good agreement with the experimental results. Based on our numerical simulation, the study of the hydrogen penning discharge is being changed from qualitative analysis to quantitative calculation, which is important for the design and optimization of the penning ion source.
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Keywords:
- penning discharge /
- hydrogen /
- particle simulation /
- Monte Carlo
[1] Zhang H S 1997 Ion Source and Neutral Beam Source (Beijing: Atomic Energy Press) p125
[2] Wan R Y 2007 MS Thesis (China Academy of Engineering Physics) (in Chinese) [万瑞芸 2007 硕士学位论文 (绵阳: 中国工程物理研究院)]
[3] Wan R Y, Tan X H, Xiao K X, Jin D Z 2009 Mechanical & Electrical Engineering Technology 38 17 (in Chinese) [万瑞芸, 谈效华, 肖坤祥, 金大志 2009 机电工程技术 38 17]
[4] Xiao K X, Zhou M G, Tan X H 2003 Vacuum Electronics 2003(6) 26 (in Chinese) [肖坤祥, 周明贵, 谈效华 2003 真空电子技术 2003(6) 26]
[5] Xiao K X, Zhou M G, Tan X H, Mei L, Liang C 2005 Nuclear Techniques 28 550 (in Chinese) [肖坤祥, 周明贵, 谈效华, 梅林, 梁川 2005 核技术 28 550]
[6] Xiao K X, Sun S, Tan X H, Jing D Z 2009 Well Logging Technolog 33 493 (in Chinese) [肖坤祥, 孙山, 谈效华, 金大志 2009 测井技术 33 493]
[7] Jin D Z, Yang Z H, Xiao K X, Dai J Y 2009 Plasma Science and Technology 11 48
[8] Phelps A V 1990 J.Phys. Chem. Ref. Data 19 653
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[1] Zhang H S 1997 Ion Source and Neutral Beam Source (Beijing: Atomic Energy Press) p125
[2] Wan R Y 2007 MS Thesis (China Academy of Engineering Physics) (in Chinese) [万瑞芸 2007 硕士学位论文 (绵阳: 中国工程物理研究院)]
[3] Wan R Y, Tan X H, Xiao K X, Jin D Z 2009 Mechanical & Electrical Engineering Technology 38 17 (in Chinese) [万瑞芸, 谈效华, 肖坤祥, 金大志 2009 机电工程技术 38 17]
[4] Xiao K X, Zhou M G, Tan X H 2003 Vacuum Electronics 2003(6) 26 (in Chinese) [肖坤祥, 周明贵, 谈效华 2003 真空电子技术 2003(6) 26]
[5] Xiao K X, Zhou M G, Tan X H, Mei L, Liang C 2005 Nuclear Techniques 28 550 (in Chinese) [肖坤祥, 周明贵, 谈效华, 梅林, 梁川 2005 核技术 28 550]
[6] Xiao K X, Sun S, Tan X H, Jing D Z 2009 Well Logging Technolog 33 493 (in Chinese) [肖坤祥, 孙山, 谈效华, 金大志 2009 测井技术 33 493]
[7] Jin D Z, Yang Z H, Xiao K X, Dai J Y 2009 Plasma Science and Technology 11 48
[8] Phelps A V 1990 J.Phys. Chem. Ref. Data 19 653
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