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The electron energy distribution function (EEDF) of weakly ionized air plasma (79% nitrogen and 21% oxygen) is investigated by solving the Boltzmann equation with the spherical harmonics expansion. It is found that the EEDF deceases sharply in an energy range from 2 to 3 eV for low reduced field (E/N 100 Td), and the high energy tail of the EEDF decreases more sharply than Maxwell distribution. When the reduced field increases to a range 400 to 2000 Td, the EEDF approaches to Maxwell distribution. When the reduced field is greater than 2000 Td, the high energy tail (200 eV) of the EEDF deceases more slowly than Maxwell distribution. It is shown that the EEDF approaches to Maxwell distribution in a high frequency field. The effective electron temperature is dependent only on E/ for vm, but on E/N for vm. The electron-electron collisions play no significant role until the ionization degree is bigger than 0.1%. This is different from the case of monatomic plasmas, in which the EEDF is influenced by electron-electron collisions for ionization degree greater than 10-6.
[1] Liberman M A, Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (Hoboken: Wiley & Sons)
[2] Becker K H, Kogelschatz U, Schoenbach K H, Barker R J 2005 Non-Equilibrium Air Plasma at Atmosphere Pressure (London: IOP publishing)
[3] Starikovskaia S M 2006 J. Phys. D: Appl. Phys. 39 R265
[4] Siefert N S 2007 Phys. Fluids 19 036102
[5] Kuo S P 2006 Phys. Plasmas 13 033505
[6] Chang C, Liu G Z, Zhu X X, Chen H B, Yang J Y 2009 Phys. Plasmas 16 033505
[7] Krile J T, Neuber A A, Krompholz H G, Gibson Thomas L 2006 Appl. Phys. Lett. 89 201501
[8] Dijk J V, Peerenboom K, Jimenez M, Mihailova D, Mullen J V D 2009 J. Phys. D: Appl. Phys. 42 194012
[9] Kusher M J 2009 2009 J. Phys. D: Appl. Phys. 42 194013
[10] Kim H C, Iza F, Yang S S, Radmilovic-Radjenovic M, Lee J K 2005 J. Phys. D: Appl. Phys. 38 R283
[11] Zhou Q H, Dong Z W, Chen J Y 2011 Acta Phys. Sin. 60 125202 (in Chinese) [周前红, 董志伟, 陈京元 2011 60 125202]
[12] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 99 231502
[13] Nam S K, Lim C, Verboncoeur J P 2009 Phys. Plasmas 16 023501
[14] Capitelli M, Ferreira C M, Gordiets B F, Osipov A I 2001 Plasma Kinetics in Atmospheric Gases (Berlin: Springer)
[15] Hagelaar G J M, Pitchford L C 2005 Plasma Souces Sci. Technol. 14 722
[16] Trunec D, Bonaventura Z, Necas D 2006 J. Phys. D: Appl. Phys. 39 2544
[17] Phelps A V, Pitchford L C 1985 Phys. Rev. A 31 2932
[18] Pitchford L C, Oneil S V, Rumble Jr J R 1981 Phys. Rev. A 23 294
[19] ItikawaY, Hayashi M, Ichimura A, Onda K, Sakimoto K, Takayanagi K 1986 J. Phys. Chem. Ref. Data 15 985
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[1] Liberman M A, Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (Hoboken: Wiley & Sons)
[2] Becker K H, Kogelschatz U, Schoenbach K H, Barker R J 2005 Non-Equilibrium Air Plasma at Atmosphere Pressure (London: IOP publishing)
[3] Starikovskaia S M 2006 J. Phys. D: Appl. Phys. 39 R265
[4] Siefert N S 2007 Phys. Fluids 19 036102
[5] Kuo S P 2006 Phys. Plasmas 13 033505
[6] Chang C, Liu G Z, Zhu X X, Chen H B, Yang J Y 2009 Phys. Plasmas 16 033505
[7] Krile J T, Neuber A A, Krompholz H G, Gibson Thomas L 2006 Appl. Phys. Lett. 89 201501
[8] Dijk J V, Peerenboom K, Jimenez M, Mihailova D, Mullen J V D 2009 J. Phys. D: Appl. Phys. 42 194012
[9] Kusher M J 2009 2009 J. Phys. D: Appl. Phys. 42 194013
[10] Kim H C, Iza F, Yang S S, Radmilovic-Radjenovic M, Lee J K 2005 J. Phys. D: Appl. Phys. 38 R283
[11] Zhou Q H, Dong Z W, Chen J Y 2011 Acta Phys. Sin. 60 125202 (in Chinese) [周前红, 董志伟, 陈京元 2011 60 125202]
[12] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 99 231502
[13] Nam S K, Lim C, Verboncoeur J P 2009 Phys. Plasmas 16 023501
[14] Capitelli M, Ferreira C M, Gordiets B F, Osipov A I 2001 Plasma Kinetics in Atmospheric Gases (Berlin: Springer)
[15] Hagelaar G J M, Pitchford L C 2005 Plasma Souces Sci. Technol. 14 722
[16] Trunec D, Bonaventura Z, Necas D 2006 J. Phys. D: Appl. Phys. 39 2544
[17] Phelps A V, Pitchford L C 1985 Phys. Rev. A 31 2932
[18] Pitchford L C, Oneil S V, Rumble Jr J R 1981 Phys. Rev. A 23 294
[19] ItikawaY, Hayashi M, Ichimura A, Onda K, Sakimoto K, Takayanagi K 1986 J. Phys. Chem. Ref. Data 15 985
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