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Single-layer silica films are prepared via evaporation-induced-self-assembling process using triblock copolymer surfactant F127 as template and tetraethoxysiliane as precursor under acidic condition. After ammonia pretreatment, the as-deposited films undergo a thermal decomposition process to remove the surfactant, and the mesopores are formed in film. Three techniques are used to characterize the mesoscopic structure of film, i.e., grazing-incidence X-ray diffraction, nitrogen adsorption/desorption and transmission electron microscopy. The results indicate that the film has an ordered cage-like porous structure and can be indexed as the body-centered-cubic arrangement. The optical properties of the films are investigated via ellipsometry and UV-VIS-NIR transmission spectrometer. The transmitance can reach up to 99.9% at 1053 nm wavelength. The refractive index varies with the molar ratio of F127/Si. Atomic force microscope is used to probe the surface morphology, and the surface roughness Ra is 1.2 nm. A 1053 nm laser is used to determine the laser damage threshold of film and all the thresholds are higher than 25 J· cm-2 (1 ns). This method has a potential application in the preparation of large-aperture antireflective films.
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Keywords:
- ordered mesoporous /
- silica /
- antireflective films /
- laser-induced damage threshold
[1] Thomas I M 1994 SPIE 2114 232
[2] Britten J A, Herman S M, Summers L J, Rushford M C 1998 SPIE 3578 337
[3] Grosso D, Seromon P A 2000 Thin Solid Films 368 116
[4] Ferrara M C, Perrone M R, Protopapa M L, Sancho-Parramon J, Bosch S, Mazzarelli S 2004 SPIE 5250 537
[5] Xu Y, Zhang L, Wu D, Sun Y H, Huang Z X, Jiang X D, Wei X F, Li Z H, Dong B Z, Wu Z H 2005 J. Opt. Soc. Am. B 22 905
[6] Stöber W, Fink A, Bohn E 1968 J. Colloid Interface Sci. 26 62
[7] Thomas I M 1986 Appl. Opt. 25 1481
[8] Floch H G, Belleville P F 1997 SPIE 3136 275
[9] Xu Y, Zhang B, Fan W H, Wu D, Sun Y H 2003 Thin Solid Films 440 180
[10] Ogawa M 1994 J. Am. Chem. Soc. 116 7941
[11] Yu S Z, Wong T K S, Hu X 2004 J. Sol-Gel Sci. Technol. 29 59
[12] Maruo T, Tanaka S, Hillhouse H W, Nishiyama N, Egashira Y, Ueyama K 2008 Thin Solid Films 516 4771
[13] Maruo T, Tanaka S, Nishiyama N, Motoda K I, Funayama K, Egashira Y, Ueyama K 2008 Colloids Surfaces A: Phys. 318 84
[14] Innocenzi P, Malfatti L, Kidchob T, Falcaro P 2009 Chem. Mater. 21 2555
[15] Ha T J, Choi S G, Jung S B, Yu B G, Park H H 2008 Ceramics International 34 947
[16] Zhao D Y, Yang P D, Melosh N, Feng J L, Chmelka B F, Stucky G D 1998 Adv. Mater. 10 1380
[17] Born M, Wolf E 1983 Principles of Optics (6th Ed.) (Oxford: Pergamon Press) p87
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[1] Thomas I M 1994 SPIE 2114 232
[2] Britten J A, Herman S M, Summers L J, Rushford M C 1998 SPIE 3578 337
[3] Grosso D, Seromon P A 2000 Thin Solid Films 368 116
[4] Ferrara M C, Perrone M R, Protopapa M L, Sancho-Parramon J, Bosch S, Mazzarelli S 2004 SPIE 5250 537
[5] Xu Y, Zhang L, Wu D, Sun Y H, Huang Z X, Jiang X D, Wei X F, Li Z H, Dong B Z, Wu Z H 2005 J. Opt. Soc. Am. B 22 905
[6] Stöber W, Fink A, Bohn E 1968 J. Colloid Interface Sci. 26 62
[7] Thomas I M 1986 Appl. Opt. 25 1481
[8] Floch H G, Belleville P F 1997 SPIE 3136 275
[9] Xu Y, Zhang B, Fan W H, Wu D, Sun Y H 2003 Thin Solid Films 440 180
[10] Ogawa M 1994 J. Am. Chem. Soc. 116 7941
[11] Yu S Z, Wong T K S, Hu X 2004 J. Sol-Gel Sci. Technol. 29 59
[12] Maruo T, Tanaka S, Hillhouse H W, Nishiyama N, Egashira Y, Ueyama K 2008 Thin Solid Films 516 4771
[13] Maruo T, Tanaka S, Nishiyama N, Motoda K I, Funayama K, Egashira Y, Ueyama K 2008 Colloids Surfaces A: Phys. 318 84
[14] Innocenzi P, Malfatti L, Kidchob T, Falcaro P 2009 Chem. Mater. 21 2555
[15] Ha T J, Choi S G, Jung S B, Yu B G, Park H H 2008 Ceramics International 34 947
[16] Zhao D Y, Yang P D, Melosh N, Feng J L, Chmelka B F, Stucky G D 1998 Adv. Mater. 10 1380
[17] Born M, Wolf E 1983 Principles of Optics (6th Ed.) (Oxford: Pergamon Press) p87
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