| [1] |
Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin. Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH film. Acta Physica Sinica,
2015, 64(10): 107701.
doi: 10.7498/aps.64.107701
|
| [2] |
He Su-Ming, Dai Shan-Shan, Luo Xiang-Dong, Zhang Bo, Wang Jin-Bin. Preparation of SiON film by plasma enhanced chemical vapor deposition and passivation on Si. Acta Physica Sinica,
2014, 63(12): 128102.
doi: 10.7498/aps.63.128102
|
| [3] |
Yang Fa-Zhan, Shen Li-Ru, Wang Shi-Qing, Tang De-Li, Jin Fa-Ya, Liu Hai-Feng. UV Raman and XPS studies of hydrogenous diamond-like carbon films prepared by PECVD. Acta Physica Sinica,
2013, 62(1): 017802.
doi: 10.7498/aps.62.017802
|
| [4] |
Hou Guo-Fu, Xue Jun-Ming, Yuan Yu-Jie, Zhang Xiao-Dan, Sun Jian, Chen Xin-Liang, Geng Xin-Hua, Zhao Ying. Key issues for high-efficiency silicon thin film solar cells prepared by RF-PECVD under high-pressure-depletion conditions. Acta Physica Sinica,
2012, 61(5): 058403.
doi: 10.7498/aps.61.058403
|
| [5] |
Ding Yan-Li, Zhu Zhi-Li, Gu Jin-Hua, Shi Xin-Wei, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao. Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2010, 59(2): 1190-1195.
doi: 10.7498/aps.59.1190
|
| [6] |
Li Yu-Jie, Xie Kai, Li Xiao-Dong, Xu Jing, Han Yu, Du Pan-Pan. Fabrication of germanium inverse opal three-dimensional photonic crystal by low temperature plasma enhanced chemical vapour deposition techniques and optical properties. Acta Physica Sinica,
2010, 59(3): 1839-1846.
doi: 10.7498/aps.59.1839
|
| [7] |
Ge Hong, Zhang Xiao-Dan, Yue Qiang, Zhao Jing, Zhao Ying. Study of space voltage distribution between large-area parallel-plate electrodes for very high frequency plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2008, 57(8): 5105-5110.
doi: 10.7498/aps.57.5105
|
| [8] |
Wu Zhen-Yu, Yang Yin-Tang, Wang Jia-You. Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition. Acta Physica Sinica,
2006, 55(5): 2572-2577.
doi: 10.7498/aps.55.2572
|
| [9] |
Yang Hang-Sheng. Surface growth mechanism of cubic boron nitride thin films prepared by plasma-enhanced chemical vapor deposition. Acta Physica Sinica,
2006, 55(8): 4238-4246.
doi: 10.7498/aps.55.4238
|
| [10] |
Zhang Xiao-Dan, Zhao Ying, Gao Yan-Tao, Zhu Feng, Wei Chang-Chun, Sun Jian, Wang Yan, Geng Xin-Hua, Xiong Shao-Zhen. Study of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition. Acta Physica Sinica,
2005, 54(4): 1899-1903.
doi: 10.7498/aps.54.1899
|
| [11] |
Zeng Xiang－Bo, Liao Xian－Bo, Wang Bo, Diao Hong－Wei, Dai Song－Tao, Xiang Xian－Bi, Chang Xiu－Lan, Xu Yan－Yue, Hu Zhi－Hua, Hao Hui－Ying, Kong Guang－Lin. Boron-doped silicon nanowires grown by plasmaenhanced chemical vapor deposition. Acta Physica Sinica,
2004, 53(12): 4410-4413.
doi: 10.7498/aps.53.4410
|
| [12] |
Wang Miao, Li Zhen-Hua, Takegawa Hitosi, Saito Yahachi. Study on the definite direction growth of carbon nanotubes by the microwave plasma-enhanced chemical vapro phase deposition. Acta Physica Sinica,
2004, 53(3): 888-890.
doi: 10.7498/aps.53.888
|
| [13] |
Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen. Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVD. Acta Physica Sinica,
2003, 52(11): 2865-2869.
doi: 10.7498/aps.52.2865
|
| [14] |
Yu Wei, Liu Li-Hui, Hou Hai-Hong, Ding Xue-Cheng, Han Li, Fu Guang-Sheng. Silicon nitride films prepared by helicon wave plasam-enhanced chemical vapour deposition. Acta Physica Sinica,
2003, 52(3): 687-691.
doi: 10.7498/aps.52.687
|
| [15] |
ZHANG YONG-PING, GU YOU-SONG, GAO HONG-JUN, ZHANG XIU-FANG. STRUCTURAL CHARACTERIZATION OF C3N4 THIN FILMS SYNTHESIZED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(7): 1396-1400.
doi: 10.7498/aps.50.1396
|
| [16] |
YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN. STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(4): 784-789.
doi: 10.7498/aps.50.784
|
| [17] |
NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO. CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(3): 566-571.
doi: 10.7498/aps.50.566
|
| [18] |
XIN YU, FAN SHU-PING, DI GUO-QING, SHEN MING-RONG, GAN ZHAO-QIANG. STUDIES OF CNx FILMS DEPOSITED BY MEANS OF MICROWAVE PLASMA CVD METHOD. Acta Physica Sinica,
1998, 47(1): 154-159.
doi: 10.7498/aps.47.154
|
| [19] |
LIU XIANG-NA, WU XIAO-WEI, BAO XI-MAO, HE YU-LIANG. PHOTOLUMINESCENCE FROM NANO-CRYSTALLITES OF SILICON FILMS PREPARED BY PECVD. Acta Physica Sinica,
1994, 43(6): 985-990.
doi: 10.7498/aps.43.985
|
| [20] |
ZHANG FANG-QING, ZHANG YA-FEI, YANG YING-HU, LI JING-QI, CHEN GUANG-HUA, JIANG XIANG-LIU. PREPARATION OF DIAMOND FILMS BY DC ARC DISCHARGE AND IN SITU MEASUREMENTS OF THE PLASMA BY OPTICAL EMISSION SPECTRA. Acta Physica Sinica,
1990, 39(12): 1965-1969.
doi: 10.7498/aps.39.1965
|
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