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STUDY OF ELECTRICAL PROPERTIES OF HEAVILY BORON DOPED Si EPILAYER AFTER RAPID THERMAL ANNEALING

YUAN JIAN LU FANG SUN HENG-HUI WEI XING YANG MIN HUANG DA-MING XU HONG-LAI SHEN HONG-LIE ZOU SHI-CHANG

Citation:

STUDY OF ELECTRICAL PROPERTIES OF HEAVILY BORON DOPED Si EPILAYER AFTER RAPID THERMAL ANNEALING

YUAN JIAN, LU FANG, SUN HENG-HUI, WEI XING, YANG MIN, HUANG DA-MING, XU HONG-LAI, SHEN HONG-LIE, ZOU SHI-CHANG
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  • Abstract views:  7089
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Publishing process
  • Received Date:  26 July 1993
  • Published Online:  20 July 1994

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