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Wang Xiao-Yu, Bi Wei-Hong, Cui Yong-Zhao, Fu Guang-Wei, Fu Xing-Hu, Jin Wa, Wang Ying. Synthesis of photonic crystal fiber based on graphene directly grown on air-hole by chemical vapor deposition. Acta Physica Sinica,
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Zhang Xiao-Bo, Qing Fang-Zhu, Li Xue-Song. Clean transfer of chemical vapor deposition graphene film. Acta Physica Sinica,
2019, 68(9): 096801.
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Feng Qiu-Ju, Li Fang, Li Tong-Tong, Li Yun-Zheng, Shi Bo, Li Meng-Ke, Liang Hong-Wei. Growth and characterization of grid-like β-Ga2O3 nanowires by electric field assisted chemical vapor deposition method. Acta Physica Sinica,
2018, 67(21): 218101.
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Wang Bin, Feng Ya-Hui, Wang Qiu-Shi, Zhang Wei, Zhang Li-Na, Ma Jin-Wen, Zhang Hao-Ran, Yu Guang-Hui, Wang Gui-Qiang. Hydrogen etching of chemical vapor deposition-grown graphene domains. Acta Physica Sinica,
2016, 65(9): 098101.
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Zhang Peng, Hong Yan-Ji, Ding Xiao-Yu, Shen Shuang-Yan, Feng Xi-Ping. Effect of plasma on boron-based two-phase flow diffusion combustion. Acta Physica Sinica,
2015, 64(20): 205203.
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Wang Lang, Feng Wei, Yang Lian-Qiao, Zhang Jian-Hua. The pre-treatment of copper for graphene synthesis. Acta Physica Sinica,
2014, 63(17): 176801.
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Feng Qiu-Ju, Xu Rui-Zhuo, Guo Hui-Ying, Xu Kun, Li Rong, Tao Peng-Cheng, Liang Hong-Wei, Liu Jia-Yuan, Mei Yi-Ying. Influences of the substrate position on the morphology and characterization of phosphorus doped ZnO nanomaterial. Acta Physica Sinica,
2014, 63(16): 168101.
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Du Hong-Liang, He Li-Ming, Lan Yu-Dan, Wang Feng. Influence of reduced electric field on the evolvement characteristics of plasma under conditions of N2/O2 discharge. Acta Physica Sinica,
2011, 60(11): 115201.
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Chen Fei, Zhang Xiao-Dan, Zhao Ying, Wei Chang-Chun, Sun Jian. Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing silicon films. Acta Physica Sinica,
2008, 57(5): 3276-3280.
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Zhang Fa-Rong, Zhang Xiao-Dan, Amanatides E., Mataras D., Zhao Jing, Zhao Ying. Study on the optical and electrical properties of plasma for the deposition of microcrystalline silicon. Acta Physica Sinica,
2008, 57(5): 3022-3026.
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Zhang Xiao-Dan, Zhang Fa-Rong, Elefterious Amanatides, Dimitris Mataras, Zhao Ying. Plasma power and impedance measurement in silicon thin film deposition. Acta Physica Sinica,
2007, 56(9): 5309-5313.
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Han Dao-Li, Zhao Yuan-Li, Zhao Hai-Bo, Song Tian-Fu, Liang Er-Jun. Growth of well-aligned carbon nanotubes arrays by chemical vapor deposition. Acta Physica Sinica,
2007, 56(10): 5958-5964.
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Guo Ping-Sheng, Chen Ting, Cao Zhang-Yi, Zhang Zhe-Juan, Chen Yi-Wei, Sun Zhuo. Low temperature growth of carbon nanotubes by chemical vapor deposition for field emission cathodes. Acta Physica Sinica,
2007, 56(11): 6705-6711.
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Yang Hang-Sheng. Surface growth mechanism of cubic boron nitride thin films prepared by plasma-enhanced chemical vapor deposition. Acta Physica Sinica,
2006, 55(8): 4238-4246.
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Sun Li-Tao, Gong Jin-Long, Zhu Zhi-Yuan, Zhu De-Zhang, He Sui-Xia, Wang Zhen-Xia. Plasma-induced transformation of carbon nanotubes to nanocrystalline diamond. Acta Physica Sinica,
2004, 53(10): 3467-3471.
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Yan Xiao-Qin, Liu Zu-Qin, Tang Dong-Sheng, Ci Li-Jie, Liu Dong-Fang, Zhou Zhen-Ping, Liang Ying-Xin, Yuan Hua-Jun, Zhou Wei-Ya, Wang Gang. Effects of substrates on silicon oxide nanowires growth by thermal chemical vapor deposition. Acta Physica Sinica,
2003, 52(2): 454-458.
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Yu Wei, Liu Li-Hui, Hou Hai-Hong, Ding Xue-Cheng, Han Li, Fu Guang-Sheng. Silicon nitride films prepared by helicon wave plasam-enhanced chemical vapour deposition. Acta Physica Sinica,
2003, 52(3): 687-691.
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2002, 51(2): 326-331.
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CHEN XIAO-HUA, WU GUO-TAO, DENG FU-MING, WANG JIAN-XIONG, YANG HANG-SHENG, WANG MIAO, LU XIAO-NAN, PENG JING-CUI, LI WEN-ZHU. GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(7): 1264-1267.
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