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Luo Ling-Feng, Yang Juan, Geng Hai, Wu Xian-Ming, Mou Hao. Numerical simulation of magnetic field influence on plasma and electron extraction of electron cyclotron resonance neutralizer. Acta Physica Sinica,
2024, 73(16): 165203.
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Li Xin, Zeng Ming, Liu Hui, Ning Zhong-Xi, Yu Da-Ren. Iodine electron cyclotron resonance plasma source for electric propulsion. Acta Physica Sinica,
2023, 72(22): 225202.
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Xia Xu, Yang Juan, Fu Yu-Liang, Wu Xian-Ming, Geng Hai, Hu Zhan. Numerical simulation of influence of magnetic field on plasma characteristics and surface current of ion source of 2-cm electron cyclotron resonance ion thruster. Acta Physica Sinica,
2021, 70(7): 075204.
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Yuan Zhong-Cai, Shi Jia-Ming. Theoretical and numerical studies on interactions between high-power microwave and plasma. Acta Physica Sinica,
2014, 63(9): 095202.
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Zhou Qian-Hong, Dong Zhi-Wei, Chen Jing-Yuan. Modeling of plasma pattern formation in 110 GHz microwave air breakdown. Acta Physica Sinica,
2011, 60(12): 125202.
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Gao Bi-Rong, Liu Yue. Numerical study on uniformity of electron cyclotron resonance plasma density. Acta Physica Sinica,
2011, 60(4): 045201.
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Lu Hong-Wei, Hu Li-Qun, Zhou Rui-Jie, Xu Ping, Zhong Guo-Qiang, Lin Shi-Yao, Wang Shao-Feng. Runaway electrons behaviors during ion cycolotron range of frequency and lower hybrid wave plasmas in the HT-7 Tokamak. Acta Physica Sinica,
2010, 59(10): 7175-7181.
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Ke Bo, Wang Lei, Ni Tian-Ling, Ding Fang, Chen Mu-Di, Zhou Hai-Yang, Wen Xiao-Hui, Zhu Xiao-Dong. Effects of radio-frequency bias on silicon oxide films deposited by dual electron cyclotron resonance-radio frequency hybrid plasma. Acta Physica Sinica,
2010, 59(2): 1338-1343.
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Yang Juan, Shi Feng, Yang Tie-Lian, Meng Zhi-Qiang. Numerical simulation on the plasma field within discharge chamber of electron cyclotron resonance ion thruster. Acta Physica Sinica,
2010, 59(12): 8701-8706.
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Wang Ye-An, Qin Fu-Wen, Wu Dong-Jiang, Wu Ai-Min, Xu Yin, Gu Biao. Analysis of diluted magnetic semiconductor GaMnN grown by electron cyclotron resonance-plasma enhanced metal organic chemical vapor deposition. Acta Physica Sinica,
2008, 57(1): 508-513.
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Gong Xue-Yu, Peng Xiao-Wei, Xie An-Ping, Liu Wen-Yan. Electron cyclotron current drive under different operational regimes in tokamak plasma. Acta Physica Sinica,
2006, 55(3): 1307-1314.
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Li Hong, Su Tie, Ouyang Liang, Wang Hui-Hui, Bai Xiao-Yan, Chen Zhi-Peng, Liu Wan-Dong. Numerical simulation of plasma of large-dimensions produced by injecting electron beam into air. Acta Physica Sinica,
2006, 55(7): 3506-3513.
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Wu Zhen-Yu, Yang Yin-Tang, Wang Jia-You. Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition. Acta Physica Sinica,
2006, 55(5): 2572-2577.
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Chen Zhuo, He Wei, Pu Yi-Kang. Measurement of metastable state densities and electron temperatures in an electron cyclotron resonance argon plasma. Acta Physica Sinica,
2005, 54(5): 2153-2157.
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Ye Chao, Du Wei, Ning Zhao-Yuan, Cheng Shan-Hua. Effect of grid and bias on the characteristic of CHF3 electron cyclot ron resonance discharge plasma. Acta Physica Sinica,
2003, 52(7): 1802-1807.
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NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO. CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(3): 566-571.
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA. OPTICAL PROPERTIES OF AMORPHOUS FLUORINATED CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA. Acta Physica Sinica,
2001, 50(10): 2017-2022.
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN. STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(4): 784-789.
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2000, 49(3): 497-501.
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1999, 48(2): 257-266.
doi: 10.7498/aps.48.257
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