-
Based on drift-diffusion approximation and under axis-symmetric assumption, a two-dimensional(2D) fluid model is established for the plasma in the chamber of electron cyclotron resonance plasma source. A finite difference method is used for self-consistent numerically simulating the model. Numerical results of uniformity evolution of plasma density are obtained. From the analysis of the numerical results, the effects of background gas pressure, microwave power and current in magnetic field coil on uniformity of the plasma density are studied. The results shows that during the initial ionization, the uniformity of electron density is better than that of ion density. During the later ionization, the uniformity of ion density is better than that of electron density. As background gas pressure increases, the uniformities of both electron and ion densities increase, and the uniformity of ion density increases faster. As microwave power increases, the uniformities of both electron and ion densities increase with almost the same rates. As current in magnetic field coil increases, the uniformities of both electron and ion densities increase at almost the same rates. However, when the current in magnetic field coil becomes big enough, the uniformities of both electron and ion densities decrease at almost of same rates.
-
Keywords:
- plasma density uniformity /
- background gas pressure /
- microwave power /
- current in magnetic field coil
[1] Asmussen J 1989 J. Vac. Sci. Technol. A 7 883
[2] Ning Z Y,Ren Z X 1992 Prog. Phys. 12 38 (in Chinese) [宁兆元、任兆杏 1992 物理学进展 12 38]
[3] Erckmann V, Gasparino U 1994 Plasma Phys. Controlled Fusion 36 1869
[4] England A C 1984 IEEE Trans. Plasma Sci. 12 124
[5] Eldridge O C,England A C 1989 Nucl. Fusion 29 1583
[6] Abrakov V V, Akulina D K, Andryukhina E D, Batanov G M, Berezhetskij M S, Danilkin I S, Donskaya N P, Fedyanin O I, Gladkov G A, Grebenshchikov S E, Harris J H, Kharchev N K, Kholnov Y V, Kolik L V, Kovrizhnykh L M, Larionova N F, Letunov A A, Likin K M, Lyon J F, Meshcheryakov A I, Nechaev Y I, Petrov A E, Sarksyan K A, Sbitnikova I S 1997 Nucl. Fusion 37 233
[7] Gong Y, Wen X J, Zhang P Y, Deng X L 1997 Acta Phys. Sin. 46 2376 (in Chinese) [宫 野、温晓军、张鹏云、邓新绿 1997 46 2376]
[8] Liu M H, Hu X W, Wu Q C, Yu G Y 2000 Acta Phys. Sin. 49 497 (in Chinese)[刘明海、胡希伟、邬钦崇、俞国扬 2000 49 497]
[9] Muta H,Itagaki N, Kawai Y 2002 Vacuum 66 209
[10] Muta H,Koga M,Itagaki N,Kawai Y 2003 Surf. Coat. Technol. 171 157
[11] Chen J F, Wu X Q, Wang D Q, Ding Z F, Ren Z X 1999 Acta Phys. Sin. 48 1309 (in Chinese) [陈俊芳、吴先球、王德秋、丁振峰、任兆杏 1999 48 1309]
[12] Fu S L, Chen J F, Wu X Q, Wang N X, Zhang M P, Hu S J 2006 Plasma Sci. Tech. 8 300 (in Chinese) [符斯列、陈俊芳、吴先球、王宁星、张茂平、胡社军 2006 等离子体科学与技术 8 300]
[13] Liu Y, Wang Y X, Cui S Y, Wang X D, Zheng S, Wang X G 2006 Vacuum 80 1367
[14] Porteous R K, Wu H M, Graves D B 1994 Plasma Sources Sci. Technol. 3 25
-
[1] Asmussen J 1989 J. Vac. Sci. Technol. A 7 883
[2] Ning Z Y,Ren Z X 1992 Prog. Phys. 12 38 (in Chinese) [宁兆元、任兆杏 1992 物理学进展 12 38]
[3] Erckmann V, Gasparino U 1994 Plasma Phys. Controlled Fusion 36 1869
[4] England A C 1984 IEEE Trans. Plasma Sci. 12 124
[5] Eldridge O C,England A C 1989 Nucl. Fusion 29 1583
[6] Abrakov V V, Akulina D K, Andryukhina E D, Batanov G M, Berezhetskij M S, Danilkin I S, Donskaya N P, Fedyanin O I, Gladkov G A, Grebenshchikov S E, Harris J H, Kharchev N K, Kholnov Y V, Kolik L V, Kovrizhnykh L M, Larionova N F, Letunov A A, Likin K M, Lyon J F, Meshcheryakov A I, Nechaev Y I, Petrov A E, Sarksyan K A, Sbitnikova I S 1997 Nucl. Fusion 37 233
[7] Gong Y, Wen X J, Zhang P Y, Deng X L 1997 Acta Phys. Sin. 46 2376 (in Chinese) [宫 野、温晓军、张鹏云、邓新绿 1997 46 2376]
[8] Liu M H, Hu X W, Wu Q C, Yu G Y 2000 Acta Phys. Sin. 49 497 (in Chinese)[刘明海、胡希伟、邬钦崇、俞国扬 2000 49 497]
[9] Muta H,Itagaki N, Kawai Y 2002 Vacuum 66 209
[10] Muta H,Koga M,Itagaki N,Kawai Y 2003 Surf. Coat. Technol. 171 157
[11] Chen J F, Wu X Q, Wang D Q, Ding Z F, Ren Z X 1999 Acta Phys. Sin. 48 1309 (in Chinese) [陈俊芳、吴先球、王德秋、丁振峰、任兆杏 1999 48 1309]
[12] Fu S L, Chen J F, Wu X Q, Wang N X, Zhang M P, Hu S J 2006 Plasma Sci. Tech. 8 300 (in Chinese) [符斯列、陈俊芳、吴先球、王宁星、张茂平、胡社军 2006 等离子体科学与技术 8 300]
[13] Liu Y, Wang Y X, Cui S Y, Wang X D, Zheng S, Wang X G 2006 Vacuum 80 1367
[14] Porteous R K, Wu H M, Graves D B 1994 Plasma Sources Sci. Technol. 3 25
计量
- 文章访问数: 9094
- PDF下载量: 747
- 被引次数: 0
下载:
