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Spatiotemporal distribution of hydrogenous electrode vacuum arc discharge plasma

Feng Jing-Hua Meng Shi-Jian Fu Yue-Cheng Zhou Lin Xu Rong-Kun Zhang Jian-Hua Li Lin-Bo Zhang Fa-Qiang

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Spatiotemporal distribution of hydrogenous electrode vacuum arc discharge plasma

Feng Jing-Hua, Meng Shi-Jian, Fu Yue-Cheng, Zhou Lin, Xu Rong-Kun, Zhang Jian-Hua, Li Lin-Bo, Zhang Fa-Qiang
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  • Vacuum arc ion sources have been used in a wide range including vacuum coating, materials surface modification, switching devices and other fields. At present, researches on the vacuum arc ion source are mainly targeting the pure metal or alloy electrodes, but the researches on the hydrogenous electrode are rarely reported. The axial and radial distributions of the hydrogenous electrode vacuum arc discharge plasma are studied by using high speed four-frame camera equipped with the narrow-band filters of strong lines of H I and Ti I. It is found that the anode is intensively luminous in the vacuum breakdown. The observation from the camera with the filter reveals that the vacuum breakdown is ignited mainly by the anode hydrogen desorption. The vacuum arc is sustained by plasmas emitted from either the cathode spots or the electrode inner wall. The cone-shaped cathode spot located at the cathode-insulator-vacuum junction is the main plasma source. It is found that the distribution of hydrogen atoms is much more homogeneous than that of titanium atoms, which may be due to the earlier beginning of hydrogen desorption, the bigger emitting area and faster diffusion speed of hydrogen atom.
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    Vitel Y, Lamoureux M, Abada H, Lejeune A, Faure C, Tourneur P L, Godechot X, Cochard S 2002 Plasma Sources Sci. Technol. 11 333

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  • [1]

    Georgy Y, Yushkov, Andr A 2008 Appl. Phys. Lett. 92 041502

    [2]
    [3]

    Brown I G 1994 Rev. Sci. Instrum. 65 3061

    [4]
    [5]

    Brown I G, Oks E M 1997 IEEE Trans. Plasma Sci. 25 1222

    [6]

    Boxman R L, Zhitomirsky V N 2006 Rev. Sci. Instrum. 77 021101

    [7]
    [8]

    Bacon F M 1975 J. Appl. Phys. 46 4750

    [9]
    [10]
    [11]

    Rosenthal H, Beilis I, Goldsmith S, Boxman R L 1996 J. Phys. D: Appl. Phys. 29 1245

    [12]

    Popov S A, Batrakov A V, Methling R, Uhrlandt D, Weltmann K 2009 IEEE Trans. Plasma Sci. 37 1419

    [13]
    [14]
    [15]

    Methling R, Popov S A, Batrakov A V, Uhrlandt D, Weltmann K 2013 IEEE Trans. Plasma Sci. 41 1904

    [16]
    [17]

    Earwaker L G, England J B A, Goldie D J 1987 Nucl. Instrum. Methods Phys. Res. Sect. B 24-25 711

    [18]
    [19]

    Lu J L, Cao J X 2012 Acta Phys. Sin. 61 148801 (in Chinese) [卢金炼, 曹觉先 2012 61 148801]

    [20]

    Bhosle V, Baburaj E G, Miranova M, Salama K 2003 Mater. Eng. A 356 190

    [21]
    [22]
    [23]

    Dai Y Y, Yang L, Peng S M, Long X G, Zhou X S, Zu X T 2012 Acta Phys. Sin. 61 108801 (in Chinese) [代云雅, 杨莉, 彭述明, 龙兴贵, 周晓松, 祖小涛 2012 61 108801]

    [24]
    [25]

    Zhang L, Zhu Z H, Yang B F, Long X G, Luo S Z 2006 Acta Phys. Sin. 55 5418 (in Chinese) [张莉, 朱正和, 杨本福, 龙兴贵, 罗顺忠 2006 55 5418]

    [26]
    [27]

    Chen L, Jin D Z, Cheng L, Shi L, Tan X H, Dai J Y, Hu S D 2011 High Power Laser and Particle Beams 23 1361 (in Chinese) [陈磊, 金大志, 程亮, 石磊, 谈效华, 戴晶怡, 胡思得 2011 强激光与粒子束 23 1361]

    [28]

    Sun J Z, Li X T, Bai J, Wang D Z 2012 Chin. Phys. B 21 055205

    [29]
    [30]

    Li X C, Niu D Y, Xu L F, Jia P Y, Chang Y Y 2012 Chin. Phys. B 21 075204

    [31]
    [32]

    Zuo Y H, Wang J G, Zhu J H, Niu S L, Fan R Y 2012 Acta Phys. Sin. 61 177901 (in Chinese) [左应红, 王建国, 朱金辉, 牛胜利, 范如玉 2012 61 177901]

    [33]
    [34]
    [35]

    Mesyats G A, Proskurovsky D I 1988 Pulsed Electrical Discharge in Vacuum (Berlin: Springer-Verlag) pp72-78

    [36]

    Dukhopel'nikov D V, Zhukov A V, Kirillov D V, Marakhtanov M K 2005 Measur. Tech. 48 995

    [37]
    [38]

    Vitel Y, Lamoureux M, Abada H, Lejeune A, Faure C, Tourneur P L, Godechot X, Cochard S 2002 Plasma Sources Sci. Technol. 11 333

    [39]
    [40]

    Kondrat'eva N P, Koval' N N, Korolev Y D, Schanin P M 1999 J. Phys. D: Appl. Phys. 32 699

    [41]
    [42]
    [43]

    Tang P Y, Dai J Y, Tan X H, Jin D Z, Liu T, Ding B N 2005 Nucl. Tech. 28 217 (in Chinese) [唐平瀛, 戴晶怡, 谈效华, 金大志, 刘铁, 丁伯南 2005 核技术 28 217]

    [44]
    [45]

    Zheng C K 2009 Plasma Physics (Beijing: Peking University Press) p173 (in Chinese) [郑春开 2009 等离子体物理 (北京: 北京大学出版社) 第173页]

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Publishing process
  • Received Date:  05 January 2014
  • Accepted Date:  04 March 2014
  • Published Online:  05 July 2014

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