Numerical simulation of Trichel pulse characteristics in bar-plate DC negative corona discharge

Wu Fei-Fei; Liao Rui-Jin; Yang Li-Jun; Liu Xing-Hua; Wang Ke; Zhou Zhi

doi:10.7498/aps.62.115201

Abstract

An improved multi-component two-dimensional hybrid model is presented for the simulation of Trichel pulse corona discharge. The model is based on the plasma hydrodynamics and chemical models, including 12 species and 27 reactions. In addition, the photoionization and secondary electron emission effects are taken into account. Simulation is carried out on a bar-plate electrode configuration with an inter-electrode gap of 3.3 mm, the positive potential applied to the bar being 5.0 kV, the pressure in air discharge being fixed at 1.0 atm, and the gas temperature assumed to be a constant (300 K). In this paper, some key microscopic characteristics such as electric field distribution, net charge density distribution, electron density distribution at 5 different instants during a Trichel pulse are analyzed emphatically. Further more, the electron generation and disappearing rates, positive and negative ion distribution characteristics along the axis of symmetry are also investigated in detail in the later Trichel pulse cycle. The results can give valuable insights into the physical mechanism of negative corona discharge.

Keywords:

Authors and contacts

1.
State Key Laboratory of Power Transmission Equipment & System Security and New Technology, Chongqing 400044, China;
2.
Zibo Power Supply Company, Shandong Electric Power Corporation, Zibo 255000, China
Funds: Project supported by the National Basic Research Program of China (Grant No. 2011CB209401), and the Science Fund for Creative Research Groups of the National Natural Science Foundation of China (Grant No. 51021005).

References

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[5]	Stoffels E, Flikweert A J, Stoffels W W and Kroesen G M W 2002 Plasma Sources Sci. Technol. 11 383
[6]	G W Trichel 1938 Phys. Rev. 54 1078
[7]	Zentner R 1970 Z. Angew. Physik 29 294
[8]	Soria H C, Pontiga F, Castellanos A 2007 J. Phys. D: Appl. Phys. 40 4552
[9]	Loeb L B, Kip A F, Hudson G G 1941 Phys. Rev. 60 714
[10]	Loeb L B 1965 Electrical coronas: their basic physical mechanisms (Berkeley: University of California Press) p226-230
[11]	Lama W L, Gallo C F 1974 J. Appl. Phys. 45 103-13
[12]	Michael A L, Allan J L 2007 Plasma discharge principle and materials processing (Beijing: Science Press) (in Chinese) [迈克尔 A 力伯曼,阿伦 J 里登伯格 2007等离子体放电原理与材料处理(北京: 科学出版社)]
[13]	Kekez M M, Savic P, Lougheed G D 1982 J. Phys. D: Appl. Phys. 15 1963
[14]	Tran T N, Golosnov I O, Levin P L, Georghiou G E 2009 IEEE Conf. on Electrical Insulation and Dielectric Phenomena, CEIDP '09 (Virginia Beach, VA, 18-21 October 2009) p 592-5
[15]	Agostino R D, Favia P, Oehr C, Wertheimer M R 2005 Plasma Processes and Polymers 2 7
[16]	Nahomy J, Ferreira C M, Gordiets B, Pagnon D, Touzeau M,Vialle M, 2010 J. Phys. D: Appl. Phys. 107 093304
[17]	Pancheshnyi S V, Starikovskii A Y 2003 J. Phys. D: Appl. Phys. 36 268
[18]	Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
[19]	Zheleznyak M D, Mnattskanyan A K 1977 Zhurnal Tekhnicheskoi Fiziki 47 2497
[20]	Yu V S, Larsson A, Gubanski S M, Akyuz M 2001 J. Phys. D: Appl. Phys. 34 614
[21]	Liu X H, He W, Yang F, Wang H Y, Liao R J, Xiao H G 2012 Chin. Phys. B 21 75201
[22]	Philip D N, Janzen A R, Aziz R A 1972 J. Chem. Phys. 57 1100
[23]	Brokaw R S 1969 Ind. Eng. Chem. Process Des. 8 240
[24]	Bird R B, Stewart W E, Lightfoot E N 1960 Transport Phenomena (Madison: Madison Press)
[25]	Farouk T, Farouk B, Gutsol A, Fridman A 2008 Plasma Sources Sci. Technol. 17 035015
[26]	Curtiss C F, Bird R B 1999 Ind. Eng. Chem. Res. 38 2515
[27]	Xu X J, Zhu D C 1996 Air discharge physical (Shanghai: Fudan University Press) (in Chinese) [徐学基, 诸定昌 1996 空气放电物理(上海: 复旦大学出版社)]
[28]	Liu X H, He W, Yang F, Xiao H G, Ma J 2011 High Voltage Engineering 37 1614 (in Chinese) [刘兴华, 何为, 杨帆, 肖汉光, 马俊 2011 高电压技术 37 1614]
[29]	Du H L, He L M, Lan Y u, Wang F 2011 Acta Phys. Sin. 60 115201 (in Chinese) [杜宏亮, 何立明, 兰宇丹, 王峰 2011 60 115201]
[30]	He W, Liu X H, Yang F, Wang H u, Liao R J, Xiao H G 2012 Jpn. J. Appl. Phys. 51 026001
[31]	Tran T N, Golosnoy I O, Lewin P L, Georghiou G E 2011 J. Phys. D: Appl. Phys. 44 015203
[32]	Yu D R, Qing S W, Yan G J, Duan P 2011 Chin. Phys. B 20 65204
[33]	Wang P X, Fan F G, Zirilli F, Chen J H 2012 IEEE T. Plasma Sci. 40 421
[34]	Antao D S, Staack D A, Fridman A, Farouk B 2009 Plasma Sources Sci. Technol. 18 035016
[35]	Mahadev S, Raja L L 2010 J. Appl. Phys. 107 093304

Cited By

[1]	Liu Z Y 2005 Ultra-hig grid (Beijing: China Economic Publishig) (in Chinese) [刘振亚 2005 特高压电网(北京: 中国经济出版社)]
[2]	Shu Y B, Hu Y 2007 Proceedings of the CSEE 27 1 (in Chinese) [舒印彪, 胡毅 2007 中国电机工程学报 27 1]
[3]	Zheng Y S, He J L, Zhang B 2011 High Voltage Engineering 37 752 (in Chinese) [郑跃胜, 何金良, 张波 2011 高电压技术 37 752]
[4]	In L, WU B, Zhang P, Wang Y Q 2004 Chin. Phys. Lett. 21 1993
[5]	Stoffels E, Flikweert A J, Stoffels W W and Kroesen G M W 2002 Plasma Sources Sci. Technol. 11 383
[6]	G W Trichel 1938 Phys. Rev. 54 1078
[7]	Zentner R 1970 Z. Angew. Physik 29 294
[8]	Soria H C, Pontiga F, Castellanos A 2007 J. Phys. D: Appl. Phys. 40 4552
[9]	Loeb L B, Kip A F, Hudson G G 1941 Phys. Rev. 60 714
[10]	Loeb L B 1965 Electrical coronas: their basic physical mechanisms (Berkeley: University of California Press) p226-230
[11]	Lama W L, Gallo C F 1974 J. Appl. Phys. 45 103-13
[12]	Michael A L, Allan J L 2007 Plasma discharge principle and materials processing (Beijing: Science Press) (in Chinese) [迈克尔 A 力伯曼,阿伦 J 里登伯格 2007等离子体放电原理与材料处理(北京: 科学出版社)]
[13]	Kekez M M, Savic P, Lougheed G D 1982 J. Phys. D: Appl. Phys. 15 1963
[14]	Tran T N, Golosnov I O, Levin P L, Georghiou G E 2009 IEEE Conf. on Electrical Insulation and Dielectric Phenomena, CEIDP '09 (Virginia Beach, VA, 18-21 October 2009) p 592-5
[15]	Agostino R D, Favia P, Oehr C, Wertheimer M R 2005 Plasma Processes and Polymers 2 7
[16]	Nahomy J, Ferreira C M, Gordiets B, Pagnon D, Touzeau M,Vialle M, 2010 J. Phys. D: Appl. Phys. 107 093304
[17]	Pancheshnyi S V, Starikovskii A Y 2003 J. Phys. D: Appl. Phys. 36 268
[18]	Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
[19]	Zheleznyak M D, Mnattskanyan A K 1977 Zhurnal Tekhnicheskoi Fiziki 47 2497
[20]	Yu V S, Larsson A, Gubanski S M, Akyuz M 2001 J. Phys. D: Appl. Phys. 34 614
[21]	Liu X H, He W, Yang F, Wang H Y, Liao R J, Xiao H G 2012 Chin. Phys. B 21 75201
[22]	Philip D N, Janzen A R, Aziz R A 1972 J. Chem. Phys. 57 1100
[23]	Brokaw R S 1969 Ind. Eng. Chem. Process Des. 8 240
[24]	Bird R B, Stewart W E, Lightfoot E N 1960 Transport Phenomena (Madison: Madison Press)
[25]	Farouk T, Farouk B, Gutsol A, Fridman A 2008 Plasma Sources Sci. Technol. 17 035015
[26]	Curtiss C F, Bird R B 1999 Ind. Eng. Chem. Res. 38 2515
[27]	Xu X J, Zhu D C 1996 Air discharge physical (Shanghai: Fudan University Press) (in Chinese) [徐学基, 诸定昌 1996 空气放电物理(上海: 复旦大学出版社)]
[28]	Liu X H, He W, Yang F, Xiao H G, Ma J 2011 High Voltage Engineering 37 1614 (in Chinese) [刘兴华, 何为, 杨帆, 肖汉光, 马俊 2011 高电压技术 37 1614]
[29]	Du H L, He L M, Lan Y u, Wang F 2011 Acta Phys. Sin. 60 115201 (in Chinese) [杜宏亮, 何立明, 兰宇丹, 王峰 2011 60 115201]
[30]	He W, Liu X H, Yang F, Wang H u, Liao R J, Xiao H G 2012 Jpn. J. Appl. Phys. 51 026001
[31]	Tran T N, Golosnoy I O, Lewin P L, Georghiou G E 2011 J. Phys. D: Appl. Phys. 44 015203
[32]	Yu D R, Qing S W, Yan G J, Duan P 2011 Chin. Phys. B 20 65204
[33]	Wang P X, Fan F G, Zirilli F, Chen J H 2012 IEEE T. Plasma Sci. 40 421
[34]	Antao D S, Staack D A, Fridman A, Farouk B 2009 Plasma Sources Sci. Technol. 18 035016
[35]	Mahadev S, Raja L L 2010 J. Appl. Phys. 107 093304

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Vol. 62, Issue 11 - 2013-06-05

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