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Enhanced glow discharge plasma immersion ion implantation is self-consistently simulated using a three-dimensional PIC/MC model. The information about ion counts, space potential, plasma density and ion incident dose is obtained. The results show that the sheath has fully expanded at 5 μs. There is a stable equilibrium of ion counts at 15 μs, which corroborates the characteristic of self-sustaining glow discharge of EGD-PIII. In the space just below anode where is found a highest plasma density, verifying the electron focusing effect. The rate of implantation is steady and the incident dose is relatively uniform except at the rim of target. A higher pulse negative bias may increase the injection rate but reduce the dose uniformity at the same time.
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Keywords:
- three-dimensional particle-in-cell /
- Monte Carlo /
- plasma immersion ion implantation /
- numerical simulation
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[2] Tendys J, Donnelly I J, Kenny M J, Pollock J T A 1988 Appl. Phys. Lett. 53 2143
[3] Li X C, Wang Y N 2004 Acta Phys. Sin. 53 2667 (in Chinese) [李雪春, 王友年 2004 53 2666]
[4] Chu P K 2004 J. Vac. Sci. Technol. B 22 289
[5] Walter K C 1994 J. Vac. Sci. Technol. B 12 945
[6] Li L H, Chu P K 2007 Surf. Coat. Technol. 201 6516
[7] Chu P K, Li L H U.S. Patent 8 119 208 B2 [2012-02-21]
[8] Li L H, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H 2003 Rev. Sci. Instrum. 74 4301
[9] Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 Phys. Lett. A 372 6183
[10] Li L H ,Wu Y Q, Zhang Y H, Fu R K Y, Chu P K 2005 J. Appl. Phys. 97 113301
[11] Lu Q Y, Li L H, Li J H, Fu R K Y, Chu P K 2009 Appl. Phys. Lett. 95 061503
[12] Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 J. Appl. Phys. 104 043303
[13] Li L H, Lu Q Y, Fu R K Y, Chu P K 2009 Nucl. Instrum. Methods. Phys. Res. Sect. B 267 1696
[14] Lu Q Y, Wang Z, Li L H, Fu R K Y, Chu P K 2010 J. Appl. Phys. 108 033304
[15] Wang Z, Zhu Y, Li L H, Lu Q Y, He F S, Dun D D, Li F, Fu R K Y, Chu P K 2011 Riew. Sci. Instrum. 82 023503
[16] Kwok D T K, Lu Q Y, Li L H, Li J H, Fu R K Y, Chu P K 2008 Appl. Phys. Lett. 93 091501
[17] Li L H, Li J H, Kwok D T K, Wang Z, Chu P K 2009 J. Appl. Phys. 106 013313
[18] En W, Cheung N W 1996 IEEE. Trans. Plasma Sci. 24 1184
[19] Kwok DTK, Li J H, Ma X B, Chu P K 2010 J. Phys. D: Appl. Phys. 43 095203
[20] Wang P, Tian X B, Wang Z J, Gong C Z , Y S Q 2011 Acta Phys. Sin. 60 085206 (in Chinese) [王蓬, 田修波, 汪志健, 巩春志, 杨士勤 2011 60 085206]
[21] Kwok D T K 2006 IEEE. Trans. Plasma. Sci. 34 1059
[22] Shao F Q 2002 Plasma Particle Simulation (Beijing: Science Press) p28 (in Chinese) [邵福球 2002 等离子体粒子模拟 (北京:科学出版社) 第28页]
[23] Yang C, Liu D G, Wang X M, Liu L Q, Wang X Q, Liu S G Acta Phys. Sin. 61 045204 (in Chinese) [杨超, 刘大刚, 王小敏, 刘腊群, 王学琼, 刘盛刚 2012 61 045204]
[24] Vahedi V, Surendra M 1995 Comput. Phys. Commun. 87 179
[25] Brusa R S, Karwasz G P, Zecca A 1996 Z. Phys. D: At. Mol. Clusters. 38 279
[26] Li L H, Fu R K Y, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H, Cai X, Chen Q L, Xu M 2004 Surf. Coat. Technol. 186 165
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[1] Conrad J R, Radtke J L, Dodd R A, Worzala F G, Tran N C 1987 J. Appl. Phys. 62 4591
[2] Tendys J, Donnelly I J, Kenny M J, Pollock J T A 1988 Appl. Phys. Lett. 53 2143
[3] Li X C, Wang Y N 2004 Acta Phys. Sin. 53 2667 (in Chinese) [李雪春, 王友年 2004 53 2666]
[4] Chu P K 2004 J. Vac. Sci. Technol. B 22 289
[5] Walter K C 1994 J. Vac. Sci. Technol. B 12 945
[6] Li L H, Chu P K 2007 Surf. Coat. Technol. 201 6516
[7] Chu P K, Li L H U.S. Patent 8 119 208 B2 [2012-02-21]
[8] Li L H, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H 2003 Rev. Sci. Instrum. 74 4301
[9] Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 Phys. Lett. A 372 6183
[10] Li L H ,Wu Y Q, Zhang Y H, Fu R K Y, Chu P K 2005 J. Appl. Phys. 97 113301
[11] Lu Q Y, Li L H, Li J H, Fu R K Y, Chu P K 2009 Appl. Phys. Lett. 95 061503
[12] Lu Q Y, Li L H, Fu R K Y, Chu P K 2008 J. Appl. Phys. 104 043303
[13] Li L H, Lu Q Y, Fu R K Y, Chu P K 2009 Nucl. Instrum. Methods. Phys. Res. Sect. B 267 1696
[14] Lu Q Y, Wang Z, Li L H, Fu R K Y, Chu P K 2010 J. Appl. Phys. 108 033304
[15] Wang Z, Zhu Y, Li L H, Lu Q Y, He F S, Dun D D, Li F, Fu R K Y, Chu P K 2011 Riew. Sci. Instrum. 82 023503
[16] Kwok D T K, Lu Q Y, Li L H, Li J H, Fu R K Y, Chu P K 2008 Appl. Phys. Lett. 93 091501
[17] Li L H, Li J H, Kwok D T K, Wang Z, Chu P K 2009 J. Appl. Phys. 106 013313
[18] En W, Cheung N W 1996 IEEE. Trans. Plasma Sci. 24 1184
[19] Kwok DTK, Li J H, Ma X B, Chu P K 2010 J. Phys. D: Appl. Phys. 43 095203
[20] Wang P, Tian X B, Wang Z J, Gong C Z , Y S Q 2011 Acta Phys. Sin. 60 085206 (in Chinese) [王蓬, 田修波, 汪志健, 巩春志, 杨士勤 2011 60 085206]
[21] Kwok D T K 2006 IEEE. Trans. Plasma. Sci. 34 1059
[22] Shao F Q 2002 Plasma Particle Simulation (Beijing: Science Press) p28 (in Chinese) [邵福球 2002 等离子体粒子模拟 (北京:科学出版社) 第28页]
[23] Yang C, Liu D G, Wang X M, Liu L Q, Wang X Q, Liu S G Acta Phys. Sin. 61 045204 (in Chinese) [杨超, 刘大刚, 王小敏, 刘腊群, 王学琼, 刘盛刚 2012 61 045204]
[24] Vahedi V, Surendra M 1995 Comput. Phys. Commun. 87 179
[25] Brusa R S, Karwasz G P, Zecca A 1996 Z. Phys. D: At. Mol. Clusters. 38 279
[26] Li L H, Fu R K Y, Poon R W Y, Kwok S C H, Chu P K, Wu Y Q, Zhang Y H, Cai X, Chen Q L, Xu M 2004 Surf. Coat. Technol. 186 165
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