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The magnetoelectric heating is investigated on an ECR plasma device. The ion temperatures are measured by ion sensitive probe (ISP) before and after magnetoelectric heating. The influences of bias voltage of electrical ring, magnet field and pressure on ion temperature and the efficiency of ion heating are studied. The results indicate that the whole heating of the plasma is accomplished through the magnetoelectric heating of the ions in the sheath of the electric ring and the radial transport of the heated ions. The ion temperature in the axial area increases with the bias voltage of electric ring, and their relationship is nonlinear. The ion temperature increases more than 20 eV when the bias voltage is 1000 V. A heating efficiency is achieved to be as high as 2%2.5% and increases with the bias voltage increasing. The magnetic field strength plays an important role in the limitation and heating of the ions. The efficiency of the magnetoelectric heating increases with the increase of the magnetic field strength when the magnetic field strength changes from 6.310-2T to 8.710-2T. The efficiency of the magnetoelectric heating increases with the pressure decreasing when the pressure chenges in a range of 0.020.8Pa.
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Keywords:
- ECR plasma /
- magnetoelectric heating /
- ion temperature
[1] Sun J,Wu J D, Zhong X X, Lai B 2000 Chinese Journal of Semiconductors 21 1019 (in Chinese) [孙 剑、吴嘉达、钟晓霞、来 冰 2000 半导体学报 21 1019]
[2] Ning Z Y, Cheng S H 1999 Acta Phys. Sin. 48 1950 (in Chinese) [宁兆元、程珊华 1999 48 1950]
[3] [4] [5] Wang J H, Yuan R Z, Wu Q C 1999 Acta Phys. Sin. 48 955 (in Chinese) [汪建华、袁润章、邬钦崇 1999 48 955]
[6] [7] Yang W B, Wang J L, Zhang G L, Fan S H, Liu C Z, Yang S Z 2003 Chin. Phys. 12 1257
[8] Joyce G, Lampe M, Fernsler R F 2000 Plasma Sources Sci. Technol. 9 429
[9] [10] [11] Wilhelm R 1989 Fusion Engineering and Design 11 167
[12] [13] Roth J R, Gerdin G A, Richard W. Richardson 1976 IEEE Transactions on Plasma Science PS -4 166
[14] Ezumi N, Masuzaki S, Ohno N, Usugi Y, Takamura S 2003 Journal of Nuclear Materials 313-316 696
[15] [16] [17] Sekine T, Saito T, Tatematsu Y, Yasuoka T, Ikegami H, Nagai D 2004 Review of Scientific Instruments 75 4317
[18] [19] da Silva R P, Nascimento I C, da Cruz D F, Jr 1986 Rev. Sci. Instrum 57 2205
[20] [21] Shen W L, Ma Z B, Tan B S 2010 Journal of Wuhan Institute of Technology 32 53 (in Chinese) [沈武林、马志斌、谭必松 2010 武汉工程大学学报 32 53]
[22] [23] Deli Tang, Paul K C 2003 Journal of Applied Physics 93 5883
[24] Rose D J, Clark M, Jr. 1961 Plasmas and Controlled Fusion (Volume 1) (New York: The M.I.T. Press) p161
[25] [26] [27] Roth J R 1973 IEEE Trans. on Plasma Sci. 1 34
[28] Roth J R, Gerdin G A 1976 Plasma Physics 19 423
[29] [30] Roth J R 1995 Industrial Plasma Engineering (Volume 1) (Knoxville: Taylor Francis) p137
[31] -
[1] Sun J,Wu J D, Zhong X X, Lai B 2000 Chinese Journal of Semiconductors 21 1019 (in Chinese) [孙 剑、吴嘉达、钟晓霞、来 冰 2000 半导体学报 21 1019]
[2] Ning Z Y, Cheng S H 1999 Acta Phys. Sin. 48 1950 (in Chinese) [宁兆元、程珊华 1999 48 1950]
[3] [4] [5] Wang J H, Yuan R Z, Wu Q C 1999 Acta Phys. Sin. 48 955 (in Chinese) [汪建华、袁润章、邬钦崇 1999 48 955]
[6] [7] Yang W B, Wang J L, Zhang G L, Fan S H, Liu C Z, Yang S Z 2003 Chin. Phys. 12 1257
[8] Joyce G, Lampe M, Fernsler R F 2000 Plasma Sources Sci. Technol. 9 429
[9] [10] [11] Wilhelm R 1989 Fusion Engineering and Design 11 167
[12] [13] Roth J R, Gerdin G A, Richard W. Richardson 1976 IEEE Transactions on Plasma Science PS -4 166
[14] Ezumi N, Masuzaki S, Ohno N, Usugi Y, Takamura S 2003 Journal of Nuclear Materials 313-316 696
[15] [16] [17] Sekine T, Saito T, Tatematsu Y, Yasuoka T, Ikegami H, Nagai D 2004 Review of Scientific Instruments 75 4317
[18] [19] da Silva R P, Nascimento I C, da Cruz D F, Jr 1986 Rev. Sci. Instrum 57 2205
[20] [21] Shen W L, Ma Z B, Tan B S 2010 Journal of Wuhan Institute of Technology 32 53 (in Chinese) [沈武林、马志斌、谭必松 2010 武汉工程大学学报 32 53]
[22] [23] Deli Tang, Paul K C 2003 Journal of Applied Physics 93 5883
[24] Rose D J, Clark M, Jr. 1961 Plasmas and Controlled Fusion (Volume 1) (New York: The M.I.T. Press) p161
[25] [26] [27] Roth J R 1973 IEEE Trans. on Plasma Sci. 1 34
[28] Roth J R, Gerdin G A 1976 Plasma Physics 19 423
[29] [30] Roth J R 1995 Industrial Plasma Engineering (Volume 1) (Knoxville: Taylor Francis) p137
[31]
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