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Multi-pulse atmospheric-pressure glow discharges between two slightly unparallel electrodes were carried out in helium. The mode of discharge was investigated using an intensified charge-coupled device camera. The discharge current through gas gap and surface charge on the solid dielectric barrier were calculated. Based on analysis of surface charge on the solid barrier, space charges in gas gap, applied voltage across electrodes and field strength in gas gap, the formation mechanism of multi-pulse discharge was discussed. The discharge evolution pictures show that discharge is generated at the narrower side. At the other side, discharge is also generated at the first current peak. Physical process of the first pulse of atmospheric-pressure glow discharge in helium starts from a Townsend discharge leading to a glow discharge, and that of each subsequent current pulse is a glow discharge. Between two consecutive current pulses, a faint glow discharge is maintained in the gas gap. Theoretical analysis shows that multi-pulse discharge is a result of co-evolution of both surface charge as well as space charge and applied voltage, and the Townsend discharge does not appear during current pulse sequence of the same half cycle, except for discharge inception.
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Keywords:
- dielectric barrier discharge /
- intensified charge-coupled device /
- atmospheric-pressure glow discharge /
- multi-pulse
[1] ［1］Roth J R, Rahel J, Dai X, Sherman D M 2005 J. Phys. D: Appl. Phys. 38 555
[2] ［2］Fang Z, Qiu Y, Luo Y 2003 J. Phys. D: Appl. Phys. 36 2980
[3] ［3］Wang X X, Lu M Z, Pu Y K 2002 Acta Phys.Sin. 51 2778 (in Chinese) ［王新新、芦明泽、蒲以康 2002 51 2778］
[4] ［4］Luo H Y, Wang X X, Mao T, Liang Z, Lü B, Guan Z C, Wang L M 2008 Acta Phys.Sin. 57 4298 (in Chinese) ［罗海云、王新新、毛婷、梁卓、吕博、关志成、王黎明 2008 57 4298］
[5] ［5］Kogelscharz U 2002 IEEE Trans. Plasma Sci. 30 1400
[6] ［6］Li X C, Jia P Y, Liu Z H, Li L C, Dong L F 2008 Acta Phys.Sin. 57 1001 (in Chinese) ［李雪辰、贾鹏英、刘志辉、李立春、董丽芳 2008 57 1001］
[7] ［7］Okazaki S, Kogomat M, Ueharat M, Kimurat Y 1993 J. Phys. D: Appl. Phys. 26 889
[8] ［8］Massines F, Gherardi N, Naude N, Segur P 2005 Plasma Phys. Contrl. Fusion 47 577
[9] ［9］Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 221504
[10] ］Luo H Y, Liang Z, Lü B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 231504
[11] ］Lü B, Wang X X, Luo H Y, Liang Z 2009 Chin. Phys. B 18 0646
[12] ］Akishev Y S, Demyanov A V, Karalnik V B, Pankin M V, Trushkin N I 2001 Plasma Phys. Rep. 27 164
[13] ］Golubovskii Y B, Maiorov V A, Behnke J, Behnke J F 2003 J. Phys. D: Appl. Phys. 36 39
[14] ］Mangolini L, Orlov K, Kortshagen U, Heberlein J, Kogelschatz U 2002 Appl. Phys.Lett. 80 1722
[15] ］Radu I, Bartnikas R, Czeremuszkin G, Wertheimer M R 2003 IEEE Trans. Plasma Sci. 31 411
[16] ］Zhang Y T, Wang D Z, Wang Y H, Liu C S 2005 Chin. Phys. Lett. 22 171
[17] ］Wang Y H, Wang D Z 2005 Acta Phys. Sin. 54 1295 (in Chinese) ［王艳辉、王德真 2005 54 1295］
[18] ］Wang D Z, Wang Y H, Liu C S 2006 Thin Solid Films 506—507 384
[19] ］Zhang Y, Gu B, Wang W C, Peng X W, Wang D Z 2009 Acta Phys. Sin. 58 5532 (in Chinese) ［张燕、顾彪、王文春、彭许文、王德真 2009 58 5532］
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[1] ［1］Roth J R, Rahel J, Dai X, Sherman D M 2005 J. Phys. D: Appl. Phys. 38 555
[2] ［2］Fang Z, Qiu Y, Luo Y 2003 J. Phys. D: Appl. Phys. 36 2980
[3] ［3］Wang X X, Lu M Z, Pu Y K 2002 Acta Phys.Sin. 51 2778 (in Chinese) ［王新新、芦明泽、蒲以康 2002 51 2778］
[4] ［4］Luo H Y, Wang X X, Mao T, Liang Z, Lü B, Guan Z C, Wang L M 2008 Acta Phys.Sin. 57 4298 (in Chinese) ［罗海云、王新新、毛婷、梁卓、吕博、关志成、王黎明 2008 57 4298］
[5] ［5］Kogelscharz U 2002 IEEE Trans. Plasma Sci. 30 1400
[6] ［6］Li X C, Jia P Y, Liu Z H, Li L C, Dong L F 2008 Acta Phys.Sin. 57 1001 (in Chinese) ［李雪辰、贾鹏英、刘志辉、李立春、董丽芳 2008 57 1001］
[7] ［7］Okazaki S, Kogomat M, Ueharat M, Kimurat Y 1993 J. Phys. D: Appl. Phys. 26 889
[8] ［8］Massines F, Gherardi N, Naude N, Segur P 2005 Plasma Phys. Contrl. Fusion 47 577
[9] ［9］Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 221504
[10] ］Luo H Y, Liang Z, Lü B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 231504
[11] ］Lü B, Wang X X, Luo H Y, Liang Z 2009 Chin. Phys. B 18 0646
[12] ］Akishev Y S, Demyanov A V, Karalnik V B, Pankin M V, Trushkin N I 2001 Plasma Phys. Rep. 27 164
[13] ］Golubovskii Y B, Maiorov V A, Behnke J, Behnke J F 2003 J. Phys. D: Appl. Phys. 36 39
[14] ］Mangolini L, Orlov K, Kortshagen U, Heberlein J, Kogelschatz U 2002 Appl. Phys.Lett. 80 1722
[15] ］Radu I, Bartnikas R, Czeremuszkin G, Wertheimer M R 2003 IEEE Trans. Plasma Sci. 31 411
[16] ］Zhang Y T, Wang D Z, Wang Y H, Liu C S 2005 Chin. Phys. Lett. 22 171
[17] ］Wang Y H, Wang D Z 2005 Acta Phys. Sin. 54 1295 (in Chinese) ［王艳辉、王德真 2005 54 1295］
[18] ］Wang D Z, Wang Y H, Liu C S 2006 Thin Solid Films 506—507 384
[19] ］Zhang Y, Gu B, Wang W C, Peng X W, Wang D Z 2009 Acta Phys. Sin. 58 5532 (in Chinese) ［张燕、顾彪、王文春、彭许文、王德真 2009 58 5532］
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